二手 AMAT / APPLIED MATERIALS Endura 5500 #194704 待售

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ID: 194704
晶圓大小: 8"
優質的: 1993
Sputtering system, 8" Wafer size: 8" flat (not notch) Process: AlCu/ TiN/Ti Configuration: Chamber 1: AlCu Chamber 2: TiN Chamber 3: Ti Chamber 4: Ti Chamber 5: cooling chamber Preheat Etch Clamp (not electrostatic chuck) Robot: Buffer: AMAT HP, ceramic blade Transfer: AMAT HP, metal blade System monitor: 1: stand alone 2: through the wall 3: stand alone Includes (1) each monitor rack Load lock: Narrow body with tilts in/out No sliding sensor kit Chamber A: - Chamber type: Pass through - Chamber Lid: Metal Lid - Cooling method: NA Chamber B: - Chamber type: Cool down - Chamber Lid: Metal lid - Cooling method: By PCW Chamber D: - Chamber type: Preclean I Chamber F: - Chamber type: Orient/Degas Chamber 1: - Chamber type: Standard body - Chamber process: AlCu, Preheat - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K SLAVE - RF Gen/DC power supply2: A, MDX-20K MASTER - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: P/N 0010-70086 - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 2: - Chamber type: Wide Body - Chamber process: TiN - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: : CTI CRYO 8F 2phase - Source(Lid) type : UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 3: - Chamber type: Wide Body - Chamber process: Ti - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 4: - Chamber type: Wide body - Chamber process: Ti, Preheat - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Includes: - Chamber type: Wide body - Chamber process: Ti, Preheat - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas Installed 1993 vintage.
AKT/AMAT/APPLICED MATERIALS/AKT Endura 5500系列反應堆是先進的等離子體蝕刻沈積工具。AKT Endura 5500采用緊湊、易於使用的系統,可提供卓越的功能和準確性,以及低的擁有和維護成本。AMAT ENDURA 5500在大量食譜的過程靈活性和均勻性方面為蝕刻和沈積提供了全面的服務。獲得專利的Uniformity Control Technology、Advanced Ultra High Plasma和蝕刻時間控制等功能允許用戶優化流程以實現卓越性能。ENDURA 5500還提供了一系列出色的安全和環境特性,使其成為實驗室和生產級別操作的理想選擇。創新的Ultra-Flow工藝、熱優化和動態壓力控制可保護基板免受高溫和腐蝕性材料的影響,同時確保結果一致。該系統有一系列令人印象深刻的工具可供使用,以進一步提高其性能和準確性。Endura 5500能夠利用特殊的過程硬件,如線性電子束(LEB)發射器、微波源和離子束源,這取決於應用。它還能夠利用優化的源材料、源功率和湍流管理功能最大限度地提高過程的重復性和均勻性。APPLICED MATERIALS Endura 5500的高性能設計結合其易用性和廣泛的安全特性,使其成為各種等離子體蝕刻和沈積應用的理想選擇。該反應堆可靠性高,能效高,結果一致,擁有和維護成本低。此外,它還提供了AMAT提供的一整套售後支持,讓用戶放心,他們的設備將在未來數年內保持運行狀態。
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