二手 AMAT / APPLIED MATERIALS Endura 5500 #9004064 待售

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ID: 9004064
晶圓大小: 8"
HP PVD system, 8" Wafer type: notch Buffer robot type: HP Transfer robot type: HP Buffer robot blade: metal Wafer sensors: cassette Loadlock type: Narrow body with tilt Fab installation: TTW Transfer robot blade: metal Software revision E8.86 Signal tower: Red-amber-green System umbilicals: 50 ft standard EMO's: momentary Loadlock slit valve O rings: Viton (black) No heat exchangers Hard drive: 5 Gb Chamber 2: PVD wide body Process 2: PVD sputter Susceptor / pedestal: 101 Process kit type: other Manometer config: Single Lid type: 11.3 Wall cooling: None Manometer 1: 100mTorr Throttle valve: none Heater / cathode cooling: other Pump configuration: Cryo Manometer 2: None RF gen / DC supply: AE MDX-L6 Endpoint system: No Turbo pump: No Slit valve oring: Viton black Heated valve stack: No Chamber orings: Viton brown RF match: None Chamber lid clamps: yes Magnet number: 0010-20328 Chamber gases: Gas 1 50sccm Nitrogen, STEC 4400 MC mtl seal, MFC18, Standard gas stick configuration Gas 2 140sccm Argon, STEC 4400 MC mtl seal, MFC19, Standard gas stick configuration Gas valves: Nupro Chamber 3: PVD wide body Process 3: PVD sputter Susceptor / pedestal: 101 Process kit type: other Manometer config: Single Lid type: 11.3 Wall cooling: other Manometer 1: 100mTorr Throttle valve: none Heater / cathode cooling: other Pump configuration: Cryo Manometer 2: None RF gen / DC supply: AE MDX-L6 Endpoint system: No Turbo pump: No Slit valve oring: Viton black Heated valve stack: No Chamber orings: Viton brown RF match: None Chamber lid clamps: yes Magnet number: 0010-20328 Chamber gases: Gas 1 140sccm Argon, STEC 4400 MC mtl seal, MFC2, Standard gas stick configuration Gas 2 100sccm Nitrogen, STEC 4400 MC mtl seal, MFC3, Standard gas stick configuration Gas valves: Nupro Chamber 4: PVD wide body Process 4: PVD sputter Susceptor / pedestal: 101 Process kit type: other Manometer config: Single Lid type: 11.3 Wall cooling: other Manometer 1: 100mTorr Throttle valve: none Heater / cathode cooling: other Pump configuration: Cryo Manometer 2: None RF gen / DC supply: AE MDX-L6 Endpoint system: No Turbo pump: No Slit valve oring: Viton black Heated valve stack: No Chamber orings: Viton brown RF match: other Chamber lid clamps: yes Magnet number: 0010-01198 Chamber gases: Gas 1 140sccm Argon, STEC 4400 MC mtl seal, MFC5, Standard gas stick configuration Gas 2 50sccm Nitrogen, STEC 4400 MC mtl seal, MFC6, Standard gas stick configuration Gas valves: Nupro Chamber A: Pass through Gas valves: Nupro Slit valve oring: Viton black Chamber orings: Viton black Chamber B: Cooldown Gas valves: Nupro Slit valve oring: Viton brown Manometer: None Heater / cathode cooling: PCW Chamber pump: Edwards Chamber orings: Viton black No turbo pump Chamber E: Orienter / Degas Chamber F: Orienter / Degas AC Rack damaged during transport 1995 vintage.
AKT/AMAT/APPLICED MATERIALS/AKT Endura 5500是用於制造半導體元件和系統的關鍵工具。它主要用於創建符合各種行業標準的高耐用性、低功耗部件和設備。與市場上許多其他工具相比,AKT Endura 5500提供了更高的性能和可靠性,使其成為許多晶圓制造工藝的理想選擇。AMAT ENDURA 5500是一個單室、水平反應堆,可以處理多種晶圓尺寸。它設計用於快速、高精度的等離子體蝕刻和沈積過程。設備在腔室底部使用氣體噴嘴,設計用於提高蝕刻速度和效率。AMAT Endura 5500的炮塔裝有組合載荷鎖定和氣體註入端口,與手動操作相比,可以更快、低成本的裝卸。該系統有幾種不同的操作模式,包括「線圈到晶圓」模式,這種模式能夠實現可重復的過程周期和提高吞吐量。APPLIED MATERIALS Endura 5500配備了為真空完整性而設計的高級石英室和蓋子。該腔室可實現高精度的沈積和蝕刻過程,並具有較低的顆粒水平,同時覆蓋廣泛的壓力和溫度範圍。該單元還采用了強大的可編程控制器,包括自動和手動控制模式來處理晶圓制造過程的所有部分。ENDURA 5500還配備了先進的晶圓清洗機,旨在進一步提高產量。它采用一種特殊的動力驅動的刷子,高速旋轉,有效地去除晶圓表面的任何顆粒。該工具還包括一個快速響應的實時粒子監控器,以確保安全的晶圓清洗和燃燒過程控制。AMAT/APPLIED MATERIALS/AKT ENDURA 5500是最先進半導體器件亞微米精密製造的極可靠工具。它在高通量、單晶片工藝中提供高質量的性能,使其成為晶片制造操作的經濟選擇。該資產采用高耐力、低功耗的組件構建,可以保證多年的精確、準確運行。
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