二手 AMAT / APPLIED MATERIALS Endura 5500 #9036092 待售
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ID: 9036092
PVD System, 8"
Wafer handling: SMIF
Front panel type: wide body
Software version: B88810
Single board computer in controller: Yes
Ion gauges: Yes
Robots (standard, HP, HP+, VHP, etc):
Buffer robot: HP+
Transfer robot:HP+
Blade material: Metal
Blade material: Metal
Load Lock: Wide Body
Narrow Body: tilt-out
Index handler type:
Loadlock vents: N2 vent
Basic Chamber setup: (PC II, Cooldown, O/D, pass through, CVD, other - w/o details)
A: Cool down
B: Cool down
C: Pre clean II
D: Pre clean II
E: Orient / Enhanced degas
F: Orient / Enhanced degas
Process: VECTRA IMP Ti
Platform: Endura
RF coil power supply: Advance Energy HFV 8000
Chamber temperature: Heater 100°C - Bake 30%
Pump Type: CTI 8F Enhanced Fast Regen Low Vib
MFC #1: Argon Heater
MFC #1 type / size: Stec SEC-4400M 50 Sccm
MFC #2: Argon Final
MFC #2 type / size: Stec SEC-4400M 100 Sccm
Source type: Vectra IMP
Target type / vendor: D-Bond 0.25" - Honeywell
Target part # 7VX00236
Coil part # 7VX20266
Magnet type / part number: Type RH-2 P/N 0010-21676
Ar Psi: 20 PSI
Power supply: MDX 12KW
Shutter: Linkage
Heater: Original 4F
Process Kit (type/desc): IMP Process Kit Version 4.5
Upper Shield Part No: 0020-22498
Lower Shield Part No: 0020-22499
Shield Clamp Kit Part No: 0240-25440
DC Bias Hardware Kit PN: 0240-20021
Process: CVD TiN
Platform: ENDURA
Chamber temperature: 400°C
Chamber type: TxZ HP+
Heater: AMAT P/N 0010-03244
Pump Type: ALCATEL 602 P
HX: AMAT 1
HX temperature: 60°C
MFC #1: Argon Edge Purge
MFC #1 type / size: Stec SEC-4400M 3000 Sccm
MFC #2: Argon BTPur
MFC #2 type / size: Stec SEC-4400M 2000 Sccm
MFC #3: He Carrier
MFC #3 type / size: Stec SEC-4400M 500 Sccm
MFC #4: N2 Dil
MFC #4 type / size: Stec SEC-4400M 1000 Sccm
MFC #5: He Dil
MFC #5 type / size: Stec SEC-4400M 1000 Sccm
MFC #6: N2
MFC #6 type / size: Stec SEC-4400M 1000 Sccm
RF Power supply: ADVANCE ENERGY PDX 900-2V
HE carrier pressure: 18 PSI
HE DIL pressure: 30 PSI
Ampole temperature: 50°C
Gas line temperature: 60°C
Hot Box: 70°C
CVD Ion gauge: Absent
Process Kit (type/desc)
INSERT LINER EXHAUST TXZ 200MM: 0021-02469
RING, LOWER, ISOLATOR: 0021-02155
RING, MIDDLE, ISOLATOR: 0021-02156
EDGE RING, PURGE HEATER, 200MM TXZ: 0021-03094
SCREW, CENTERING PURGE HEATER 200MM TXZ: 0021-07418
OUTER SHIELD W/O WINDOW, TXZ CHAMBER: 0021-03980
INNER SHIELD HP TXZ IMP. UNIF.: 0040-06127
PIN, LIFT, TXZ HEATER: 0200-01798
PLATE,BLOCKER,TXZ 200MM: 0021-35744
FACE PLATE, BKM3 TXZ 200MM: 0040-01878
CHAMBER INSERT 200MM TXZ CIP: 0200-00261
ISOLATOR, SIN, ENH, PUMPING LID, DXZ GECO: 0200-10163
TUBE GAS FEED: 0020-31425
LID LINER, HPTXZ: 0200-00689
Process: PVD TiN
Platform: ENDURA
Ch temp control: Without temp control
Chamber type: WB
Pump Type: CTI 8F Enhanced Fast Regen Low Vib
MFC #1: Argon
MFC #1 type / size: Stec SEC-4400M 100 Sccm
MFC #2: N2
MFC #2 type / size: Stec SEC-4400M 200 Sccm
Source type: G-12
Target type / vendor: D-Bond 0.35" - Praxair
Target part #: 7VX00135
Magnet type / part number: Type G-12 P/N 0010-20768
N2 Psi: 20 PSI
Ar Psi: 20 PSI
Power supply: MDX - L12M - 650
Shutter: Linkage
Heater: SST Pedestal Unclamped 101
Process Kit (type/desc): Shield Mounting G12 btn hd
Upper Shield Part No: 0020-25730
Lower Shield Part No: 0020-25077
Pedestal Part No: 0021-22028
Cover Ring Part No: 0020-24914
Process: Pre-clean
Pedestal type: Preclean II Pik1
Power supply 1: 400 KHz
Power supply 2: 13.56 MHz
Gasline fittings: VCR
Loadlock fittings: VCR
MFC type: Millipore / STEC
Paste chamber: NA
Chamber cryo pump type: CTI 8F Enhanced Fast Regen Low Vib
Umbilicals:
Mainframe to controller: ~25 ft
Mainframe to generator racks: ~25 ft
Mainframe to cryo compressor: ~25 ft
Main AC to system controller/sys. AC: ~25 ft
Syst cont/sys AC to primary Gen rack: ~25 ft
Main AC to primary generator rack: ~25 ft
Main AC to pump frame: ~25 ft
Main AC to Neslab heat exchanger: ~25 ft
Monitor cable: ~25 ft
Monitor2 cable: ~25 ft
Monitor3 cable: ~15 ft
EMO button guard ring: Yes
Water leak detector: yes
Buffer and transfer lid hoist: Yes
Support Equipment:
AMAT 0 Heat exchanger 0010-76467
Cryo compressors:
(2) CTI Cryo pump 1 8135900G001
Neslab with resistivity meter
Soft copy pdf manuals
Currently in a fab
2003 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500反應堆是一種先進的、具有成本效益的多用途集群工具,為要求苛刻的晶圓制造工藝提供了改進的性能要求。該反應堆能夠在蝕刻和沈積過程中提供可靠和均勻的環境。AKT Endura 5500反應堆專為單室、雙室和多室操作而設計,采用先進的真空設備,具有優越的氣體分配和多種選擇。AMAT ENDURA 5500采用緊湊的設計,需要最小的空間,占用不到3立方米,使其能夠輕松融入任何生產過程。AKT ENDURA 5500允許在三維方向上輕松定位,使其設置和運行更加高效和方便。APPLIED MATERIALS Endura 5500還具有獨特的冷卻系統,可實現更快的吞吐量和運行之間的冷卻。這種多功能集群工具還為蝕刻和沈積過程提供了選項。Endura 5500包括模塊化蝕刻和沈積室設計,允許在同一空間進行蝕刻時進行沈積。這種多用途特性確保了在一個反應堆內能夠完成各種各樣的過程。Endura 5500Reactor提供低成本和低維護,並具有出色的性能和耐用性。其氣體輸送裝置有利於提高吞吐量和提高產品產量。AMAT/APPLIED MATERIALS/AKT ENDURA 5500的高真空能力提高了質量和可重復性,同時消除了晶圓邊緣效應。ENDURA 5500具有廣泛的控制選項,為蝕刻和沈積過程提供了高度的控制和準確性。反應堆既包括過程控制機,也包括操作員面板,以提高操作員的便利性。該控制工具可管理多個過程參數,流程開發速度快,性能高,精度高.APPLIED MATERIALS ENDURA 5500的高級功能和緊湊的設計使其成為許多應用程序的理想選擇。它具有靈活性和易於安裝,可將其集成到任何流程中,同時提供優化的結果和卓越的性能。反應堆可以處理從蝕刻到沈積的任何過程,成本低,重復性高,吞吐量提高。
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