二手 AMAT / APPLIED MATERIALS Endura 5500 #9036092 待售

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ID: 9036092
PVD System, 8" Wafer handling: SMIF Front panel type: wide body Software version: B88810 Single board computer in controller: Yes Ion gauges: Yes Robots (standard, HP, HP+, VHP, etc): Buffer robot: HP+ Transfer robot:HP+ Blade material: Metal Blade material: Metal Load Lock: Wide Body Narrow Body: tilt-out Index handler type: Loadlock vents: N2 vent Basic Chamber setup: (PC II, Cooldown, O/D, pass through, CVD, other - w/o details) A: Cool down B: Cool down C: Pre clean II D: Pre clean II E: Orient / Enhanced degas F: Orient / Enhanced degas Process: VECTRA IMP Ti Platform: Endura RF coil power supply: Advance Energy HFV 8000 Chamber temperature: Heater 100°C - Bake 30% Pump Type: CTI 8F Enhanced Fast Regen Low Vib MFC #1: Argon Heater MFC #1 type / size: Stec SEC-4400M 50 Sccm MFC #2: Argon Final MFC #2 type / size: Stec SEC-4400M 100 Sccm Source type: Vectra IMP Target type / vendor: D-Bond 0.25" - Honeywell Target part # 7VX00236 Coil part # 7VX20266 Magnet type / part number: Type RH-2 P/N 0010-21676 Ar Psi: 20 PSI Power supply: MDX 12KW Shutter: Linkage Heater: Original 4F Process Kit (type/desc): IMP Process Kit Version 4.5 Upper Shield Part No: 0020-22498 Lower Shield Part No: 0020-22499 Shield Clamp Kit Part No: 0240-25440 DC Bias Hardware Kit PN: 0240-20021 Process: CVD TiN Platform: ENDURA Chamber temperature: 400°C Chamber type: TxZ HP+ Heater: AMAT P/N 0010-03244 Pump Type: ALCATEL 602 P HX: AMAT 1 HX temperature: 60°C MFC #1: Argon Edge Purge MFC #1 type / size: Stec SEC-4400M 3000 Sccm MFC #2: Argon BTPur MFC #2 type / size: Stec SEC-4400M 2000 Sccm MFC #3: He Carrier MFC #3 type / size: Stec SEC-4400M 500 Sccm MFC #4: N2 Dil MFC #4 type / size: Stec SEC-4400M 1000 Sccm MFC #5: He Dil MFC #5 type / size: Stec SEC-4400M 1000 Sccm MFC #6: N2 MFC #6 type / size: Stec SEC-4400M 1000 Sccm RF Power supply: ADVANCE ENERGY PDX 900-2V HE carrier pressure: 18 PSI HE DIL pressure: 30 PSI Ampole temperature: 50°C Gas line temperature: 60°C Hot Box: 70°C CVD Ion gauge: Absent Process Kit (type/desc) INSERT LINER EXHAUST TXZ 200MM: 0021-02469 RING, LOWER, ISOLATOR: 0021-02155 RING, MIDDLE, ISOLATOR: 0021-02156 EDGE RING, PURGE HEATER, 200MM TXZ: 0021-03094 SCREW, CENTERING PURGE HEATER 200MM TXZ: 0021-07418 OUTER SHIELD W/O WINDOW, TXZ CHAMBER: 0021-03980 INNER SHIELD HP TXZ IMP. UNIF.: 0040-06127 PIN, LIFT, TXZ HEATER: 0200-01798 PLATE,BLOCKER,TXZ 200MM: 0021-35744 FACE PLATE, BKM3 TXZ 200MM: 0040-01878 CHAMBER INSERT 200MM TXZ CIP: 0200-00261 ISOLATOR, SIN, ENH, PUMPING LID, DXZ GECO: 0200-10163 TUBE GAS FEED: 0020-31425 LID LINER, HPTXZ: 0200-00689 Process: PVD TiN Platform: ENDURA Ch temp control: Without temp control Chamber type: WB Pump Type: CTI 8F Enhanced Fast Regen Low Vib MFC #1: Argon MFC #1 type / size: Stec SEC-4400M 100 Sccm MFC #2: N2 MFC #2 type / size: Stec SEC-4400M 200 Sccm Source type: G-12 Target type / vendor: D-Bond 0.35" - Praxair Target part #: 7VX00135 Magnet type / part number: Type G-12 P/N 0010-20768 N2 Psi: 20 PSI Ar Psi: 20 PSI Power supply: MDX - L12M - 650 Shutter: Linkage Heater: SST Pedestal Unclamped 101 Process Kit (type/desc): Shield Mounting G12 btn hd Upper Shield Part No: 0020-25730 Lower Shield Part No: 0020-25077 Pedestal Part No: 0021-22028 Cover Ring Part No: 0020-24914 Process: Pre-clean Pedestal type: Preclean II Pik1 Power supply 1: 400 KHz Power supply 2: 13.56 MHz Gasline fittings: VCR Loadlock fittings: VCR MFC type: Millipore / STEC Paste chamber: NA Chamber cryo pump type: CTI 8F Enhanced Fast Regen Low Vib Umbilicals: Mainframe to controller: ~25 ft Mainframe to generator racks: ~25 ft Mainframe to cryo compressor: ~25 ft Main AC to system controller/sys. AC: ~25 ft Syst cont/sys AC to primary Gen rack: ~25 ft Main AC to primary generator rack: ~25 ft Main AC to pump frame: ~25 ft Main AC to Neslab heat exchanger: ~25 ft Monitor cable: ~25 ft Monitor2 cable: ~25 ft Monitor3 cable: ~15 ft EMO button guard ring: Yes Water leak detector: yes Buffer and transfer lid hoist: Yes Support Equipment: AMAT 0 Heat exchanger 0010-76467 Cryo compressors: (2) CTI Cryo pump 1 8135900G001 Neslab with resistivity meter Soft copy pdf manuals Currently in a fab 2003 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500反應堆是一種先進的、具有成本效益的多用途集群工具,為要求苛刻的晶圓制造工藝提供了改進的性能要求。該反應堆能夠在蝕刻和沈積過程中提供可靠和均勻的環境。AKT Endura 5500反應堆專為單室、雙室和多室操作而設計,采用先進的真空設備,具有優越的氣體分配和多種選擇。AMAT ENDURA 5500采用緊湊的設計,需要最小的空間,占用不到3立方米,使其能夠輕松融入任何生產過程。AKT ENDURA 5500允許在三維方向上輕松定位,使其設置和運行更加高效和方便。APPLIED MATERIALS Endura 5500還具有獨特的冷卻系統,可實現更快的吞吐量和運行之間的冷卻。這種多功能集群工具還為蝕刻和沈積過程提供了選項。Endura 5500包括模塊化蝕刻和沈積室設計,允許在同一空間進行蝕刻時進行沈積。這種多用途特性確保了在一個反應堆內能夠完成各種各樣的過程。Endura 5500Reactor提供低成本和低維護,並具有出色的性能和耐用性。其氣體輸送裝置有利於提高吞吐量和提高產品產量。AMAT/APPLIED MATERIALS/AKT ENDURA 5500的高真空能力提高了質量和可重復性,同時消除了晶圓邊緣效應。ENDURA 5500具有廣泛的控制選項,為蝕刻和沈積過程提供了高度的控制和準確性。反應堆既包括過程控制機,也包括操作員面板,以提高操作員的便利性。該控制工具可管理多個過程參數,流程開發速度快,性能高,精度高.APPLIED MATERIALS ENDURA 5500的高級功能和緊湊的設計使其成為許多應用程序的理想選擇。它具有靈活性和易於安裝,可將其集成到任何流程中,同時提供優化的結果和卓越的性能。反應堆可以處理從蝕刻到沈積的任何過程,成本低,重復性高,吞吐量提高。
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