二手 AMAT / APPLIED MATERIALS Endura 5500 #9177283 待售
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ID: 9177283
晶圓大小: 8"
System, 8"
Wafer shape: SNNF
Chamber 1: SIP Cu
Process 1: Low temperature Cu
Chamber 2: Wide body
Process 2: TTN
Chamber 3: Wide body
Process 3: TTN
Chamber 4: SIP Cu
Process 4: Low temperature Cu
Chamber A: Pass through
Chamber B: Cooldown
Chamber E: Orient / Degas
Chamber F: Orient / Degas
Transfer robot type: HEWLETT-PACKARD
Transfer robot blade: Metal
Buffer robot type: HEWLETT-PACKARD
Buffer robot blade: Metal
Loadlock type: Narrow BD with tilt out
Signal tower: 4 Color R/G/Y/B
MF Facilities: Bottom
System umbilical: 25 ft
EMIs: Turn to release
No facility power (UPS)
No loadlock pump
Loadlock slit valve O-Ring: Viton (Black)
Heat exchanger 1: NESLAB
Heat exchanger 2: M-Pack
Hard drive: SCSI
(2) CRTs
No GEM
No OTF
Main AC box: 480 V type, wide type
Chamber A:
Chamber type: Pass through
Gas valves: Fujakin
Slit valve o-ring: Viton (Black)
Clear chamber lid
Chamber B:
Chamber type: Cooldown
Gas valves: Fujakin
Slit valve o-ring: Viton (Black)
Heater / Cathode cooling: PCW
Clear chamber lid
Chamber 1:
Chamber type: SIP Cu
Manometer config: Single
Manometer 1: 100 mTorr
Slit valve o-ring: Viton (Black)
Shutter option
Chamber process: Low temperature Cu
Lid type: SIP Source
RF Gen / DC Supply 1: ADVANCED ENERGY MDX-L6
Susceptor / Pedestal: Low temperature ESC
Wall cooling: PCW
Heater / Cathode cooling: M-Pack
Gate valve position: 3-Pos
Process kit type: SIP
Chamber pump: Enhanced 3 phase cryo
Magnet number: 0010-21676
Gas 1:
MFC Size: N2 100 Sccm
Gas name: AR
MFC Type: STEC 7440
MFC Number: MFC16
Gas stick configuration: Single
Chamber 2:
Chamber type: Wide body
Manometer config: Single
Manometer 1: 100 mTorr
Slit valve O-Ring: Viton (black)
Shutter option
Chamber process: TTN
Lit type: G12
RF Gen / DC Supply 1: ADVANCED ENERGY MDX-650 HiZ
Susceptor / Pedestal: A101
Heater / Cathode cooling: PCW
Gate valve position: 3-Pos
Process kit type: A101
Chamber pump: Enhanced 3 phase cryo
Magnet number: 0010-21844
Chamber 3:
Chamber type: Wide body
Manometer config: Single
Manometer 1: 100 mTorr
Slit valve o-ring: Viton (black)
Shutter option
Chamber process: TTN
Lit type: G12
RF Gen / DC Supply 1: ADVANCED ENERGY MDX-650 HiZ
Susceptor / Pedestal: A101
Heater / Cathode cooling: PCW
Gate valve position: 3-Pos
Process kit type: A101
Chamber pump: Enhanced 3 phase cryo
Magnet number: 0010-21844
Chamber 4:
Chamber type: SIP Cu
Manometer config: Single
Manometer 1: 100 mTorr
Slit valve o-ring: Viton (black)
Shutter option
Chamber process: Low temperature Cu
Lit type: G12
RF Gen / DC Supply 1: ADVANCED ENERGY MDX-L6
Susceptor / Pedestal: Low temperature ESC
Heater / Cathode cooling: NESLAB III
Process kit type: SIP
Chamber pump: Enhanced 3 phase cryo
Magnet number: 0010-21676
Power supply: 208 VAC, 3 Phase, 5 wire, 400 A.
AKT/AMAT/APPLICED MATERIALS/AKT Endura 5500是為高級蝕刻應用而設計的反應堆設備。這種工具能夠達到極高的通量,具有雙工藝室設計,允許同時操作蝕刻和清潔過程。AKT Endura 5500具有較大的工藝窗口,能夠支持低溫蝕刻和清潔的2.6 um設備。AMAT ENDURA 5500配備了用於高選擇性蝕刻的專利待定直流脈沖等離子體源,以及在某些薄膜上允許更高蝕刻速率的大面積等離子體。該系統能夠在整個基板上具有高蝕刻均勻性的晶片上實現<2%的可重復蝕刻速率均勻性。APPLIED MATERIALS Endura 5500還擁有一個強大的過程控制單元,它允許實時配方和監測諸如基材溫度、蝕刻速率和蝕刻均勻性等參數。這臺反應堆機器還采用了集成的集群工具,為不間斷的自動化端到端處理提供集群解決方案。Endura 5500具有廣泛的柔性基板傳輸空間以及卡帶到卡帶、基板到卡帶、直接卡帶到卡帶傳輸。它還具有高級流程控制模塊(APCM),允許用戶準確監控、分析和修改其流程配方。AMAT Endura 5500配備了車載監控資產,使其成為要求苛刻的流程可靠穩定的平臺。該控制模型具有PID控制和反饋偏差監控功能。PID控制可實現準確和可重復的過程穩定性,而反饋偏差監視可確保過程在預定義的範圍內運行。此外,AMAT/APPLICED MATERIALS/AKT ENDURA 5500維護設計低,有超過200點診斷。這包括集成的預防性維護設備、高級流程診斷和遠程監控功能。這有助於減少停機時間,因為它允許用戶快速識別和解決問題。總體而言,AKT ENDURA 5500是為蝕刻應用而設計的先進反應堆系統。它具有雙工藝室設計、直流脈沖等離子體源、配方調節控制單元、先進的集群機、低維護設計等特點。這些特性使得APPLIED MATERIALS ENDURA 5500高效可靠,成為尖端蝕刻工藝的絕佳選擇。
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