二手 AMAT / APPLIED MATERIALS Endura 5500 #9177283 待售

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ID: 9177283
晶圓大小: 8"
System, 8" Wafer shape: SNNF Chamber 1: SIP Cu Process 1: Low temperature Cu Chamber 2: Wide body Process 2: TTN Chamber 3: Wide body Process 3: TTN Chamber 4: SIP Cu Process 4: Low temperature Cu Chamber A: Pass through Chamber B: Cooldown Chamber E: Orient / Degas Chamber F: Orient / Degas Transfer robot type: HEWLETT-PACKARD Transfer robot blade: Metal Buffer robot type: HEWLETT-PACKARD Buffer robot blade: Metal Loadlock type: Narrow BD with tilt out Signal tower: 4 Color R/G/Y/B MF Facilities: Bottom System umbilical: 25 ft EMIs: Turn to release No facility power (UPS) No loadlock pump Loadlock slit valve O-Ring: Viton (Black) Heat exchanger 1: NESLAB Heat exchanger 2: M-Pack Hard drive: SCSI (2) CRTs No GEM No OTF Main AC box: 480 V type, wide type Chamber A: Chamber type: Pass through Gas valves: Fujakin Slit valve o-ring: Viton (Black) Clear chamber lid Chamber B: Chamber type: Cooldown Gas valves: Fujakin Slit valve o-ring: Viton (Black) Heater / Cathode cooling: PCW Clear chamber lid Chamber 1: Chamber type: SIP Cu Manometer config: Single Manometer 1: 100 mTorr Slit valve o-ring: Viton (Black) Shutter option Chamber process: Low temperature Cu Lid type: SIP Source RF Gen / DC Supply 1: ADVANCED ENERGY MDX-L6 Susceptor / Pedestal: Low temperature ESC Wall cooling: PCW Heater / Cathode cooling: M-Pack Gate valve position: 3-Pos Process kit type: SIP Chamber pump: Enhanced 3 phase cryo Magnet number: 0010-21676 Gas 1: MFC Size: N2 100 Sccm Gas name: AR MFC Type: STEC 7440 MFC Number: MFC16 Gas stick configuration: Single Chamber 2: Chamber type: Wide body Manometer config: Single Manometer 1: 100 mTorr Slit valve O-Ring: Viton (black) Shutter option Chamber process: TTN Lit type: G12 RF Gen / DC Supply 1: ADVANCED ENERGY MDX-650 HiZ Susceptor / Pedestal: A101 Heater / Cathode cooling: PCW Gate valve position: 3-Pos Process kit type: A101 Chamber pump: Enhanced 3 phase cryo Magnet number: 0010-21844 Chamber 3: Chamber type: Wide body Manometer config: Single Manometer 1: 100 mTorr Slit valve o-ring: Viton (black) Shutter option Chamber process: TTN Lit type: G12 RF Gen / DC Supply 1: ADVANCED ENERGY MDX-650 HiZ Susceptor / Pedestal: A101 Heater / Cathode cooling: PCW Gate valve position: 3-Pos Process kit type: A101 Chamber pump: Enhanced 3 phase cryo Magnet number: 0010-21844 Chamber 4: Chamber type: SIP Cu Manometer config: Single Manometer 1: 100 mTorr Slit valve o-ring: Viton (black) Shutter option Chamber process: Low temperature Cu Lit type: G12 RF Gen / DC Supply 1: ADVANCED ENERGY MDX-L6 Susceptor / Pedestal: Low temperature ESC Heater / Cathode cooling: NESLAB III Process kit type: SIP Chamber pump: Enhanced 3 phase cryo Magnet number: 0010-21676 Power supply: 208 VAC, 3 Phase, 5 wire, 400 A.
AKT/AMAT/APPLICED MATERIALS/AKT Endura 5500是為高級蝕刻應用而設計的反應堆設備。這種工具能夠達到極高的通量,具有雙工藝室設計,允許同時操作蝕刻和清潔過程。AKT Endura 5500具有較大的工藝窗口,能夠支持低溫蝕刻和清潔的2.6 um設備。AMAT ENDURA 5500配備了用於高選擇性蝕刻的專利待定直流脈沖等離子體源,以及在某些薄膜上允許更高蝕刻速率的大面積等離子體。該系統能夠在整個基板上具有高蝕刻均勻性的晶片上實現<2%的可重復蝕刻速率均勻性。APPLIED MATERIALS Endura 5500還擁有一個強大的過程控制單元,它允許實時配方和監測諸如基材溫度、蝕刻速率和蝕刻均勻性等參數。這臺反應堆機器還采用了集成的集群工具,為不間斷的自動化端到端處理提供集群解決方案。Endura 5500具有廣泛的柔性基板傳輸空間以及卡帶到卡帶、基板到卡帶、直接卡帶到卡帶傳輸。它還具有高級流程控制模塊(APCM),允許用戶準確監控、分析和修改其流程配方。AMAT Endura 5500配備了車載監控資產,使其成為要求苛刻的流程可靠穩定的平臺。該控制模型具有PID控制和反饋偏差監控功能。PID控制可實現準確和可重復的過程穩定性,而反饋偏差監視可確保過程在預定義的範圍內運行。此外,AMAT/APPLICED MATERIALS/AKT ENDURA 5500維護設計低,有超過200點診斷。這包括集成的預防性維護設備、高級流程診斷和遠程監控功能。這有助於減少停機時間,因為它允許用戶快速識別和解決問題。總體而言,AKT ENDURA 5500是為蝕刻應用而設計的先進反應堆系統。它具有雙工藝室設計、直流脈沖等離子體源、配方調節控制單元、先進的集群機、低維護設計等特點。這些特性使得APPLIED MATERIALS ENDURA 5500高效可靠,成為尖端蝕刻工藝的絕佳選擇。
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