二手 AMAT / APPLIED MATERIALS Endura 5500 #9241774 待售

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ID: 9241774
晶圓大小: 8"
優質的: 2000
MOCVD System, 8" Wafer shape: SNNF MF Facilities: Bottom Load lock type: Narrow BD without tilt out CTI-CRYOGENICS Buffer chamber CTI-CRYOGENICS Transfer chamber No SMIF interface Mainframe: Buffer robot type: HP+ Wafer sensor: Mini beam Buffer robot blade: Metal Transfer robot type: HP+ Transfer robot blade: Metal Hard Disk Drive (HDD): SCSI (2) CRT Monitors Chamber 1: Type: IMP Vectra Process 1: Ti Susceptor / Pedestal: B101 Process kit type: IMP Single manometer configuration Lid type: G12 Chamber pump: 3P Onboard 8F Manometer 1: 100 mTorr Heater / Cathode cooling: NESLAB II CTI-CRYOGENICS Cryo pump LEYBOLD Turbotronik NT 150/360 Turbo controller (2) RF Generators / DC Supplies ADVANCED ENERGY MDX-L12M ADVANCED ENERGY HFV-8000 ADVANCED ENERGY CX-600S RF Match: 13.56 MHz, 2 MHz Shutter option Gate valve position: 3-Position 2 MHz Matching box capacitor: 0.01uF Chamber 2: Chamber type: TxZ HP+ Process 2: CVD TiN Susceptor / Pedestal: HP+ Dual manometer Wall cooling: AMAT1 Chamber pump: AA70W Manometer 1: 10 Torr Manometer 2: 100 Torr No endpoint system Throttle valve Heater / Cathode cooling: PCW ADVANCED ENERGY PDX 900-2V RF Generator / DC Supply LEYBOLD 361C Turbo pump LEYBOLD Turbotronik NT 150/360 Turbo controller EBARA AA70W Pump Gate valve position: 2-Positions Chamber 3: Chamber type: TxZ HP+ Chamber process: CVD TiN Pump configuration: 361C Susceptor / Pedestal: HP+ Dual manometer Wall cooling: AMAT1 Chamber pump: AA70W Manometer 1: 10 Torr Manometer 2: 100 Torr Throttle valve Heater / Cathode cooling: PCW ADVANCED ENERGY PDX 900-2V RF Generator / DC Supply LEYBOLD 361C Turbo pump EBARA AA70W Pump Gate valve position: 2-Positions No endpoint system Chamber A: Chamber type: Pass through Chamber lid: Clear lid Chamber B: Chamber type: Cool down Heater / Cathode cooling: PCW Chamber lid: Clear lid Chamber D: Chamber type: PCII Chamber process: Oxide etch Single manometer Lid type: Resonator EDWARDS iL600N Chamber pump Manometer 1: 100 m Torr COMDEL CPS 1001S RF Generator / DC Supply LEYBOLD Turbovac 361C Turbo pump LEYBOLD Turbotronik NT 150/360 Turbo controller EBARA iL70 Pump RFPP LF10A RF Generator / DC Supply RF Match: 13.56 MHz COMDEL CPS-1001S RFPP LF-10A Module: AMAT / APPLIED MATERIALS System controller (2) AMAT / APPLIED MATERIALS Generator racks AMAT / APPLIED MATERIALS Main AC box NESLAB AMAT / APPLIED MATERIALS Heat exchanger CTI-CRYOGENICS 9600 Compressor CTI-CRYOGENICS 3P Motor controller EDWARDS iL600N Pump Controllers: Slot / Top rack board 1 / SBC Board 2 / Videl board 3 / OMS Board 4 / Digital input / Output board 1 5 / Digital input / Output board 2 6 / Digital input / Output board 3 7 / Digital input / Output board 4 8 / Digital input / Output board 5 9 / Digital input / Output board 6 10 / SEI Board 13 / Digital input / Output board 7 (Option) 14 / AO Board 1 (Option) 15 / Stepper board 1 18 / Stepper board 2 19 / AI Board 20 / AO Board 2 21 / AO Board 3 22 / Hard Disk Drive (HDD) 23 / Grounding JAC 24 / Convectron board 25 / Convectron board 26 / Convectron board 27 / Convectron board 28 / TC 29 / TC 30 / ION Gauge board 1 31 / ION Gauge board 2 32 / Spare 33 / Digital input / Output board 8 34 / Digital input / Output board 9 35 / Digital input / Output board 10 37 / Digital input / Output board 12 39 / Digital input / Output board 14 40 / Floppy disk 42 / Cryo temp 43 / AI Mux 44 / AI Mux 45 / AI Mux 47 / Opto detect board 1 48 / Opto detect board 2 49 / Opto detect board 3 Power supply: 200 VAC, 60 Hz, 3 Phase, 343 A, 150 kVA 2000 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一種創新的自動化化學氣相沈積(CVD)薄膜塗層反應器,設計用於先進的半導體、太陽能、光電等應用。AKT Endura 5500反應堆具有5500升的工藝室容積和熱墻反應堆設計,得益於廣泛的主動冷卻設備,提供了高熱效率和可靠性。該反應器基於AKT專利的熱墻工藝,為各種薄膜材料提供了最佳生長條件。AMAT ENDURA 5500利用專利襯裏,允許晶片直接裝入腔室,而不會將外部產生的粒子引入工藝。這些襯裏被設計用來最小化或消除由於現場擁擠而造成的晶片的口袋和變薄。此外,隨附的洗滌器條在腔內保持最高的工藝純度。此外,APPLIED MATERIALS ENDURA 5500還包括一個板載測量室,用於優化過程控制和提供最佳薄膜屬性。AKT ENDURA 5500采用創新的均勻噴射器激發系統和專利的多點激發模式,消除陰影效應,在較大的晶圓尺寸上實現均勻,為高效均勻的薄膜生長提供均勻等離子體。反應堆的熱墻設計為先進材料創造了理想的工作環境,即使在高溫下也能產生優越的薄膜特性。機動化載波加載和端站機器人設計為支持大容量吞吐量。全自動單元提供了一個鎖載室,一個人機界面(HMI),用於簡化控制,溫度控制和操作過程中的實時監控。綜上所述,AMAT Endura 5500是一種可靠高效的CVD反應堆,設計用於工藝流體控制和生產。這款熱壁機采用5500升工藝室和外部洗滌器襯裏,非常適合種植薄膜材料,創造出最佳的薄膜特性。均勻噴射器勵磁工具、多點勵磁模式和機動載波載荷能力為射頻薄膜沈積提供了高效可靠的資產。
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