二手 AMAT / APPLIED MATERIALS Endura 5500 #9241774 待售
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ID: 9241774
晶圓大小: 8"
優質的: 2000
MOCVD System, 8"
Wafer shape: SNNF
MF Facilities: Bottom
Load lock type: Narrow BD without tilt out
CTI-CRYOGENICS Buffer chamber
CTI-CRYOGENICS Transfer chamber
No SMIF interface
Mainframe:
Buffer robot type: HP+
Wafer sensor: Mini beam
Buffer robot blade: Metal
Transfer robot type: HP+
Transfer robot blade: Metal
Hard Disk Drive (HDD): SCSI
(2) CRT Monitors
Chamber 1:
Type: IMP Vectra
Process 1: Ti
Susceptor / Pedestal: B101
Process kit type: IMP
Single manometer configuration
Lid type: G12
Chamber pump: 3P Onboard 8F
Manometer 1: 100 mTorr
Heater / Cathode cooling: NESLAB II
CTI-CRYOGENICS Cryo pump
LEYBOLD Turbotronik NT 150/360 Turbo controller
(2) RF Generators / DC Supplies
ADVANCED ENERGY MDX-L12M
ADVANCED ENERGY HFV-8000
ADVANCED ENERGY CX-600S
RF Match: 13.56 MHz, 2 MHz
Shutter option
Gate valve position: 3-Position
2 MHz Matching box capacitor: 0.01uF
Chamber 2:
Chamber type: TxZ HP+
Process 2: CVD TiN
Susceptor / Pedestal: HP+
Dual manometer
Wall cooling: AMAT1
Chamber pump: AA70W
Manometer 1: 10 Torr
Manometer 2: 100 Torr
No endpoint system
Throttle valve
Heater / Cathode cooling: PCW
ADVANCED ENERGY PDX 900-2V RF Generator / DC Supply
LEYBOLD 361C Turbo pump
LEYBOLD Turbotronik NT 150/360 Turbo controller
EBARA AA70W Pump
Gate valve position: 2-Positions
Chamber 3:
Chamber type: TxZ HP+
Chamber process: CVD TiN
Pump configuration: 361C
Susceptor / Pedestal: HP+
Dual manometer
Wall cooling: AMAT1
Chamber pump: AA70W
Manometer 1: 10 Torr
Manometer 2: 100 Torr
Throttle valve
Heater / Cathode cooling: PCW
ADVANCED ENERGY PDX 900-2V RF Generator / DC Supply
LEYBOLD 361C Turbo pump
EBARA AA70W Pump
Gate valve position: 2-Positions
No endpoint system
Chamber A:
Chamber type: Pass through
Chamber lid: Clear lid
Chamber B:
Chamber type: Cool down
Heater / Cathode cooling: PCW
Chamber lid: Clear lid
Chamber D:
Chamber type: PCII
Chamber process: Oxide etch
Single manometer
Lid type: Resonator
EDWARDS iL600N Chamber pump
Manometer 1: 100 m Torr
COMDEL CPS 1001S RF Generator / DC Supply
LEYBOLD Turbovac 361C Turbo pump
LEYBOLD Turbotronik NT 150/360 Turbo controller
EBARA iL70 Pump
RFPP LF10A RF Generator / DC Supply
RF Match: 13.56 MHz
COMDEL CPS-1001S
RFPP LF-10A
Module:
AMAT / APPLIED MATERIALS System controller
(2) AMAT / APPLIED MATERIALS Generator racks
AMAT / APPLIED MATERIALS Main AC box
NESLAB
AMAT / APPLIED MATERIALS Heat exchanger
CTI-CRYOGENICS 9600 Compressor
CTI-CRYOGENICS 3P Motor controller
EDWARDS iL600N Pump
Controllers:
Slot / Top rack board
1 / SBC Board
2 / Videl board
3 / OMS Board
4 / Digital input / Output board 1
5 / Digital input / Output board 2
6 / Digital input / Output board 3
7 / Digital input / Output board 4
8 / Digital input / Output board 5
9 / Digital input / Output board 6
10 / SEI Board
13 / Digital input / Output board 7 (Option)
14 / AO Board 1 (Option)
15 / Stepper board 1
18 / Stepper board 2
19 / AI Board
20 / AO Board 2
21 / AO Board 3
22 / Hard Disk Drive (HDD)
23 / Grounding JAC
24 / Convectron board
25 / Convectron board
26 / Convectron board
27 / Convectron board
28 / TC
29 / TC
30 / ION Gauge board 1
31 / ION Gauge board 2
32 / Spare
33 / Digital input / Output board 8
34 / Digital input / Output board 9
35 / Digital input / Output board 10
37 / Digital input / Output board 12
39 / Digital input / Output board 14
40 / Floppy disk
42 / Cryo temp
43 / AI Mux
44 / AI Mux
45 / AI Mux
47 / Opto detect board 1
48 / Opto detect board 2
49 / Opto detect board 3
Power supply: 200 VAC, 60 Hz, 3 Phase, 343 A, 150 kVA
2000 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一種創新的自動化化學氣相沈積(CVD)薄膜塗層反應器,設計用於先進的半導體、太陽能、光電等應用。AKT Endura 5500反應堆具有5500升的工藝室容積和熱墻反應堆設計,得益於廣泛的主動冷卻設備,提供了高熱效率和可靠性。該反應器基於AKT專利的熱墻工藝,為各種薄膜材料提供了最佳生長條件。AMAT ENDURA 5500利用專利襯裏,允許晶片直接裝入腔室,而不會將外部產生的粒子引入工藝。這些襯裏被設計用來最小化或消除由於現場擁擠而造成的晶片的口袋和變薄。此外,隨附的洗滌器條在腔內保持最高的工藝純度。此外,APPLIED MATERIALS ENDURA 5500還包括一個板載測量室,用於優化過程控制和提供最佳薄膜屬性。AKT ENDURA 5500采用創新的均勻噴射器激發系統和專利的多點激發模式,消除陰影效應,在較大的晶圓尺寸上實現均勻,為高效均勻的薄膜生長提供均勻等離子體。反應堆的熱墻設計為先進材料創造了理想的工作環境,即使在高溫下也能產生優越的薄膜特性。機動化載波加載和端站機器人設計為支持大容量吞吐量。全自動單元提供了一個鎖載室,一個人機界面(HMI),用於簡化控制,溫度控制和操作過程中的實時監控。綜上所述,AMAT Endura 5500是一種可靠高效的CVD反應堆,設計用於工藝流體控制和生產。這款熱壁機采用5500升工藝室和外部洗滌器襯裏,非常適合種植薄膜材料,創造出最佳的薄膜特性。均勻噴射器勵磁工具、多點勵磁模式和機動載波載荷能力為射頻薄膜沈積提供了高效可靠的資產。
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