二手 AMAT / APPLIED MATERIALS Endura 5500 #9241831 待售

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AMAT / APPLIED MATERIALS Endura 5500
已售出
ID: 9241831
晶圓大小: 6"
優質的: 2000
System, 6" Load lock chamber: LLC Type: Narrow body Indexer without rotation Wafer mapping CH Vent: Slow / Fast vent No wafer slide out detector Buffer chamber: Robot unit: HP Blade type: Metal Upper & lower motor (2) Gate valves Cryo pump: 3 Phase (7) Wafer sensors Transfer chamber: Robot unit: HP Blade type: Metal Upper & lower motor (2) Gate valves Cryo pump: 3 Phase (6) Wafer sensors Chamber A: Pass through Chamber B: Cool down Chamber A / B: Lid type: Clear plastic Wafer lift Wafer lift hoop No TC monitor Chamber E / F: Oreintor degas Degas lamp module Wafer lift Wafer lift hoop Wafer chuck Orientor controller PCB Laser tub missing Laser CCD array PCB No TC No TC amp Chamber 1: PVD Wide body Source assy: 11.3" Source bracket kit Coh ti adaptor plate Wafer lift: Clamp Heater: Clamp Heater water box: Clamp Manometer: MKS 100 mT Ar Backside (2) Gate valves Ion gauge Shutter option Cryo pump: 3 Phase Heater type: Clamp Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic 1/8 poly line set Chamber 2: PVD Wide body Source assy, 11.3" Source bracket kit Adaptor plate: WB to STD 13" Wafer lift: Clamp Heater: Clamp Heater water box: Clamp Manometer: MKS 100 mT Ar Backside (2) Gate valves Ion gauge Shutter option Cryo pump: 3 Phase Heater type: Clamp Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic: 1/8 Poly line set Chamber 3 / 4: PVD Wide body Source assy: 11.3" Source bracket kit Adaptor plate: WB to STD 13" Wafer lift: Clamp Heater: Clamp Heater water box: Clamp Manometer: MKS 100 mT Convectron gauge Ar Backside (3) Gate valves: PVD Ion gauge Shutter option Cryo pump: 3 Phase Heater type Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic: 1/8 Poly line set Chamber C: PCII Etch Resonator Pedestal lift MKS Manometer Convectron gauge Ion gauge Turbo pump Wafer lift RF Match No process kit Chamber 1,2,3,4 & C: Gas panel assy MFC: (STEC 4400) MFC Down steam valve Manual shut off valve MFC Control cable MFC Inter-connect PCB Sub-module: Cryo compressor: CTI 9600 & 8500 (2) Cryo controllers: 3 Phase Chiller: NESLAB III Vacuum pump System pump: BOC EDWARDS QDP40 PCII Pump: BOC EDWARDS QDP40 + MB250 System rack: VEM SBC Video SEI (12) DIO AI (2) AO (3) Opto PCB (2) AI Mux Cryo temp /AI MUX (4) Steppers PCB TC Gauge PCB (2) Ion gauge PCB (4) Invertron gauge PCB OMS PCB Hard disk FD Disk (4) 2-Phase HTR lift drivers (6) 5-Phase robot drives RF Rack: RF/DC Rack Turbo controller (5) ISO AMP (4) DC/RF Generator interlocks PCB DC Power supply DC Generator: Model ADVANCE ENERGY MDX-L series RF Generator CPS 1001 RF Generator RFPPLF10A AC Rack type: 480 VAC, 3 Phase, 4+1 Wire with transformer DC Power supply: +5 VDC / +24 VDC DC Power supply: +/-15 VDC / +/-12 VDC 2000 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一種氣體必需的原位蝕刻反應器,用於半導體加工和模具應用。它旨在利用惰性氣體或反應性氣體以及優化的基板到天線設計,為蝕刻應用提供最佳的均勻性和可靠性。AKT Endura 5500的特點是具有雙基底能力的反應堆,同時具有下腔和上腔。下室針對高速蝕刻和沈積過程進行了優化,而上室為需要更精確控制的蝕刻和沈積過程提供了更大的工藝窗口。AMAT ENDURA 5500配備了低噪聲、低功率、主動冷卻的等離子體,為各種蝕刻和沈積過程提供了可靠的操作。內置的動態壓力控制允許調節射頻功率,以保持最佳的過程均勻性和可靠性。APPLICED MATERIALS Endura 5500利用超聲波變頻技術,保證基板的均勻加熱,聚合物等有機材料的均勻蝕刻。APPLIED MATERIALS ENDURA 5500反應堆的寬帶能力使用戶能夠最大限度地提高其工具的吞吐量和利用率,同時優化其性能。AMAT/APPLIED MATERIALS/AKT ENDURA 5500還具有多種先進的工藝監測系統,包括光發射光譜、熱成像和光學顯微鏡分析。使用AKT ENDURA 5500,用戶可以實時監控關鍵流程參數,並根據需要進行調整,從而實現更好的流程控制和優化。該系統易於使用、精度高,為直接控制和監控所有主要工藝參數提供了廣泛的可編程性。為了安全可靠的操作,AMAT Endura 5500還包括內置安全系統,配有安全聯鎖和防護硬件,以保護操作員和設備免受意外危險。它包括各種運動和熱控制系統,允許用戶根據自己的特定需求進行配置。Endura 5500還提供了一個自動化的維護系統,以確保它保持在最佳狀態,並為最佳蝕刻和沈積操作做好準備。
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