二手 AMAT / APPLIED MATERIALS Endura 5500 #9241831 待售
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ID: 9241831
晶圓大小: 6"
優質的: 2000
System, 6"
Load lock chamber:
LLC Type: Narrow body
Indexer without rotation
Wafer mapping
CH Vent: Slow / Fast vent
No wafer slide out detector
Buffer chamber:
Robot unit: HP
Blade type: Metal
Upper & lower motor
(2) Gate valves
Cryo pump: 3 Phase
(7) Wafer sensors
Transfer chamber:
Robot unit: HP
Blade type: Metal
Upper & lower motor
(2) Gate valves
Cryo pump: 3 Phase
(6) Wafer sensors
Chamber A: Pass through
Chamber B: Cool down
Chamber A / B:
Lid type: Clear plastic
Wafer lift
Wafer lift hoop
No TC monitor
Chamber E / F: Oreintor degas
Degas lamp module
Wafer lift
Wafer lift hoop
Wafer chuck
Orientor controller PCB
Laser tub missing
Laser CCD array PCB
No TC
No TC amp
Chamber 1: PVD Wide body
Source assy: 11.3"
Source bracket kit
Coh ti adaptor plate
Wafer lift: Clamp
Heater: Clamp
Heater water box: Clamp
Manometer: MKS 100 mT
Ar Backside
(2) Gate valves
Ion gauge
Shutter option
Cryo pump: 3 Phase
Heater type: Clamp
Chamber harness
Chamber inter-connect PCB
Chamber process gas line
Chamber vent line
Chamber source water manifold
Chamber pneumatic 1/8 poly line set
Chamber 2: PVD Wide body
Source assy, 11.3"
Source bracket kit
Adaptor plate: WB to STD 13"
Wafer lift: Clamp
Heater: Clamp
Heater water box: Clamp
Manometer: MKS 100 mT
Ar Backside
(2) Gate valves
Ion gauge
Shutter option
Cryo pump: 3 Phase
Heater type: Clamp
Chamber harness
Chamber inter-connect PCB
Chamber process gas line
Chamber vent line
Chamber source water manifold
Chamber pneumatic: 1/8 Poly line set
Chamber 3 / 4: PVD Wide body
Source assy: 11.3"
Source bracket kit
Adaptor plate: WB to STD 13"
Wafer lift: Clamp
Heater: Clamp
Heater water box: Clamp
Manometer: MKS 100 mT
Convectron gauge
Ar Backside
(3) Gate valves: PVD
Ion gauge
Shutter option
Cryo pump: 3 Phase
Heater type
Chamber harness
Chamber inter-connect PCB
Chamber process gas line
Chamber vent line
Chamber source water manifold
Chamber pneumatic: 1/8 Poly line set
Chamber C: PCII Etch
Resonator
Pedestal lift
MKS Manometer
Convectron gauge
Ion gauge
Turbo pump
Wafer lift
RF Match
No process kit
Chamber 1,2,3,4 & C:
Gas panel assy
MFC: (STEC 4400)
MFC Down steam valve
Manual shut off valve
MFC Control cable
MFC Inter-connect PCB
Sub-module:
Cryo compressor: CTI 9600 & 8500
(2) Cryo controllers: 3 Phase
Chiller: NESLAB III
Vacuum pump
System pump: BOC EDWARDS QDP40
PCII Pump: BOC EDWARDS QDP40 + MB250
System rack: VEM
SBC
Video
SEI
(12) DIO
AI
(2) AO
(3) Opto PCB
(2) AI Mux
Cryo temp /AI MUX
(4) Steppers PCB
TC Gauge PCB
(2) Ion gauge PCB
(4) Invertron gauge PCB
OMS PCB
Hard disk
FD Disk
(4) 2-Phase HTR lift drivers
(6) 5-Phase robot drives
RF Rack:
RF/DC Rack
Turbo controller
(5) ISO AMP
(4) DC/RF Generator interlocks PCB
DC Power supply
DC Generator: Model ADVANCE ENERGY MDX-L series
RF Generator CPS 1001
RF Generator RFPPLF10A
AC Rack type: 480 VAC, 3 Phase, 4+1 Wire with transformer
DC Power supply: +5 VDC / +24 VDC
DC Power supply: +/-15 VDC / +/-12 VDC
2000 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一種氣體必需的原位蝕刻反應器,用於半導體加工和模具應用。它旨在利用惰性氣體或反應性氣體以及優化的基板到天線設計,為蝕刻應用提供最佳的均勻性和可靠性。AKT Endura 5500的特點是具有雙基底能力的反應堆,同時具有下腔和上腔。下室針對高速蝕刻和沈積過程進行了優化,而上室為需要更精確控制的蝕刻和沈積過程提供了更大的工藝窗口。AMAT ENDURA 5500配備了低噪聲、低功率、主動冷卻的等離子體,為各種蝕刻和沈積過程提供了可靠的操作。內置的動態壓力控制允許調節射頻功率,以保持最佳的過程均勻性和可靠性。APPLICED MATERIALS Endura 5500利用超聲波變頻技術,保證基板的均勻加熱,聚合物等有機材料的均勻蝕刻。APPLIED MATERIALS ENDURA 5500反應堆的寬帶能力使用戶能夠最大限度地提高其工具的吞吐量和利用率,同時優化其性能。AMAT/APPLIED MATERIALS/AKT ENDURA 5500還具有多種先進的工藝監測系統,包括光發射光譜、熱成像和光學顯微鏡分析。使用AKT ENDURA 5500,用戶可以實時監控關鍵流程參數,並根據需要進行調整,從而實現更好的流程控制和優化。該系統易於使用、精度高,為直接控制和監控所有主要工藝參數提供了廣泛的可編程性。為了安全可靠的操作,AMAT Endura 5500還包括內置安全系統,配有安全聯鎖和防護硬件,以保護操作員和設備免受意外危險。它包括各種運動和熱控制系統,允許用戶根據自己的特定需求進行配置。Endura 5500還提供了一個自動化的維護系統,以確保它保持在最佳狀態,並為最佳蝕刻和沈積操作做好準備。
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