二手 AMAT / APPLIED MATERIALS Endura 5500 #9257162 待售
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ID: 9257162
Sputtering system, 6"
Load lock chamber:
LLC Type: Narrow body
Indexer without rotation
Wafer mapping
CH Vent: Slow / Fast vent
No wafer slide out detector
Buffer chamber:
AGILENT / HP / HEWLETT-PACKARD Robot
Upper and lower motors
(2) Gate valves
Cryo pump: 3 Phase
(7) Wafer sensors
Transfer chamber:
AGILENT / HP / HEWLETT-PACKARD Robot
Upper and lower motors
(2) Gate valves
Cryo pump: 3 Phase
(6) Wafer sensors
Chamber A: Pass through
Chamber B: Cool down
Chamber A / B:
Lid type: Clear plastic
Wafer lift
Wafer lift hoop
No TC monitor
Chamber E / F: Orienter degas
Degas lamp module
Wafer lift
Wafer lift hoop
Wafer chuck
Orienter controller PCB
Laser CCD array PCB
No TC
No TC amp
Chamber 1: PVD Wide body
Source assy: 11.3"
Source bracket kit
COH TI Adapter plate
Wafer lift: Clamp
Heater: Clamp
Heater water box: Clamp
MKS 100 mT Manometer
Ar Backside
(2) Gate valves
Ion gauge
Shutter option
Cryo pump, 3 Phase
Heater type: Clamp
Chamber harness
Chamber inter-connect PCB
Chamber process gas line
Chamber vent line
Chamber source water manifold
Chamber pneumatic 1/8 poly line set
Chamber 2: PVD Wide body
Source assy, 11.3"
Source bracket kit
Adapter plate: WB to STD 13"
Wafer lift: Clamp
Heater: Clamp
Heater water box: Clamp
MKS 100 mT Manometer
Ar Backside
(2) Gate valves
Ion gauge
Shutter option
Cryo pump: 3 Phase
Chamber harness
Chamber inter-connect PCB
Chamber process gas line
Chamber vent line
Chamber source water manifold
Chamber pneumatic: 1/8 Poly line set
Chamber 3 / 4: PVD Wide body
Source assy: 11.3"
Source bracket kit
Adapter plate: WB to STD 13"
Wafer lift: Clamp
Heater: Clamp
Heater water box: Clamp
MKS 100 mT Manometer
Convectron gauge
Ar Backside
(3) Gate valves: PVD
Ion gauge
Shutter option
Heater type
Chamber harness
Chamber inter-connect PCB
Chamber process gas line
Chamber vent line
Chamber source water manifold
Chamber pneumatic: 1/8 Poly line set
Chamber C: PCII Etch
Resonator
Pedestal lift
MKS Manometer
Convectron gauge
Ion gauge
Turbo pump
Wafer lift
RF Match
No process kit
Chamber 1, 2, 3, 4, C:
Gas panel assy
MFC: STEC 4400
MFC Down steam valve
Manual shut off valve
MFC Control cable
MFC Inter-connect PCB
Sub-module:
CTI-CRYOGENICS 9600 Cryo compressor
(2) Cryo controllers: 3 Phase
NESLAB III Chiller
Vacuum pump
System pump: BOC EDWARDS QDP40
PCII Pump: BOC EDWARDS QDP40 + MB250
System rack: VEM
SBC
SEI
(12) DIO
AI
(2) AO
(3) Opto PCB
(2) AI MUX
Cryo temp / AI MUX
(4) Steppers PCB
TC Gauge PCB
(2) Ion gauges PCB
(4) Invertron gauges PCB
OMS PCB
Hard Disk Drive (HDD)
Floppy Disk Drive (FDD)
(4) HTR Lift drivers, 2-Phase
(6) Robot drives, 5-Phase
RF Rack:
RF / DC Rack
(5) ISO Amp
(4) DC / RF Generator interlocks PCB
DC Power supply
ADVANCED ENERGY MDX-L12 DC Generator
CPS 1001 RF Generator
RFPPLF10A RF Generator
Missing parts:
Metal blades
Laser tubes
Heater type: Clamp
Cryo pump, 3 Phase
Turbo controller
RF / DC Rack
ADVANCED ENERGY MDX-L Series DC Generator
RF Generator, 13.56 MHz / 400 kHz
Power supply:
AC Rack type: 480 VAC, 3 Phase, 4+1 Wire with transformer
DC Power supply: +5 VDC / +24 VDC
DC Power supply: +/-15 VDC / +/-12 VDC
2000 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一種用於濕蝕刻的基於半導體的高密度等離子體反應器。該反應器的設計是為了在先進集成電路的生產和工程中提供卓越的均勻性。它提供了廣泛的等離子體資源選項,以及最先進的過程控制和監控功能。AKT Endura 5500操作系統旨在減少工藝偏差,同時提高性能和產量。AMAT ENDURA 5500被設計為具有氮化氙(GaN)蝕刻工藝。它具有二極管泵浦脈沖等離子體源模塊、過程控制模塊和蝕刻模塊。脈沖等離子體源是一種高壓高效裝置,能夠對等離子體參數進行精細控制,提高蝕刻性能。工藝控制模塊為各種生產要求提供了靈活性。它能夠控制多種氣體管線和輸送閥,以及方便地實時切換多個蝕刻參數,如氣壓、壓板電壓、蝕刻時間、壓板電壓偏置、腔室溫度等。蝕刻模塊的設計具有靈活性、蝕刻過程的加速度和蝕刻圖案的均勻性。它具有可復制的印版設計,以減少潛在的工藝偏差,同時還支持針對特殊蝕刻工藝的特定印版設計。AKT ENDURA 5500是一種高度可靠的反應堆,維護要求低。它能夠實現低缺陷率,同時保持高產品產量。該反應堆設計易於使用,具有直觀的用戶界面,以及簡單、分步的工藝支持。它為工藝工程師和生產人員提供了有關工藝結果的寶貴反饋,從而加快了周期時間並提高了產量。該反應堆還設計用於生產和工程過程參數的長期穩定性和可重復性。總體而言,AMAT Endura 5500是一種用於濕蝕刻的高度先進、可靠、易於使用的高密度等離子體反應器。它旨在提供改進的過程控制、統一的蝕刻模式和提高的產品產量。它可實現更輕松、更快和可重復的過程,同時還為工程師和生產人員提供有關過程結果的寶貴反饋。
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