二手 AMAT / APPLIED MATERIALS Endura 5500 #9304004 待售
網址複製成功!
單擊可縮放
ID: 9304004
晶圓大小: 6"
優質的: 1997
System, 6"
MF Facilities: Rear
Heat exchanger: NESLAB I
Buffer robot type: HP
Transfer robot type: HP
Hard Disk Drive (HDD): SCSI
Buff robot blade: Ceramic
Wafer sensor: Mini beam
Loadlock type: Narrow body without tilt out
Transfer robot blade: Metal
Signal tower: 3 Color
System umbilicals: 25 ft
EMO
No GEM
No OTF
Controller
Generator rack
(2) CTI-CRYOGENICS 9600 Compressors
CTI-CRYOGENICS Motor controller: 3 Phase
EBARA A07V Pump
Main AC box
Transformer: 200 VAC,3 Phase, 50/60 Hz
MF Enclousure cover installed
MF Gas box
Laser assy
OB- 8F Cryo pump: Enhanced type
Process lift: Motorize type
SBC BD Type: V452
Buffer / Transfer: VHP Conversion possible type
MF Facility box
UPS: Interface type
Chamber A:
Type: PC-II
ADVANCED ENERGY LF10A RF Generator
COMDEL CPS1001S RF Generator
Gas valves: Nupro
Manometer: 100m Torr
LEYBOLD Turbovac 361C Pump
Lid: Resonator
Match box, 6"
LEYBOLD Turbotronic 150 / 360 Turbo controller
EBARA A07V Pump
Gasses:
LEYBOLD Turbo pump
MFC Size / Gas name / MFC Type
300 / Ar / Stec 4400
20 / Ar / Stec 4400
Chamber B:
Type: Cool down
Gas valves: Nupro
Heater / Cathode cooling: PCW
Lid modified to Quartz lid
Chamber 1:
Process: TTN
Type: STD Body
Manometer configuration: Single
Manometer: 100m Torr
No shutter option
Lid type: 11.3"
ADVANCED ENERGY MDX-L12-650 DC Power supply
Susceptor / Pedestal: 101
3-Position gate valve
OB-8F Pump: 3 Phase
Ion gauge: Nude type
Lift type: Basic motorize type
Gasses:
Gas / MFC Size / Gas name / MFC Type / Qty / Gas stick configuration
Gas 1 / 200 SCCM / N2 / Stec 4400 / (2) / Manifolds
Gas 2 / 100 SCCM / Ar / Stec 4400 / (2) / Manifolds
Gas 3 / 200 SCCM / N2 / Stec 4400 / (2) / Manifolds
Chamber 2:
Process: AL
Type: STD Body
Manometer configuration: Single
Manometer: 100m Torr
No shutter option
Lid type: 11.3"
ADVANCED ENERGY MDX-L12M Power supply
ADVANCED ENERGY MDX-L12 Power supply
Susceptor / Pedestal: 4F
Heater / Cathode cooling: NESLAB I
3-Position gate valve
OB-8F Pump: 3 Phase
MKS Residual gas analyzer installed
Lift type: Basic motorize type
Gasses:
Gas / MFC Size / Gas name / MFC Type / Gas stick configuration
Gas 1 / 100 SCCM / Ar / Stec 4400 / Standard
Gas 2 / 100 SCCM / Ar / Stec 4400 / Standard
Chamber 3:
Process: Ti
Type: STD Body
Manometer configuration: Single
Manometer: 100m Torr
No shutter option
Lid type: 11.3"
ADVANCED ENERGY MDX-10K DC Power supply
Susceptor / Pedestal: 101
3-Position gate valve
OB-8F Pump: 3 Phase
Lift type: Basic motorize type
Gasses:
Gas / MFC Size / Gas name / MFC Type / Qty / Gas stick configuration
Gas 1 / 200 SCCM / N2 / Stec 4400 / (2) / Manifolds
Gas 2 / 100 SCCM / Ar / Stec 4400 / (2) / Manifolds
Gas 3 / 200 SCCM / N2 / Stec 4400 / (2) / Manifolds
Chamber 4:
Process: TTN
Type: STD Body
Manometer configuration: Single
Manometer: 100m Torr
No shutter option
Lid type: 11.3"
ADVANCED ENERGY MDX-650 HiZ DC Power supply
Susceptor / Pedestal: 101
3-Position gate valve
OB-8F Pump: 3 Phase
Lift type: Basic motorize type
Gasses:
Gas / MFC Size / Gas name / MFC Type / Qty / Gas stick configuration
Gas 1 / 200 SCCM / N2 / Stec 4400 / (2) / Manifolds
Gas 2 / 100 SCCM / Ar / Stec 4400 / (2) / Manifolds
Gas 3 / 20 SCCM / Ar / Stec 4400 / (2) / Manifolds
Missing parts for chamber 1:
Drive: 2 Phase
Motor
Gear box
Gear box mount
Belt
Slot / Top rack boards:
1 / SBC Board
2 / Videl board
3 / OMS Board
4 / DI/O Board
5 / DI/O Board
6 / DI/O Board
7 / DI/O Board
8 / DI/O Board
9 / DI/O Board
10 / SEI Board
11 / No 486C
12 / No seriplex
13 / No DI/O board
14 / No AO board
15 / Stepper board
16 / No spare
17 / No spare
18 / Stepper board
19 / AI Board
20 / AO Board
21 / AO Board
22 / Hard Disk Drive (HDD)
23 / No grounding JAC
24 / Convectron board
25 / Convectron board
26 / Convectron board
27 / Convectron board
28 / No TC
29 / No TC
30 / ION Gauge board
31 / ION Gauge board
32 / No spare
33 / DI/O Board
34 / DI/O Board
35 / DI/O Board
36 / DI/O Board
37 / DI/O Board
38 / No DI/O board
39 / No DI/O board
40 / Floppy Disk Drive (FDD)
41 / No spare
42 / Cryo temp
43 / AI Mux
44 / AI Mux
45 / No AI Mux
46 / No spare
47 / Opto detect board
48 / Opto detect board
49 / Opto detect board
50 / No spare
UPS: 200 VAC, 3 Phase, 50/60 Hz, 350 A
1997 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一種高通量、功能齊全的外延反應器,設計用於半導體生產。AKT Endura 5500具有全自動裝載機/卸載機和多個處理室,可實現快速的過程設置和優化的過程一致性。AMAT ENDURA 5500旨在為小直徑和大直徑外延晶片提供高通量。AMAT Endura 5500支持多種工藝化學方法,包括化學氣相沈積(CVD)和分子束外延(MBE),用於各種材料的生長,包括矽、矽、碳摻雜矽和其他化合物。這種靈活性適應了多種產品的生產,包括傳統邏輯器件、MEMS(微機電系統)、高級邏輯和光電元件。該系統具有獨特的單源遙控器,簡化了流程設置,並允許對最多三個APPLIED MATERIALS ENDURA 5500系統進行全面遠程監控。這包括實時訪問多個工藝參數,如溫度、增長率和工藝壓力,此外還允許用戶直接公司工藝室。這些數據對於快速查找和排除流程問題非常寶貴。ENDURA 5500提供了多種工藝室配置、受限制的木筏和箱體尺寸,允許快速、高效的晶圓循環和大批量生產。受約束的木筏具有增強的均勻性控制功能,允許以梯田方式鋪設晶片,以確保整個晶片的熱均勻性一致。使用高度集成的攝像頭系統,可以使用四、六、八和十二英寸晶片進行自動晶片對準,從而確保晶片處理和處理的一致性和準確性。APPLIED MATERIALS Endura 5500還擁有一個完全自動化的晶圓處理模塊,消除了耗時的手動晶圓處理和加載。這包括Endura 5500的簽名旋轉卡帶傳輸系統,允許連續自動裝卸多達十個晶圓卡帶,不間斷生產。總體而言,AKT ENDURA 5500是一種頂級的、功能齊全的外延反應堆,專為快速、大容量的晶圓生產而設計。該裝置配備了最新的工藝室性能和自動晶片加載,以及遠程監控和優化的均勻性控制,所有這些都確保了一致、可靠的生產。
還沒有評論