二手 AMAT / APPLIED MATERIALS Endura CL #293752793 待售

AMAT / APPLIED MATERIALS Endura CL
ID: 293752793
晶圓大小: 12"
優質的: 2002
PVD Metal system, 12" AMAT / APPLIED MATERIALS 0190-08815 622000096-1 Endura CVCF AMAT / APPLIED MATERIALS 0015-04420 DI Chiller EFEM: (3) AMAT / APPLIED MATERIALS 85-3000-0307-01 Load ports YASKAWA XU-RCM6801 G28001-1-14 Handler robot YASKAWA XU-CN1112A S2M988-5-02 Robot controller YASKAWA XU-ACL4203 S13537-3-01 Ball screw TERA TVC-1R-01 AB11110361 Remote controller AMAT / APPLIED MATERIALS 0190-05111 Control video switch (3) MAXON 143849 DC Servo motors (3) KG AUTO KGP-JD2G LED Lamps MOELLER PKZM0-25 Thermal magnetic circuit breaker TM: AMAT / APPLIED MATERIALS DDM-005X-DN-AM3 9101-1999 Electrocraft servo drive AMAT / APPLIED MATERIALS 404419R Enhanced HT Wrist AMAT / APPLIED MATERIALS 404557R 0010-31156 Enhanced HT Wrist AMAT / APPLIED MATERIALS 0040-50505-002 13118101-203 Slit valve housing AMAT / APPLIED MATERIALS 0010-22609 119503 Slit valve AMAT / APPLIED MATERIALS 0010-1041-01R KSM-060206 Slit valve GRANVILLE 354001 1559 Gauge controller CTI 8113212G001 F0908552 On-board P300 Module CTI 8113212G001 H1009443 On-board P300 Module MDC AV-153-P 01-53564 Pneumatic angle valve PANASONIC FX-300 Series Digital fiber optic sensor NSK M-JSG014DN504 GJ6Y062 Mega torque motor AMAT / APPLIED MATERIALS XBR-2310 AC Servo motor Chamber 1: CTI PG03.00 L05407998 On-board P300 Cryopump CTI 8113212G001 B0908336 On-board P300 Module AMAT / APPLIED MATERIALS CDS-099 400822-PJ-LCMD Lower chamber module AMAT / APPLIED MATERIALS 0010-09628 1096800 SPELLMAN X2784 41254-1-A01063 Power supply AMAT / APPLIED MATERIALS 18902-13 400822-PJ-CCMD Controller Chamber 2: CTI 8116250G001 F03151808 On-board P300 Cryopump CTI 8113212G001 E0807402 On-board P300 Module 8127303G001 Drive unit assembly P300 MDC AV-150M-P03 02-55365 Pneumatic angle valve MKS Baratron 627A1TBD 821109 Pressure transducer AMAT / APPLIED MATERIALS 0021-21164 11362101 Bracket, sensor, shutter Chamber 3: AMAT / APPLIED MATERIALS 0010-14529 3420304 PVD Source chamber top AMAT / APPLIED MATERIALS MII-403-0606 404557-PJ-LCM1 300mm RPC Assembly MKS Baratron 627A 1TBD 001057274 Pressure transducer SMC 1082300 B11262002-29832 Valve supplier R.T.LAIRD INC 188123 1-800-231-7983 SVF 0010-13532 300637-3103-31030004 Flow control AMAT / APPLIED MATERIALS 0090-00412 S03-36-19 Motor stepper assy AMAT / APPLIED MATERIALS 0040-06374 11362101 Motor stepper assy MKS UHV-25-AKC-ENVN 0325476992 Angle valve CORCOM F7299 EMI filter Degas chamber (Chamber E): CTI 8116273G001 1010CHE10707 On-board P300 Cryopump CTI 8113212G001 C0908419 On-board P300 Module AMAT / APPLIED MATERIALS 0010-21740 Assy TC amp 7018012 TC Gauge Degas chamber (CH-F): CTI 8116273G001 I05376835 On-board P300 Cryopump CTI 8113212G001 C0908416 On-board P300 Module AMAT / APPLIED MATERIALS 0010-21740 Assy TC amp SMC&AMAT / APPLIED MATERIALS NCDQ2WB63-UIA97 0110 Pneumatic cylinder SMC&AMAT / APPLIED MATERIALS NCDQ2B80-UIA990939 3020-01052 Pneumatic cylinder SMC&AMAT / APPLIED MATERIALS 944AOPLPNCSFSFF 42600719 Pneumatic cylinder SMC&AMAT / APPLIED MATERIALS NCDQ2WB63-UIA97 939 Pneumatic cylinder SMC&AMAT / APPLIED MATERIALS 0040-76520 300351-333-0023 Pneumatic cylinder lift assembly CTI 8112030G002 Roughing valve Diaphragm valve 8127082-G001 Purge valve Generator rack: ENI 0190-19810 DCG-400Z-0J Master DC Power supply ENI 0190-07969 DCG-200Z-S0J Slave DC Power supply ENI 0190-09832 GHW12Z-13DF2N0-001 RF Generator CVCF: Eaton MDL3800F 4203B99G03 Circuit breaker AMAT / APPLIED MATERIALS 400822-PJ-PROJ 0190-06075 Load center 2002 vintage.
AMAT/APPLIED MATERIALS Endura CL是一種最先進的金屬有機化學氣相沈積(MOCVD)反應器,旨在為各種復合半導體(CS)薄膜和器件層提供卓越的性能。AMAT Endura CL設備是現有最先進的MOCVD反應器,提供了最高質量的復合半導體薄膜沈積。APPLICED MATERIALS ENDURA CL系統的設計目的是提供最大的均勻薄膜厚度,在整個晶片表面上具有精確的層層厚度控制和沈積質量均勻性。該反應堆經過精心設計,能夠很好地控制具有復雜流動特性的前體物質流動,包括渦輪混合、低流量和低壓前體輸送。該反應堆還具有高功率、高通量生產能力和快速調整工藝條件以達到所需材料性能的能力。Endura CL反應器采用垂直沈積室設計,確保所有晶片上均勻的前體分布,以及沈積過程中的垂直逸出路徑,從而促進消除所有反應副產物。這種先進的設計可以有效地沈積材料,同時保持當地最高質量。該反應器還具有加熱敏感器,以促進均勻晶圓溫度,並減少由於溫度變化而增加的材料電阻率。AMAT/APPLIED MATERIALS Endura CL反應器還具有均勻沈積速率、溫度控制和工藝控制能力的組合。AMAT Endura CL具有數控致動單元,為編程過程參數和優化提供了用戶友好界面。采用先進的電化學傳感器機器,對工藝條件進行持續監測,以確保最高質量的結果。此外,APPLIED MATERIALS Endura CL反應堆利用高壓電源為其電氣子系統供電,從而降低功耗和成本。總體而言,Endura CL是一種先進的MOCVD反應器,其設計目的是為用戶提供用於復合半導體薄膜和器件層的最高質量的薄膜沈積。AMAT/APPLIED MATERIALS Endura CL反應器以其先進的設計、精密的逐層厚度控制和高功率的性能,是在沈積應用中尋求優良的均勻膜性能和工藝控制的理想工具。
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