二手 AMAT / APPLIED MATERIALS Endura II #9315363 待售
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ID: 9315363
晶圓大小: 12"
PVD System, 12"
Wafer type: Notch
3E Impulse AIN System
Chamber location / Option
Level 1 / Endura II
Level 2 / Emerging
Position 1 / Impulse ALN
Position 4 / Impulse ALN
Position A / Cool down
Position B / Cool down
Mainframe
Motion controller
Particle management package
Chamber cool down gas lines
Single wafer load locks: HT SWLL without DEGAS module
XP Robot with enhanced high temperature wrists
Metal robot blade
Rack
CTI-CRYOGENICS Cryo Pump
(2) Cryo compressors
Cryo compressor voltage: 400 V - 480 V
Cryo helium lines: 75 ft
Heat exchanger hose: 75 ft
MFC Type: GF 125
Factory interface:
Front end module
Platform application: CPI
Gen 4 with KVM server and user interface
UPS
HT SWLL With STD / Opera
OHT WIP Delivery
(2) SELOP 7 Load ports
Info pad position: A / B
Colored lights
(8) Lights load port operator interface
E99 Carrier reader: TIRIS With RF
Upper E84 Data logging sensors and cables
Operator access switch
Top air intake systems
(4) Colors light tower
Rack
System monitors:
Flat panel monitor, 19"
Keyboard
Cables: 15 ft with 6 ft effective
Remote flat panel monitor, 19"
Cables: 75 ft with 65 ft effective
Impulse: Position (1, 4)
Biasable wafer pedestal HV E-Chuck
Shutter
Baratron gauge size: 100 mTorr
RGA Valve manual
Turbo cryo pump with water trap
DEGAS RGA Valve manual
(4) EBARA AA70W Pumps
(2) ADIXEN A100L Pumps
Rough pump voltage: 208 V
Umbilical:
AC Rack to mainframe: 75 ft
AC Rack to HX: 75 ft
AC Rack to rough pump: 75 ft
Mainframe to equipment rack: 75 ft
Power supply: 10 kW, DC.
AMAT/APPLIED MATERIALS/AKT Endura II是一種先進的等離子體蝕刻反應堆,設計用於廣泛的動力和工藝項目。該反應器是深層各向異性、定向蝕刻、沈積、氧化和低溫分解的理想選擇。該系統利用高真空蒸發量同時沈積多達四種不同的沈積材料。它采用先進的氣體輸送和先進的等離子體控制。AKT Endura II能以每立方英尺0.1至5.5毫克的真空水平運行,使其能夠進行快速、精確的沈積過程。AMAT Endura II專為高功率應用而設計,能夠以高達10,000瓦的功率級別運行。它具有獨立的電極傾斜度,提供蝕刻速率和均勻度的角度依賴性控制。Endura II還具有先進的洗滌器和過濾系統,以減少顆粒汙染和降低系統維護要求。對於蝕刻和其他PW工藝,APPLIED MATERIALS Endura II利用雙電感線圈產生高密度、用於蝕刻的軟等離子體,以及用於沈積厚膜塗層的高功率電感。AMAT/APPLICED MATERIALS/AKT Endura II還具有應用額外線圈以提供高度定向蝕刻的能力。AKT Endura II具有無汙染的石英噴嘴和管狀結構,允許低壓處理。通過不斷地通過石英過濾器排出裝有顆粒的氣體,這種設計消除了關閉系統定期清潔腔室的需要。AMAT Endura II的創新技術允許精確和可重復的工藝,提供卓越的蝕刻、沈積和氧化能力。它還可以模擬100至1600°C的各種溫度,允許廣泛的獨特應用。Endura II非常適合需要高功率、可重復過程和低溫沈積的應用。它具有處理各種材料和基材的能力,並且可以根據尺寸、復雜性和功率要求在不同的復雜級別上使用。
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