二手 AMAT / APPLIED MATERIALS ENDURA #9235921 待售
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ID: 9235921
晶圓大小: 8"
優質的: 2006
PVD System, 8"
Product wafer
Wafer shape: SNNF
Controller & system AC
Single Bd computer in controller: V452
EMO Function: Turn to release
Emergency off label
EMO Button guard rings
Shunt trip option
Smoke detector
Facility water flow interlock
Robot & monolith:
Buffer robot: HP
Transfer robot: VHP
Transfer robot blade: Original metal
Buffer robot blade: Original metal
Monolith bakeout heater DBI intk
UHV Pump:
Cryo pump: ONBOARD 8F
System monitor:
Monitor 1: Stand alone
Monitor 1: Cable length, 50'
No monitor select switch
Loadlock and cassette:
Loadlock type: Narrow body
Type: Index / Handler
Loadlock vents: Variable speed soft vent
LL Open / Close switch
Generator rack:
2nd Generator rack installed
2nd Generator rack smoke detector
2nd Generator rack water leak detector
Cable length, 1st to 2nd generator rack, 6'
2nd Generator rack water flow intk
Support equipment:
Neslabs
Neslab water resistivity indicator: Resistivity meter
Neslab drain port valve
No BOC heat exchanger on system
Cryo compressors: Water cooled
(2) Cryo compressors
Cryo lines: 3/4" x 50'
Cryopump controller type: 3 Phase controller
Cryopump water fittings
Signal cable length:
Mainframe to system controller, 50'
Mainframe to generator rack, 50'
Mainframe to cryo compressor, 50'
Main AC to system controller / System AC, 50'
System controller / System AC to prim gen rack, 50'
Main AC to prim gen rack, 50'
Main AC to pump frame, 50'
Main AC to neslab heat exchanger, 50'
Miscellaneous:
Water fittings: SST
Ar / N2 Vent manifold
Air fittings, 3/8"
Swagelok water & air fittings
System roughing pumps
EBARA Pump IF smart
Communications interface: GEM / SECE II
Cooldown chamber rough pump options:
EBARA Pump IF smart
System electrical:
Top control AC power feed
Circuit breaker: 343.8 A
Line frequency: 60 Hz
Small main AC power inlet hole
Line voltage: 208 V
2006 vintage.
AMAT/APPLIED MATERIALS ENDURA是一種用於制造半導體零件的高精度反應器。它專為卓越的工藝一致性和卓越的設施吞吐量而設計,能夠為各種應用生產最優質的組件。AMAT ENDURA是一種三室PECVD（等離子體增強化學氣相沈積）設備，能夠產生高質量、均勻的電介質、聚合物和其他薄膜層。通過使用高度先進和通用的反應物濃度，應用材料ENDURA能夠在廣泛的工藝參數上提供優異的沈積性能。該系統允許建立和維護各種反應堆，從而能夠生產各種產品線中具有卓越統一性的精密半導體器件。ENDURA還提供了一些高級功能,例如數字邊緣服務器單元和自定義基板旋轉功能。這些功能使用戶在管理過程參數方面具有更大的靈活性,從而實現了更快的生產率和更高的可靠性。AMAT/APPLIED MATERIALS ENDURA還包括一個直觀的圖形用戶界面，使它易於控制和配置機器。AMAT ENDURA是一種高效的反應堆，可以保持極精確的溫度和壓力剖面。這樣可以確保材料保持在最佳水平，以最大限度地提高薄膜層的均勻性。APPLICED MATERIALS ENDURA還提供了最佳的電氣接地工具,確保了與零件的更好的電氣連接和卓越的制造效果。為保證物料層的均勻性，設計了一種可精確控制沈積過程基板運動和其他關鍵參數的ENDURA軟件。資產的配置也允許用戶為了優化生產而繞過某些流程，直觀的用戶界面允許快速簡單地導航模型。AMAT/APPLIED MATERIALS ENDURA是一款功能強大、先進、精密的PECVD設備。生產均勻優質產品，設施吞吐量優越，是半導體制造的理想工具。該系統包括多種特性和功能,使其成為創建需要卓越一致性和準確性的電光設備、交換機、接收器和其他半導體組件的絕佳選擇。
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