二手 AMAT / APPLIED MATERIALS P5000 Mark II #9313058 待售

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ID: 9313058
晶圓大小: 8"
CVD System, 8" Gas panel facilities: Top feed multi-line Gas panel exhaust: Top feed Robot blade: Metal Wafer type: Notch Gas panel type: Version 4 hot box Liquid source: Hot box (3) TEOS Sources: Heated ampoule EMO's: Momentary Gas lines: (12) Lines Robot type: Standard System umbilicals: 25ft MF Facilities: Rear Mainframe: Phase II Load lock slit valves: Chemrez Heat exchanger 1: AMAT 0 VME Rack: Extended 21-slots Hard Disk Drive (HDD): 4.5 GB Chamber A: Type: CVD Universal Process A: BPSG TEOS Lid type: Single gas feed-thru Susceptor / Pedestal: TEOS Heater / Cathode cooling: AMAT 0 Process kit type: Undoped TEPO Slit valve O-ring: Chemraz Chamber O-rings: Chemraz HF Generator: OEM 12 B RF Match: Phase 4 CVD Dual manometer: Manometer 1: 10 Torr Manometer 2: 100 Torr Chamber A gasses: Gas / MFC Size / Gas name / MFC Type Gas 1 / 4 Slm / N2 / UNIT 1661 Gas 2 / 2 Slm / O2 / UNIT 1661 Gas 3 / 3 Slm / C2F6 / UNIT 1661 Gas 4 / 1.5 Slm / He / UNIT 1661 Remote 1: LFC Size / Liquid name / LFC Type / Gas stick 3 Slm / TEOS / UNIT 9660 / Nupro Chamber B: Type: CVD Universal Chamber process: PRSP Lid type: Single gas feed thru Susceptor / Pedestal: TEOS Heater / Cathode cooling: Steel head 0 Slit valve O-ring: Chemraz Chamber O-rings: Chemraz HF Generator: OEM 12 B RF Match: Phase 4 CVD Process kit type undoped TEOS Dual manometer: Manometer 1: 10 Torr Manometer 2: 20 Torr Chamber B gasses: Gas / MFC Size / Gas name / MFC Type Gas 1 / 5 Slm / N2 / UNIT 1661 Gas 2 / 3 Slm / O2 / UNIT 1661 Gas 3 / 2 Slm / C2F6 / UNIT 1661 Gas 4 / 1.5 Slm / He / UNIT 1661 Remote 1: LFC Size / Liquid name / LFC Type / Gas stick 3 Slm / TEOS / UNIT 9660 / Nupro Missing parts: Mini SBC board SBC Board A/I (3) DI/O Hot box components Gas box gas interface PCB Power supply: 208 VAC. 400 Amp, 50 Hz Transformer.
AMAT/APPLIED MATERIALS P5000 Mark II是一種前沿技術的加工反應器,用於各種蝕刻、薄膜沈積和熱處理過程。其腔室容積可達5升,最高工作溫度為950攝氏度。AMAT P5000 Mark II采用堅固的不銹鋼結構,並采用帶平面頂部的密封設計,便於長期傳熱效率。該設備還具有集成的溫度控制、零件存儲和自動清潔功能,可實現大批量生產。它的可編程循環控制能力還允許操作員輕松更改參數,以優化工藝條件,達到最大效率。APPLICED MATERIALS P 5000 MARK II可以定制,以容納各種類型的液體、氣體和固體用於其各種工藝。可用於化學氣相沈積(CVD)、物理氣相沈積(PVD)、光級化學蝕刻、定向蝕刻,以及熱處理。APPLIED MATERIALS P5000 Mark II的溫度也可以從室溫調節到950攝氏度,間隔為10度,允許分批處理過程的一致性。它還配備了內置的安全裝置,以防止氣體積聚或泄漏等任何危險事件。此外,P 5000 MARK II可以與AMAT專有的加工氣體結合,以最大限度地提高產品性能,提高系統的可靠性。該反應堆還具有直觀的觸摸屏界面,使操作員能夠快速、輕松地訪問控件。為了獲得更多安全和過程控制,P5000 Mark II具有一個內置數據記錄功能,可跟蹤操作參數、啟用遠程診斷,並在參數超出預設限制時發出警報。憑借其先進的特性,AMAT P 5000 MARK II是航天、汽車、醫療設備和先進工業應用的絕佳選擇。
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