二手 AMAT / APPLIED MATERIALS P5000 MxP+ #185395 待售
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ID: 185395
晶圓大小: 8"
優質的: 1994
Oxide etch system, 8"
(2) Chambers
Software Revision SBC Board Version V21
Mainframe cables Standard / Extended (length) STD
Chamber Location A / B / C / D: A/B
Safety Module
EMO Switch(2): Present
UPS & Power Vaccine
Remote Frame
Pump Control Interface: Present
Circuit Breaker: Present
EMO Switch: Present
Expanded VME
Monitor Rack
CRT Monitor: Absent
Light Pen: Absent
Service Monitor Rack: Absent
Miscellaneous
Harddisk: Present
Floppy Disk: Present
Transformer: Present
Gas Panel standard / Extended: Expanded
Laminar Flow Hood
Mainframe cover: Absent
Loadlock Chamber
Robot Type Phase III Robot: Phase III Type
Robot Blade: 8 Inch Blade
WPS: Installed
TC Gauge: Installed
ATM Switch: Installed
Vacuum Switch: Installed
Blade Chuck Vent Kit: Absent
Vacuum Sensor(TC): Installed
Storage Elv. Slots 8 or 29: 29
Wafer IO Sensor Present or Not: OK
Electronics (BD)
System Electronics
TC guage boards(2): Installed
+12 Vdc powersupply: Installed
+15 Vdc powersupply: Installed
-15 Vdc powersupply: Installed
Buffer I/O board: Installed
AI Mux board(1): Installed
Optical sensor boards(*2ea): Installed
Chopper driver boards (*4ea): Installed
Pneumatic Control PCB: Installed
Main DC Power Supply: Installed
ESC Controller Board: Installed
Chamber A
CVD: OXIDE
Chamber Type: MXP+
RF Match Box 0100-30686
Nv Module cesc: Yes
Epd controller: Yes
Gate valve: Yes
Cap manometer 1: Mks 1Torr
TC Gauge: Yes
Isolation V/V: STD
Throttle V/V Type: STD
Slit V/V: STD
Turbo pump: SEIKOSEIKI STP301CVB
Turbo pump Controller: YES
Chamber B:
CVD: OXIDE
Chamber Type: MXP+
RF Match Box 0100-30686
Nv Module cesc: Yes
Epd controller: Yes
Gate valve: Yes
Cap manometer 1: Mks 1Torr
TC Gauge: Yes
Isolation V/V: STD
Throttle V/V Type: STD
Slit V/V: STD
Endpoint module: Monocromator
Turbo pump: SEIKOSEIKI STP301CVB
Turbo pump Controller: YES
Gas Interface PCB: Gas Panel Interface/Expanded Gas Panel PCB
Solenoide V/V Module: STD/Expanded
Air V/V: FUJIKIN
Gas box A,B
MFC UNIT - 8160: CHF3 100SCCM
MFC UNIT - 8160: AR 200SCCM
MFC UNIT - 8160: CF 50SCCM
MFC UNIT - 8160: O2 10SCCM
MFC UNIT - 8160: N2 100SCCM.
AMAT/APPLIED MATERIALS P5000 MxP+是一種多用途可用化學氣相沈積(CVD)設備,設計用於研發先進的材料結構和裝置。該系統適用於多種研發應用,如復合半導體、納米材料、超晶格器件、單壁碳納米管、納米線等二維層狀材料。AMAT P5000 MxP+包括兩個帶有真空控制單元和專用數據采集模塊的腔室。該腔室的設計能夠在廣泛的溫度和壓力設置範圍內提供卓越的質量和一致的性能。APPLIED MATERIALS P5000 MxP+采用低調和符合人體工程學的設計,具有直觀的用戶界面,可輕松高效地進行設置。本機的CVD過程是基於反應氣體分子在壓力和溫度下向基板冒泡的原理。將底物加熱到預定溫度,反應氣體帶入腔室。然後將幾種氣體的受控混合物註入反應室內,為表面反應提供受控的化學環境。實時監控CVD過程,使用自動化工具控制腔內氣體速率、溫度和壓力。P5000 MxP+包括一個先進的CVD溫度控制資產,以提供高退火膜具有出色的厚度均勻性。它還配備了多路復用能力,允許CVD進程在8個並行路徑中進行優化。雙腔室設計增加了靈活性,使模型能夠同時進行CVD沈積、氧化物去除和其他處理。為了確保可靠和可重復的沈積過程,AMAT/APPLIED MATERIALS P5000 MxP+具有內置安全功能的監控設備,如超壓保護、溫度傳感器持續時間控制和反應室溫度警報。該系統還能夠持續監測樣品,檢測任何質量變化,並相應調整操作參數。AMAT P5000 MxP+是用於先進材料研發的強大可靠的CVD單元。它在研發應用程序中提供卓越的性能、靈活性和準確性。這臺機器提供了先進的CVD溫度控制工具、多路復用功能以及可靠的監控功能,確保了穩定可靠的沈積過程。
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