二手 AMAT / APPLIED MATERIALS P5000 #9236969 待售

ID: 9236969
晶圓大小: 8"
優質的: 1998
PECVD System, 8" Process: Passivation Chamber type: DLH CIM Linked Main frame Load lock SMIF System: ASYST ARM-2200 V111S Handler system: Robot assembly Process chamber: (3) CVD Deposition chambers A, B & C (3) Primary generators (3) RF2 Generators & matches (4) Ebara pumps Heat exchanger Mini SBC board SBC Board SEI Board (2) AI Boards (2) AO Boards VGA Board (4) Stepper driver boards (2) Digital I/O boards Buffer I/O board (2) Optical sensor boards (4) Chopper driver boards (3) Baratrons LAMDA Power supply Hard Disk Drive (HDD) Wiring distribution board Pneumatic board Loader interconnect board (2) TC Gauge boards +12V DC Power supply +15V DC Power supply -15V DC Power supply AI MUX Board (3) RF Generators Controller distribution board Encoder interface board System electronic back plane Robot blade assembly Facility: A10S Loadlock pump A70W Process pump Incoming power: 208 VAC Heat exchanger temperature set point: 65 Buffer: LPT / Indexer: ARM-2200 H112S Center finder Storage elevator: (8) Slots LL Robot type: Metal Load lock actuator: IO Door Chamber actuator: 0010-70162 CDA Pressure for buffer: 60 psi Process chamber: RF 1 Generator: ENI OEM-12B RF 2 Generator: RFPP 7520572050 RF Match: AMAT / APPLIED MATERIALS Automatch 0010-09750 Pressure manometer: MKS 10T (122BA-001000EB-S) Throttle valve / PCV Model: VEXTA PX245-02AA-C4 TC Part number: 3310-01074 Chuck type: P-Chuck Chuck part number: 0010-38437 Process temperature: 400°C MFC Gases: C2F6: 10 SLM SIH4: 3000scc NH3: 300scc N2: 10 SLM N20: 3000 SCC N20 (G): 200 SCCM PH3: 300 SCC DPA Included Endpoint: 0190-09472 CDA Pressure for chamber: 60 psi 1998 vintage.
AMAT/APPLIED MATERIALS P5000是一種用於制造半導體器件的反應堆。它利用先進的技術提供精確的熱控制和化學氣相沈積(CVD)的平臺。反應堆的設計目的是確保均勻的溫度,減少整個材料或裝置生長過程中的不均勻性。AMAT P-5000是一種單晶片反應器,它包含三個關鍵特征:均勻性、溫度控制和基板柔韌性。反應堆由幾個部件組成:石英室、感應座、控制設備、加熱元件和冷卻系統。石英室允許在受控條件下將膜氧化或沈積到基板上。磁感器安裝在處理過程中保持晶片,設計為提供均勻的溫度分布。該控制單元可實現精確的溫度控制和CVD平臺。加熱元件設計為通過整個晶片提供均勻的溫度。冷卻機用於降低基板溫度,使工藝穩定。APPLIED MATERIALS P 5000反應堆有著廣泛的優勢,如性能增強、重復性高、吞吐量提高、產量提高等。它還能夠在高溫下生產設備,具有極好的均勻性和可重復性。此外,P5000反應器是晶片鍵合的理想選擇,因為它可以確保非常均勻的溫度和更高的處理精度。最後,AMAT P5000反應器是半導體制造過程中的重要組成部分.它能夠提供均勻的溫度並減少材料或設備整個生長過程中的不均勻性,這使得它極為有用和具有成本效益。隨著技術的進步,預計P 5000反應堆將在生產半導體器件方面變得更加先進和高效。
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