二手 AMAT / APPLIED MATERIALS P5000 #9236969 待售
網址複製成功!
單擊可縮放
ID: 9236969
晶圓大小: 8"
優質的: 1998
PECVD System, 8"
Process: Passivation
Chamber type: DLH
CIM Linked
Main frame
Load lock
SMIF System: ASYST ARM-2200 V111S
Handler system: Robot assembly
Process chamber:
(3) CVD Deposition chambers A, B & C
(3) Primary generators
(3) RF2 Generators & matches
(4) Ebara pumps
Heat exchanger
Mini SBC board
SBC Board
SEI Board
(2) AI Boards
(2) AO Boards
VGA Board
(4) Stepper driver boards
(2) Digital I/O boards
Buffer I/O board
(2) Optical sensor boards
(4) Chopper driver boards
(3) Baratrons
LAMDA Power supply
Hard Disk Drive (HDD)
Wiring distribution board
Pneumatic board
Loader interconnect board
(2) TC Gauge boards
+12V DC Power supply
+15V DC Power supply
-15V DC Power supply
AI MUX Board
(3) RF Generators
Controller distribution board
Encoder interface board
System electronic back plane
Robot blade assembly
Facility:
A10S Loadlock pump
A70W Process pump
Incoming power: 208 VAC
Heat exchanger temperature set point: 65
Buffer:
LPT / Indexer: ARM-2200 H112S
Center finder
Storage elevator: (8) Slots
LL Robot type: Metal
Load lock actuator: IO Door
Chamber actuator: 0010-70162
CDA Pressure for buffer: 60 psi
Process chamber:
RF 1 Generator: ENI OEM-12B
RF 2 Generator: RFPP 7520572050
RF Match: AMAT / APPLIED MATERIALS Automatch 0010-09750
Pressure manometer: MKS 10T (122BA-001000EB-S)
Throttle valve / PCV Model: VEXTA PX245-02AA-C4
TC Part number: 3310-01074
Chuck type: P-Chuck
Chuck part number: 0010-38437
Process temperature: 400°C
MFC Gases:
C2F6: 10 SLM
SIH4: 3000scc
NH3: 300scc
N2: 10 SLM
N20: 3000 SCC
N20 (G): 200 SCCM
PH3: 300 SCC
DPA Included
Endpoint: 0190-09472
CDA Pressure for chamber: 60 psi
1998 vintage.
AMAT/APPLIED MATERIALS P5000是一種用於制造半導體器件的反應堆。它利用先進的技術提供精確的熱控制和化學氣相沈積(CVD)的平臺。反應堆的設計目的是確保均勻的溫度,減少整個材料或裝置生長過程中的不均勻性。AMAT P-5000是一種單晶片反應器,它包含三個關鍵特征:均勻性、溫度控制和基板柔韌性。反應堆由幾個部件組成:石英室、感應座、控制設備、加熱元件和冷卻系統。石英室允許在受控條件下將膜氧化或沈積到基板上。磁感器安裝在處理過程中保持晶片,設計為提供均勻的溫度分布。該控制單元可實現精確的溫度控制和CVD平臺。加熱元件設計為通過整個晶片提供均勻的溫度。冷卻機用於降低基板溫度,使工藝穩定。APPLIED MATERIALS P 5000反應堆有著廣泛的優勢,如性能增強、重復性高、吞吐量提高、產量提高等。它還能夠在高溫下生產設備,具有極好的均勻性和可重復性。此外,P5000反應器是晶片鍵合的理想選擇,因為它可以確保非常均勻的溫度和更高的處理精度。最後,AMAT P5000反應器是半導體制造過程中的重要組成部分.它能夠提供均勻的溫度並減少材料或設備整個生長過程中的不均勻性,這使得它極為有用和具有成本效益。隨著技術的進步,預計P 5000反應堆將在生產半導體器件方面變得更加先進和高效。
還沒有評論