二手 AMAT / APPLIED MATERIALS Producer GT #9233074 待售

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ID: 9233074
晶圓大小: 12"
優質的: 2007
CVD System, 12" Control system: Device net protocol EFEM Communication: SFEM Wafer sliding detection sensors: LCF Signal tower: Common SPEC Door interlock sensor Pressure difference interlock: LL->TM->Chamber Slit valve: L-Motion No viton o-ring Air regulator EYE Mark display on M/C: LP1, LP2 Chamber A / B / C Gas box Turbo pump RPC RF Generator Match Electric valve & Load lock & Tm installed TM Blade: ALN No o-ring in chamber region No gate valve o-ring & Air regulator Missing / Detaching parts: (6) HARP AIN Heaters P/N: 0010-59796 Q-Code Q400-168177 FI. RT, FE Computer Practical preventing system in EFEM: 0.065µm Filter / Venting air Process: HARP, BPSG, ARC, P-TEOS Blue electrostatic chuck: Low temp 300° C Turbo screen location: Below chamber Heat exchanger: SUS Connector & Power vaccine Upgrade list pin mechanism: Dual lock list pin RF Reflect filter system / BIAS: Auto match Heat exchanger coolant: ZT180 Chamber lift speed: Stepping motor ESC Water leak RF Generator reflect power: Below set point 0.5% Input / Output port stage: OHT FOUP Capability: (25) Slots System monitor: LCD Remote monitor: Keyboard, LCD Gas line: 5- RA surface mounted c-seal Gas configuration: C3H6, O2, NF3 Gas line polishing: E/P 5-RA Filter: SUS316 SS/NF3 Hastelloy Gas box temperature: Display by digital gauge Negative voltage MFC signal: Display interlock Chamber pump: SAMSUNG Load lock & TM Pump Tempered type: Capacitance manometer for chamber pressure control Pressure transducer for chamber: ATM Switch TM & Load lock fore line shut-off valve: Electric valve General power & UPS Power: AC Rack design change for VDP Ground for D-net: Chassis Circuit safeguard: Circuit breakers Internal utility line color: SEMI Standard Head exchanger: Pressure control 2007 vintage.
AMAT/APPLIED MATERIALS PRODUCER GT是一種垂直電化學沈積反應器,為制造先進電路提供沈積工藝解決方案。該反應堆是一個喙狀圓柱形容器,旨在為鋁、銅和鈦等各種基材提供優質的沈積工藝。它有AMAT Producer GT-800和APPLIED MATERIALS Producer GT-1000兩種型號,具有可調諧的工藝室,可用於多種工藝能力,如鍍銅、電鍍銅、ALD和CVD工藝。設計基於結合了垂直容器、低熱質量電容器和集成基板支撐的高縱橫比燒杯架構。這種幾何形狀創建了一個具有低電阻電觸點的均勻、可擴展的過程,這些觸點與反應容器的觸點和壁之間的均勻空間接觸。Producer GT還提供高級可自定義的軟件和硬件選項,以實現準確的過程控制。這使得操作方便和可重現的電鍍結果與現實和一致的工藝參數。由於嚴格的工藝控制和真空洗滌程序,該工藝室不受汙染。該設計將優化、用戶友好的液體輸送設備與精密的泵控制邏輯結合在一起,允許精確、一致、可重復的高通量電鍍解決方案。該反應堆配備了先進的溫度管理,以確保程序的準確性和可重復性,以及確保過程中受控水分水平的綜合濕度控制系統。高級控制單元還通過時間、溫度、壓力、厚度和其他關鍵工藝參數的測量提供對工藝的實時監控。AMAT/APPLIED MATERIALS Producer GT反應器上的各種可定制選項提供了卓越的電化學沈積溶液能力。它能夠沈積各種材料,從廣泛的基板具有特殊的工藝控制。先進、用戶友好的機器提供了更大的靈活性和可重復的結果。
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