二手 AMAT / APPLIED MATERIALS Producer III #149570 待售
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ID: 149570
晶圓大小: 12"
優質的: 2002
CVD system, 12"
Process: BPSG
Wafer shape: SNNF
Chamber A: SACVD-TWIN
Chamber B: SACVD-TWIN
Line voltage: 200 / 208 VAC
Line frequency: 60 Hz
Phase: 3 phase
AC P/N: 0180-01905
EMO switch type: turn to release EMO
Smoke detector: no
Chamber A: BPSG
Controllers:
Chamber set interface: yes
SPX MUXADIO110: yes
Chamber set power supply: yes
Chamber set interconnect assembly: yes
GP SPX MUXADIO110: yes
GP interface BD: yes
Other controller:
WATLOW temperature controller: yes
Heater RF filter: yes
EV manifold: yes
Thermocouple: yes
5 phase lift driver UDK5214NW oriental motor: yes
Heater lift assembly:
Heater base: yes
Lead screw assembly: yes
Motor: yes
Heater lift bellows: yes
Lift pin assembly:
Lift pin assembly: yes
Lift ceramic ring: yes
Lift pin bellows: yes
Remote clean: ASTRONex FI80131 RPS
Transformer: JEFFERSON ELECTRIC POWERFORMER outdoor N0101 type 3R U/L, CAT number: 211-0111-120: yes
Fore line assembly:
Throttle valve: yes
Isolation valve: yes
Pirani gauge: yes
Heating jackets: yes
RGA port NW25: yes
Fore lines: yes
Pressure gauge:
MKS 629B13TBC, 1000 torr: yes
MKS 627A-12338, 20 torr: yes
MKS 51A13TCA2BA640 ATM switch: yes
Chamber B: BPSG
Controllers:
Chamber set interface: yes
SPX MUXADIO110: yes
Chamber set power supply: yes
Chamber set interconnect assembly: yes
GP SPX MUXADIO110: yes
GP interface BD: yes
Other controller:
WATLOW temperature controller: yes
Heater RF filter: yes
EV manifold: yes
Thermocouple: yes
5 phase lift driver UDK5214NW oriental motor: yes
Heater lift assembly:
Heater base: yes
Lead screw assembly: yes
Motor: yes
Heater lift bellows: yes
Lift pin assembly:
Lift pin assembly: yes
Lift ceramic ring: yes
Lift pin bellows: yes
Remote clean: ASTRONex FI80131 RPS
Transformer: JEFFERSON ELECTRIC POWERFORMER outdoor N0101 type 3R U/L, CAT number: 211-0111-120: yes
Fore line assembly:
Isolation valve: yes
RGA port NW25: yes
Pressure gauge:
MKS 629B13TBC, 1000 torr: yes
MKS 627A-12338, 20 torr: yes
MKS 51A13TCA2BA640 ATM switch: yes
Gas panel and pallet:
Mainframe type: Producer III 12"
Gas feed (top): yes
System cabinet exhaust (top): yes
MFC: Celerity UFC 8160 metal digital MFC's: yes
LFM:
STEC HORIBA LF-A410A-EVD 7.0: yes
STEC HORIBA LF-A410A-EVD 1.5: yes
STEC HORIBA LF-A310A-EVD 0.5: yes
Injection valve: STEC HORIBA: yes
Valve: FUJIKIN 5 RA max: yes
Filter:
MILLIPORE 5 RA: yes
MYCROLIS O3 GS line: yes
SLD (single line drop): no
SLD valve type: FUJIKIN diaphragm: yes
Veriflo 10 RA regulator: yes
MKS LDMB12PA2CC1 transducer with display: yes
Smoke detector photohelic: yes
Generic facilities / scrubber interface: yes
Facilities interlock indicator: no
Interface output (fault): yes
Display gas pallet: yes
Chamber A gas pallet: SA-BPSG
Liquid 1: TEOS 7.0 G, LF410A-EVD
Liquid 2: TEOS 0.5 G, LF310A-EVD
Liquid 3: TEOS 1.5 G, LF410A-EVD
1: O3
2: O2, 30 slm
3: N2 purge
4: NF3, 5 slm
5: N2, 3 slm
6: AR, 10 slm
7:
8: N2, 30 slm
9: HE, 30 slm
10: N2 purge
Chamber B gas pallet: SA-BPSG
Liquid 1: TEOS 7.0 G, LF410A-EVD
Liquid 2: TEOS 0.5 G, LF310A-EVD
Liquid 3: TEOS 1.5 G, LF410A-EVD
1: O3
2: O2, 30 slm
3: N2 purge
4: NF3, 5 slm
5: N2, 3 slm
6: AR, 10 slm
7:
8: N2, 30 slm
9: HE, 30 slm
10: N2 purge
System placement: stand alone
EV mainfold: yes
System controller:
Facilities UPS interface: yes
MF controllers:
Chamber set interface: yes
SPX MUXADIO110: yes
Maintenance switch: yes
MF DC power supply assembly: yes
VME rack:
1: SBC
15: serial / video
16, 17: HDD
19, 20: FDD
DVD: yes
FDD: yes
Load locks:
Load lock lift assembly:
Motor
Lead screw assembly
Bellows
Lid assembly:
Wafer sliding sensor
Lid cover
Fore line assembly:
Isolation valve
Fore lines
LL door assembly: VAT valve assembly
Slit valve assembly: slit valve with Kalrez seal
Transfer chamber (buffer):
Robot type: VHP dual
Wafer sensing type: wafer pocket sensor
EDWARDS IPX100 pump
Isolation valve
Pirani gauge
RGA port, NW25
Fore lines
Slit valve assembly:
Slit valve with Kalrez seal
Assembly
Signal lamp tower:
Tower locations: front and rear mounted
Lamp colors: red, amber, green blue
Number of lamps per tower: (4)
Fab interface: standard GEM interface
Factory interface:
Front end interface: 12" FI 2 load ports
Path through: yes
Robot type: NEWPORT KENSINGTON POD 1 and 2
Facility: mainframe gas lines
MF N2 regulation: regulated 80 PSI
Remote systems:
HX 300 W/C heat exchanger: yes
HX 300 chiller for ozonator: yes
System monitors:
Monitor type: VGA with light pen, through the wall
2002 vintage.
AMAT/APPLIED MATERIALS Producer III是為半導體工藝研發而設計的反應堆設備。AMAT Producer III提供高質量的處理結果,同時提供卓越的過程控制。它設計為易於設置和維護,允許用戶在進程之間快速過渡。APPLIED MATERIALS PRODUCER III是一個高精度的系統,提供了一系列的能力,使其適合於從外延到納米技術的應用。特點包括溫度範圍大、精確壓力控制、多級泵送以及使用實時數據采集。該裝置提供高溫沈積和蝕刻處理,溫度可達1100 °C。這使得它適合於生產化合物半導體,如氮化氙(GaN)和砷化鋁氙(AlGaAs)。Producer III包括一個石英晶體微平衡(QCM)來監測膜厚度,精度為0.2nm。這有助於精確沈積厚度在納米範圍內的薄膜。AMAT/APPLIED MATERIALS Producer III還提供了一系列先進的過程控制功能,包括實時監測過程參數如溫度、壓力和總氣流的能力。該機器包括一個放熱調節器,用於監測每個級別的溫度,以確保生產得到優化。這有助於確保每個流程周期的重復和穩定性能。AMAT Producer III的熱能力也非常適合環境壓力幹蝕刻。這涉及使用射頻功率在高溫下去除材料,從而實現精確的蝕刻輪廓和輪廓,而不會出現蝕刻不足的情況。該設備提供了多種工藝選擇,包括能夠在受控大氣中退火特性,以及執行選擇性區域蝕刻處理。APPLIED MATERIALS PRODUCER III是一個強大的工具,它提供了一系列的過程功能,允許用戶探索廣泛的應用程序,而無需投資於多個沈積和蝕刻系統。它非常適合研究和半導體級處理應用,因為它具有高精度、重復性和快速周轉時間。
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