二手 AMAT / APPLIED MATERIALS Producer III #9091079 待售

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AMAT / APPLIED MATERIALS
模型
Producer III
ID: 9091079
SACVD System, 8" (2) Twin chambers, RPC clean Platform: Split SACVD: TEOS, TEB, TEPO process SiO2, PSG, BPSG RPC Chamber Clean: MKS ASTRON-2L 4 color signal tower: (Red-Yellow-Green-Blue) Mainframe Seriplex BD: 0090-00475 Rev-P1 MF Interface BD: 0100-00752 Rev-003 Cassette Loader: PRI Robot: Front End Manual Type 200mm: ATM407B-1-S Brooks Auto PRI Robot Controller: ESC-200-OTF-110: CTL-27900 Filter Assy: MAC10ULPA 11057002 Load-Lock Chamber: Index Motor Driver: 5-Phase UDK5128NW2 Left Loadlock: 6 Slot / 200mm Right Loadlock: 6 Slot / 200mm Left LL Pressure Gauge: 901P-41-0030 Right LL Pressure Gauge: 901P-41-0030 Pumping Line Pressure Gauge: EDWARD APG-L-NW15 Cassette Door Left: VAT 0750X-UE24-AAL7 / 1522 / A-646946 Cassette Door Right: VAT 0750X-UE24-AAL7 / 1522 / A-646946 Wafer Position Sensor: Keyence PS-55 Buffer Chamber: VHP Robot: VHP Dual Blade Type 200mm VHP Robot Driver: 0190-02472 Rev-001 IPX-100 Pump: missing Purge/Vent MFC: FC-2902 5000 sccm Pressure Gauge: 275 Mini-Convectron Granville-Phillips Chamber A: Chamber Set Interface 0015-00421 Rev-P1 Chamber Seriplex BD 0190-35652 Rev-P1 Heater Type HEATER,CERAMIC,NGK,DIMPLED,COMMON 200 MM HA12(Base: 0040-61269) Heater Material ALN Ceramic Heater Lift Motor Driver 5 Phase UDK5214NW Lid Cover Switch ALCO PUSH Button Heat Exchanger Water Flow Switch Proteus 9AMHXCHP2 / 0015-00649 Rev-001 RF/ OZONE Generator ASTEX 8403A RPS MKS ASTRON-2L Gas Panel Configuration: O2 20L UNIT NF3 3L UNIT Ar 5L UNIT He 10L UNIT N2 20L UNIT TEB 3030-09436 LFM LF-410A-EVD TEB 0.5g/MIN F.S. TEPO 3030-07719 LFM LF-310A-EVD TEPO .25G/MIN F.S. TEOS 3030-07663 LFM LF-410A-EVD TEOS 4G/MIN F.S. TEB Injection Valve 0190-36236 VALVE, INJECTION 208V TEB 120C STEC TEPO/TEOS Injection Valve 0190-36237 VALVE, INJ. 208V TEPO/TEOS 150C STEC Final Filter GLFPF6101VXM4AM In Line Gas Filter WG3NS6RR2 / WFRGD3NF-30 3.31"LG Transducer 852B-13384 : 12ea LDM LDM-B12PA2CC1 : 12ea NF3 Interlock Gauge 41A12DCA2BA050 / 100 Torr Gas Panel I/O Dist GPLI 0100-00259 P4 Gas Panel Seriplex BD 0190-35653 Chamber B: Chamber Set Interface 0015-00421 Rev-P1 Chamber Seriplex BD 0190-35650 Rev-P1 Heater Type HEATER,CERAMIC,NGK,DIMPLED,COMMON 200 MM HA12(Base: 0040-61269) Heater Material ALN Ceramic Heater Lift Motor Driver 5 Phase UDK5214NW Lid Cover Switch ALCO PUSH Button Heat Exchanger Water Flow Switch Proteus 9AMHXCHP2 / 0015-00649 Rev-001 RF/ OZONE Generator ASTEX 8403A RPS MKS ASTRON-2L Gas Panel Configuration: O2 20L UNIT NF3 3L UNIT Ar 5L UNIT He 10L UNIT N2 20L UNIT TEB 3030-09436 LFM LF-410A-EVD TEB 0.5g/MIN F.S. TEPO 3030-07719 LFM LF-310A-EVD TEPO .25G/MIN F.S. TEOS 3030-07663 LFM LF-410A-EVD TEOS 4G/MIN F.S. TEB Injection Valve 0190-36236 VALVE, INJECTION 208V TEB 120C STEC TEPO/TEOS Injection Valve 0190-36237 VALVE, INJ. 208V TEPO/TEOS 150C STEC Final Filter GLFPF6101VXM4AM In Line Gas Filter WG3NS6RR2 / WFRGD3NF-30 3.31"LG Transducer 852B-13384 : 12ea LDM LDM-B12PA2CC1 : 12ea NF3 Interlock Gauge 41A12DCA2BA050 / 100 Torr Gas Panel I/O Dist GPLI 0100-00259 P4 Gas Panel Seriplex BD 0190-35762 VME Controller: #1 SBC BD V452 0090-76133 Rev A #2 Radisys BD Radisys AMAT P133 0660-01857 #3 Unused - #4 Unused - #5 MEI-2 BD 0190-00387 A010-008 Rev 5 #6 Unused - #7 MEI-1 BD 0190-00387 A010-008 Rev 5 #8 Unused - #9 I/O Expansion BD 0090-76040 NT Hard Disk Seagate ST34520N CD-ROM Use NT Floppy Disk 3.5" Legacy Hard Disk 0190-00405 Legacy Floppy Disk 3.5" SCSI FD235HF C700-U 193077C7-00 VME P2 Distribution BD 0100-00430 Loadlock Left Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Loadlock Right Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Ch#A1 Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Ch#A2 Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Ch#B1 Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Ch#B2 Slit Valve VAT 0300X-CA24-All1/0302 A-23269 Active Wafer Sensor Keyence PZ2-41 Latest Software Version B3512 Currently de-installed.
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AMAT/APPLIED MATERIALS Producer III是用於半導體生產和采購的先進生產反應堆。其先進的特性使其成為最可靠、最高效的生產反應堆之一。AMAT Producer III包括射頻驅動器、頻率發生器、高壓電源、激光掃描儀和低壓電源。所有這些組件協同工作以優化生產過程,提高可重復性和生產率。射頻傳動通過各種工藝步驟實現高沈積速率，而頻率發生器控制提供給反應堆的電壓和功率。激光掃描儀調節沈積在晶圓上的材料量。應用材料生產商III為材料沈積提供均勻性,並提供動態調整的有源流量控制系統,以保持晶圓上正確的材料水平。該系統還確保沈積和蝕刻過程是可重復的。生產者III還包括壓力監測系統，它允許更好的過程控制和提高產品質量。AMAT/APPLIED MATERIALS Producer III也設計用於高通量生產和高溫工藝。它的敏感器有特殊的設計，減少汙染，並允許快速熱身時間。磁感器還允許晶圓上的材料更大的均勻性。AMAT Producer III非常適合生產各種材料，無論是單片晶片、復合半導體，甚至是先進材料。它可以用多種氣體操作，從氫氣到四氟化物不等。它還設計為與所有類型的半導體產品兼容,因此生產商知道他們將能夠處理客戶需要的任何材料。APPLIED MATERIALS Producer III符合所有行業標準,為用戶提供了更高的可靠性和一流的性能。它包括一整套安全功能，可以保護操作員並確保任何過程盡可能高效。其功能還使制造商能夠滿足其所有生產要求。生產者III是一個高度可靠和高效的生產反應堆，將為用戶提供生產精度和可重復性，以滿足他們的需求。憑借其加工各種材料的能力和靈活多變的設計，一定能滿足各類半導體制造商的需求。在尋找達到最高性能和可靠性水平的生產反應堆時，AMAT/APPLICED MATERIALS PRODUCER III是理想的選擇。
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