二手 AMAT / APPLIED MATERIALS Producer S #9003816 待售
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ID: 9003816
System, 12"
Chamber A Twin BPSG
Chamber B Twin BPSG
Chamber C Twin BPSG
Wafer shape: SNNF
SMIF interface: no
Chamber A:
Frequency: None
Manometer: 20/1000 Torr
Clean type (rpc): Astex
Dpa: No
Chamber B:
Frequency: None
Manometer: 20/1000 Torr
Clean type (rpc): Astex
Dpa: No
Chamber C:
Frequency: None
Manometer: 20/1000 Torr
Clean type (rpc): Astex
Dpa: No
Electrical requirements:
Line Frequency: 60 Hz
Line Voltage: 200/208 V
Line Amperage: 240 A
Facility ups interface : Yes
System monitor:
1st Monitor: Through the wall
2nd Monitor: Standalone
3rd Monitor: None
Mainframe:
Mainframe Type: Shrinkage
Robot Type: VHP dual
Loadlock Cassette: Manual 2 cassette
SMIF: No
SMIF Robot: NA
Ozone generator:
Chamber A: AX8400
Chamber B: AX8406B
Chamber C: AX8406B
Dry pumps:
Chamber A: -
Chamber B: -
Chamber C: -
Loadlock: IPX100
VME rack:
SBC: Yes
VGA: Yes
MEI #1: Yes
MEI #2: Yes
I/O EXPAN.: Yes
Monitor Select: Yes
Floppy: Yes
HDD: Yes
Gas delivery:
MFC Type: STEC 410A (LFM), Unit C8161
Valves: Fujikin 5 Ra max
Filters: Millipore
Transducers: MKS without display
Regulators: Parker
Single Line Drop (SLD): No
SLD Gas Lines Feed: Top feed
System Cabinet Exhaust: Top
Gas pallet configuration:
CH.A SIZE MODEL
O2 30 SLM UFC 8161
NF3 5 SLM UFC 8161
AR 5 SLM UFC 8161
HE 30 SLM UFC 8161
N2 30 SLM UFC 8161
TEOS 7000 LF-410A-EVD
TEB 1500 LF-310A-EVD
TEPO 500 LF-310A-EVD
CH.B SIZE MODEL
O2 30 SLM UFC 8161
NF3 5 SLM UFC 8161
AR 5 SLM UFC 8161
HE 30 SLM UFC 8161
N2 30 SLM UFC 8161
TEOS 7000 LF-410A-EVD
TEB 1500 LF-310A-EVD
TEPO 500 LF-310A-EVD
CH.C SIZE MODEL
O2 30 SLM UFC 8161
NF3 5 SLM UFC 8161
AR 5 SLM UFC 8161
HE 30 SLM UFC 8161
N2 30 SLM UFC 8161
TEOS 7000 LF-410A-EVD
TEB 1500 LF-310A-EVD
TEPO 500 LF-310A-EVD
Includes:
(2) Ceramic Heater
(2) Ceramic Heater
(2) Ceramic Heater
Buffer Chamber, Chamber A
EFEM
(3) Cermic Liner, NF3 Gas Line
(1) Signal Cable, Exhase flange, Photo helic
Monitor Panel
(2) RPS Ass'y
(2) RPS Ass'y
(2) RPS Ass'y
Load Lock Pump
(6) AL Pumping Ring, Ceramic Pumping Ring
Monitor
Monitor
Chamber B
Chamber C
Temp Controller
(6) AL Shower Head, AL Blocker Plate
(6) AL Lid Ass'y
(6) Ceramic Pumping Ring
(3) AL Lid Block
(6) Top Ceramic Ring
Ch C Foreline, Mux Controller
Producer M,RF AC
O3 Cabinet
AC Rack
A-Chamber Cover
B-Chamber Cover
2001 vintage.
AMAT/APPLIED MATERIALS Producer S是一種工業級化學氣相沈積（CVD）反應器。它設計用於將高性能薄膜沈積在直徑可達200毫米的晶片/基板上。它由一個封閉的腔室和一系列前體在非熱大氣壓力等離子體中反應的工藝源組成。這種等離子體由射頻-ADT（大氣直流電）技術產生，通過將前體分解成較小的碎片來增強表面相互作用，這些碎片可以更均勻地分布在晶圓表面。等離子體對於提供均勻的工藝溫度也是必不可少的，這對於高質量的薄膜沈積在CVD中是必不可少的。工藝源還包括高頻鹵素燈和石英加熱元件，以確保室內溫度分布均勻。均勻的溫度分布保證了薄膜生產的可靠性和可重復性。這在需要高膜質量的半導體和納米技術應用等領域尤為重要。AMAT PRODUCERS除了具有均勻的溫度和可靠且可復制的薄膜沈積外，還有其他優點。例如，等離子體的熱源可以在不中斷過程的情況下改變，允許高通量，對晶圓的熱影響最小。它還具有長達30分鐘的快速循環時間、30個晶圓的高晶圓加載能力以及低擁有成本。最後,APPLIED MATERIALS PRODUCER-S配備了直觀的圖形用戶界面（GUI）,使其易於操作和維護。該GUI還采用高效配方進行了優化，以在各種應用領域取得成功，並建立了真空水平和沈積率等硬件和工藝參數的監控系統。
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