二手 AMAT / APPLIED MATERIALS Producer SE #9182254 待售

ID: 9182254
晶圓大小: 12"
優質的: 2006
CVD System, 12" (2) Chambers Customer fab options: Electrical requirements: Line frequency: 60Hz Line voltage: 200/208 VAC Platform Chambers: Chamber A and B: Chamber process: XJ (PE Silane twin) RF1 Generator: APEX 3000 Gas delivery: Gas pallet type: Surface mount vertical Regulated gas panel: No Regulated TMS: No Gas feed: Top Gas panel cabinet exhaust: Top Facilities interlock indicator: No Facilities / Scrubber interface output: Fault Transducers: Setra Filters: Nippon Manual valves: Hamlet Pneumatic valves: Hamlet Liquid source: No Gas pallet configuration supplement: Chamber A: Gas line stick position / Process gas / MFC Size / Regulator (Yes, No) / Transducer (Yes, No) #1 / C3H6 / 3000sccm / No / No #3 / NF3 / 1000sccm / No / No #8 / 02 / 30000sccm / No / No #9 / AR / 15000sccm / No / No #10 / HE / 5000sccm / No / No #11 / O2 / 15000sccm / - / - #12 / AR CLN / 10000sccm / No / No #13 / N2 CLN / 15000sccm / No / No Liquid 1 / P-N2 / - / No / Yes Liquid 2 / P-N2 / - / No / Yes Chamber B: Gas line stick position / Process gas / MFC Size / Regulator (Yes, No) / Transducer (Yes, No) #1 / C3H6 / 3000sccm / No / No #3 / NF3 / 1000sccm / No / No #8 / O2 / 30000sccm / No / No #9 / AR / 15000sccm / No / No #10 / HE / 5000sccm / No / No #11 / O2 / 15000sccm / - / - #12 / AR CLN / 10000sccm / No / No #13 / N2 CLN / 15000sccm / No / No #17 / P-N2 / - / No / Yes #18 / P-N2 / - / No / Yes Mainframe: Local center finder: Yes Cu Wafer sensor: No MF Ch Harness installed: A & B Third MF IO motion card Robot blade: Standard VHP Factory interface options: 300mm Factory interface 5.3 options: WIP Delivery type: OHT Pre alignment and centering: Single axis aligner Wafer pass thru & storage: 8 Slot wafer pass thru Atmospheric robots: KAWASAKI 2 fixed robots with edge grip Remote control system cabable: Yes Docked E99 reading capability: No Load port types: Enhanced 25 wafer FOUP Load port operator interface: Standard 9 light Configurable color lights: No Docking flange shield: No Air intake system: Front facing intake plenum E84 Pl/O Sensors and cables: Upper E84 sensors and cables OHT Light curtain: Light curtain Carrier ID host interface: Yes Light towers: (3) Colors configurable Fast data gateway software: No Heat exchanger / Chiller: Heat exchanger AMAT HX hose and manifolds: No Remote AC: Facilities UPS interface Chamber configuration: Ch A / Ch B: BFC 2" Foreline T/V Type: 683B RF Filter: (0090-05813) RPS FFU Controller 2006 vintage.
AMAT/APPLIED MATERIALS Producer SE(等離子體增強型外延反應器)是一種商用級等離子體外延工藝,用於矽和非矽基板上的高質量半導體生長。AMAT Producer SE使用高度可靠、精密且具成本效益的生產平臺提供全流程控制。該反應器能夠提供高質量的薄膜,具有極好的均勻性和極好的工藝調整靈活性。它是最先進、成本效益最高的等離子體外延工具,是大批量生產的理想選擇。APPLIED MATERIALS Producer SE提供了一系列功能,例如獨特的並行等離子體源配置、可調節的狹縫快門技術、低缺陷密度以及多種沈積工藝功能。平行等離子體源的配置使得晶片到晶片的過程均勻性和優越的摻雜均勻性跨越大晶片直徑。可調節的狹縫快門技術提供了等離子體擴散深度的精確控制,並消除了由於門偏差變化而產生的變化。此外,低缺陷密度和廣泛的薄膜沈積能力保證了無缺陷、高性能薄膜的高產率,並能夠根據特定的設備要求定制薄膜性能。該反應堆非常適合設備制造,從200毫米到300毫米晶圓縮放,最小特征尺寸能力為8納米。適用於許多不同的沈積過程,包括矽和非矽基板,如氮化矽、低壓CVD、PECVD、SiGe和HFO。Producer SE processor has the capility for three separative step-flow processes automatically into standard processing and the ability to combined differAMAT/APPLIED MATERIALS Producer SE還提供在廣泛溫度範圍內的批量處理以及高速率沈積和更快的烘烤時間。該反應堆的高精度電源可精確控制薄膜厚度到0.5-1.0nm的氧化物厚度。可以對反應堆進行多種非侵入性診斷,如壓力擺動分析、射頻測試、晶圓監測、沈積均勻性驗證等。最後,AMAT Producer SE在性能和可靠性方面超過了行業要求,其在產品壽命內的徑向漂移極低。總體而言,APPLIED MATERIALS Producer SE是用於各種半導體應用的高質量外延膜沈積的最可靠、最具成本效益的工具。它提供了廣泛的特性和功能,確保了卓越的工藝一致性和出色的工藝調整靈活性,從而實現了高級半導體器件的大批量制造。
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