二手 AMAT / APPLIED MATERIALS Smartweb SL-3L/800 #293745938 待售

ID: 293745938
優質的: 2018
Roll to roll coating system (2) Chillers Roughing pump system Process and rewinding module Media supply Electrical cabinet Cooling Heating Trolley Cathode colling Control PC Console table Scrubber Coatings: Materials / Mode Metals: Copper, Gold, Silver, Aluminium, Molybdenum, Titanium / DC Alloys: Ni/Cr 80/20 / DC Dielectrics: ITO, AI:ZnO / DC SiOx, AI2O3, TiO2 /MF ZnO / DC, MF System cooling water: Inlet pressure: 4 to 6 bar Outlet pressure: Pressure-less, Open drain Consumption: Maximum 50 m³/h Average consumption: Approximate 26 m³/h Temperature (Inlet): Minimum 18°C, Maximum 22°C Temperature rise: Maximum 6°C Carbonate hardness: <6 to 8° pH value: 8.5 to 10 particle size: Maximum 100 μm Particle concentration: Maximum 10 parts/cm³ CO2-content: Maximum 15 mg/l CI-content: Maximum 20 mg/l Cathode cooling circuit: Filling quantity: Approximate 1100 Liters Carbonate hardness: <7° pH value: 8.0 to 9 Particle size: <5 µm Solved oxygen: Maximum 5 mg/l Resistivity at + 25°C: >2 x 103 Ohm cm Compressed air: Pressure: 6 to 7 bar Average consumption: Approximate 1 m³/h Particle size: Maximum 5 µm Particle concentration: Maximum 5 mg/m³ Oil-content: Maximum 5 mg/m³ Dew point: 2°C Gases: Argon, Nitrogen, Oxygen, Argon/Oxygen 80/20 Pressure: 1, 2 bar Purity: 99.995 Gas tubing: Stainless steel, Coupling Winding: Web speed: 0.5 to 20.0 m/min + 0.1% of nominal speed at the motor shaft Unwind / Rewind: 60 to 600 N Tension measuring rollers with analog load cell Vacuum: Ultimate pressure: <8 x 10^-7 mbar in sputtering compartments of process modules Pump down time to ultimate pressure: 24 Hours Pressure during sputtering: 1 to 9 x 10^-3 mbar Pump down time to 6 x 10^-6 mbar: <60 minutes Measured at a pressure: < 2x10^-3 mbar Gas separation factor between sputter compartments and sputtering compartments: >100: 1, only for maximum substrate thickness loaded Electrical Services: Voltage: 400 V +10/-10% 50 Hz, 3 Phase, TN-network with loadable PEN for 60 Hz Connected load: 320 kVA Average consumption: Approximate 240 kW Short circuit current: Maximum 50 kA Process coating: Magnetron sputtering coating technology One coated side Substrate width: Maximum 820 mm Coating area web width reduced: 10 mm Coating width: Minimum: 300 mm, Maximum: 600 mm Environment: Temperature: Minimum 15°C, Maximum 35°C Humidity: Maximum 90% at 20°C, Maximum 50% at 35°C Maximum altitude of installation site: 1000 m above sea level 2018 vintage.
AMAT Smartweb SL-3L/800反應堆是為先進半導體制造工藝設計的尖端薄膜沈積設備。這個先進的工具結合了創新技術,以實現高水平的膠片均勻性、過程控制和生產率。SL-3L/800反應堆是APPLIED MATERIALS Smartweb系列的一部分,以其在制造集成電路和其他電子器件方面的卓越性能和可靠性著稱。SL-3L/800反應堆的核心是其先進的腔室設計,能夠精確控制沈積過程。反應堆配有多區溫度控制系統,允許對底物表面的膜性能進行優化。該特性保證了薄膜厚度的均勻性和一致性,對半導體器件的性能和可靠性至關重要。SL-3L/800反應器采用高通量結構,使薄膜能夠沈積在大批量的基板上。這種能力大大提高了半導體制造業務的生產率和成本效益。該反應堆的設計可容納各種基材尺寸、形狀和材料,在生產過程中提供靈活性和多功能性。SL-3L/800反應堆的一個主要特點是其先進的氣體分配裝置,它確保了對燃氣流的精確控制和室內的混合。這一特性增強了沈積膜的均勻性和純度,有助於半導體器件的整體質量。反應堆還配備了精密的壓力控制機,使工藝條件穩定,薄膜性能得到改善。SL-3L/800反應堆與AMAT/APPLIED MATERIALS專有的Smartweb軟件平臺集成,提供全面的過程監控能力。該軟件允許實時流程優化、故障檢測和數據分析,從而確保了高流程重復性和產量。Smartweb平臺還能夠對反應堆進行遠程監測和控制,促進運行效率和減少停機時間。在沈積能力方面,SL-3L/800反應堆支撐著廣泛的薄膜材料,包括電介質、金屬和半導體。該反應器能夠沈積具有精確厚度和成分控制的薄膜,對制造先進的半導體器件至關重要。無論是前端生產還是後端生產,SL-3L/800反應堆都提供了前沿半導體制造工藝所需的靈活性和性能。最後,AMAT Smartweb SL-3L/800反應器是一種先進的薄膜沈積工具,它結合了半導體制造的精度、生產率和可靠性。憑借其先進的腔室設計、高吞吐量能力和集成的軟件平臺,SL-3L/800反應堆為制造下一代電子設備提供了卓越的性能。該反應堆代表了半導體行業的一項關鍵技術進步,使制造商能夠滿足不斷變化的市場趨勢和應用的需求。
還沒有評論