二手 NOVELLUS CONCEPT 2 Altus 2 #9093685 待售
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ID: 9093685
晶圓大小: 8"
優質的: 1999
Chamber, 8"
Facility and Interface:
Altus module locations: Dual: Port 2 and 3
WTS (backbone) facilities connection configuration: Bottom facilities installation
Remote interconnect cables: 75 feet
DLCM-S:
ROBOT ASSY, MAG7, BISYMMETRIK ARM, DLCM: 02-262359-00
Transfer module to chamber valve (SMC Valve): 02-121427-00
Throttle valve kit, DLCM-S: 04-048579-02
Loadlock gate valve, SMC: 02-133799-00
Readiness kit: Dual altus ready
Software/Controls:
Module controller type: MC2
System software (QNX): MC2
DLCM-S IOC:
0 - IOC - 4.1
2 - IOC - 4.1
3 - IOC - 4.1
Altus IOC:
0 - SIOC - 4.30
1 - SIOC - 4.30
2 - SIOC - 4.30
3 (MPD) - SIOC - 4.10
Process Chamber configuration:
SHWRHD, 200 mm, Style B: 03-00258-00
ASSY, PED, 200 mm MOER, D.3, SEMI: 02-033134-01
EXCL RING, 200 mm, 2.0 mm OH SEMI: 15-032777-00
Indexer plate, HUB: 15-034848-00
INDEXCER, WF, EXCL, OPTION, 200 mm: 15-00934-02
Spindle assembly: 02-126697-00
OPT ENDPT DET'R, MSTR, ALT-S: 04-0120458-00
Throttle Valve MKS (Pressure control valve): 27-250285-00
Gate valve, vat: 60-10015-00
Gas box configuration (CESCVD02177B):
Manifold A 1: Aera FC-7800CD, AR/2 SLM
Manifold A 3: Aera FC-7800CD, H2/20 SLM
Manifold B 6: Aera FC-7800CD, C2F6/2 SLM
Manifold B 7: Aera FC-7800CD, O2/2 SLM
Manifold D 2: Aera FC-7800CD, SiH4/100 SCCM
Manifold H D: Aera FC-7800CD, Ar/20 SLM
Manifold W 4: Aera FC-7800CD. AR/20 SLM
Manifold W 5: Aera FC-7800CD, WF6/1 SLM
Manifold C 8: Aera FC-7800CD, Ar/10 SLM
Manifold C 9: Aera FC-7800CD, H2/20 SLM
Baratron:
Altus, CAP MANOMETER, HEATED 100 TORR: 27-10340-00
Altus, CAP MANOMETER, HEATED 10 TORR: 27-10343-00
Altus, Backside, CAP MANOMETER< HEATED 100 TORR: 27-10340-00
DLCM-S, LOADLOCK, CAP MANOMETER, HEATER 100 TORR: 27-10340-00
DLCM-S, TM, CAP MANOMETER, HEATED 100 TORR: 27-10340-00
Supporting remote units:
(1) Process pump per process chamber: BOC Edwards, IH1000 - x2 for process pump typical
(1) Pedestal pump per process chamber: BOC Edwards, i80 - x2 for pedestal pump typical
(1) TM pump per system: BOC Edwards, i80 - x1 for TM pump typical
(1) LL pump per system, BOC Edwards, i80, x1 for LL pump typical
1999 vintage.
NOVELLUS Concept 2, Altus 2是一種化學氣相沈積（CVD）反應器，或稱腔室，旨在將高純度材料的薄膜沈積到基板表面。Altus 2能夠在300°C至650°C的高溫下沈積多種材料，如外延矽、多矽、氧化物、氮化物和碳化物。NOVELLUS CONCEPT 2 Altus 2由模塊底座、集成電路的加工室、門組件、電源、氣體歧管和其他各種部件組成。CONCEPT 2 Altus 2反應器由一個圓柱形的不銹鋼室組成，其中放置了基板。腔壁采用316L不銹鋼制成，厚度為4.8毫米。壁朝向腔室底部向內逐漸變細，從而能夠有效地分配熱量。基板擱置在鋁熱塊之上，加熱到所需溫度。源氣體通過輸送系統引入腔室的上部（最大距離為8英寸）。NOVELLUS CONCEPT 2 Altus 2反應堆可以以直流模式（直流電）或射頻模式（射頻）操作。在直流模式下，基板保持在低電壓電位，允許沈積材料的連續膜的形成，而射頻模式在膜層中形成金屬顆粒。電源提供高達400 A的電流（DC模式）,並且可以調整以改變沈積速率。CONCEPT 2 Altus 2具有內置的基於力的流量控制（FBFC）系統,可精確輸送過程氣體,而氣體混合比二極管陣列探測器（GM-RAD）則可持續監控沈積環境。反應堆的運行參數可以利用內置控制系統進行調整，使得在要沈積的材料的不同配方之間進行切換成為可能。NOVELLUS CONCEPT 2 Altus 2還有一條額外的三條氣體歧管線，能夠同時向腔室引入多達三種反應氣體。最後，CONCEPT 2 Altus 2是一種高度通用、高效的CVD反應器，能夠在高度受控的操作條件下將高純度材料薄膜沈積到基板上。它具有多種設計和安全功能,使它的使用既可靠又經濟高效。
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