二手 NOVELLUS CONCEPT 2 Altus #181297 待售

ID: 181297
晶圓大小: 8"
優質的: 1996
Dual Shrink W-CVD Chemical vapor deposition system, 8" Chamber Location 1 Station Left Loadlock 2 station Process Module 3 station Process Module 4 station Right Loadlock 5 Station Cooling Sation Electrical Requirements AC power Voltage 208 VAC DLCM Configuration Indexer Type: Animatic Controller Brooks Robot Type: Mag7 Host Interface: GEN/SECS Controller Type : P166/64M/QNX4 DLCMS Type: Only Hi Module Interface Type: Arc-net Type IOC : Ver 4.1 TM Manometer 1 torr/ 100mtorr: Tylan General L/L Manometer 100torr: Tylan General L/L Convectron: Not Install Module Door Type: SMC L-Motion Chamber A: Process Option BLKT Clean Option Insuts Clean MOER Ceramic M/A / M/B (Not Used) Throttle Valve Type Tylan General 1ea MFC Type & Size Brooks 5964: Ar (5000Sccm) Ar (10000Sccm) Area FC980C: NH3 (150Sccm) Brooks 5964: Ar (10000Sccm) Ar (20000Sccm) Ar (20000Sccm) H2 (20000Sccm) H2 (20000Sccm) Area FC980C: B2H6, N2 (750Sccm) Brooks 5964: C2F6 (2000Sccm) SAM MC4VLZ24: WF6 (1000Sccm) Brooks 5964: O2 (2000Sccm) SiH4 (1500Sccm) SFC1480FPD: SiH4 (300Sccm) Slip Valve Type: SMC L-Motion Chamber B: Process Option BLKT Clean Option Insuts Clean MOER Ceramic M/A / M/B (Not Used) Throttle Valve Type Tylan General 1ea MFC Type & Size SPEC 7330: Ar (5000Sccm) Ar (5000Sccm) NH3 (1000Sccm) NH3 (1000Sccm) Ar (20000Sccm) Ar (5000Sccm) Ar (15000Sccm) H2 (5000Sccm) H2 (20000Sccm) B2H6, N2 (750Sccm) C2F6 (2000Sccm) WF6 (750Sccm) O2 (2000Sccm) SiH4 (1000Sccm) Slip Valve Type SMC: L-Motion 1996 vintage.
NOVELLUS CONCEPT 2 Altus是一種高度專業化和先進的PVD(物理氣相沈積)反應堆設備。常用於將沈積材料的薄膜塗在矽片等大型基板上,用於半導體、光電和微電子器件。CONCEPT 2 Altus系統旨在提供高度的過程控制、一致性和靈活性,以優化過程產量為目標。PVD室由直線電動機驅動,為均勻沈積提供穩定穩定的環境。它還具有可變基板尺寸、可調節的炮位、多個區域和兩個沈積物料來源,有助於最大限度地提高工藝的均勻性和吞吐量。該室還具有快速、高精度的機械臂,可快速準確地將物料移動和裝載到室中。NOVELLUS CONCEPT 2 Altus機組配備了多種傳感器和控制器,可持續監控過程並提供反應均勻性的詳細反饋。這樣可以確保薄膜達到盡可能高的質量和可重復性。該機還包括可用於實時監測、評估和調整沈積過程的專有軟件。CONCEPT 2 Altus工具為用戶提供了更好的過程參數控制、更高的準確性和可重復性以及更好的過程穩定性。它是那些希望快速高效地將高質量薄膜應用於大型基板的人的理想資產。優越的性能、可重復性和靈活性相結合,使得NOVELLUS CONCEPT 2 Altus模型成為大容量PVD應用的完美選擇。
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