二手 NOVELLUS CONCEPT 2 Altus #9095522 待售

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ID: 9095522
晶圓大小: 8"
Chemical vapor deposition (CVD) system, 8" Process: Shrink DLCM Non-shrink process modules SSD Module: Dual chamber Wafer type: Notch SECS/GEM Software: No Standard chamber Mainframe options: System controller: MC3 Signal tower: No AC Power rack: Standard Interconnect cables: No DLCM User interface: Adjacent to system Transfer robot type: BROOKS MTR 5 Paddle type: Standard Shuttle type: Standard Cassette type: No Indexer type: Type II Cool station: No SMIF loader type: No Manometer: Standard 100 Torr Facilities configuration: Either Control system: QNX4 Pump electrical interface: No Missing parts: Animatics type Leak check shutoff valve Process module A: Altus Controller type: MC3 IOC Version: 3.02 Gate and throttle valve: Internal, non-heated Process manometer: 100 Torr non-heated Heater pedestals: D-Type Shower heads: Yes MOER Rings: No Spindle assy seal type: Ferrofluidic X-Y Centering station: Yes Viewport window: Sapphire RF Match: Trazar Chamber process: Tungsten plug fill Full face coverage Module location: Center port Standard footprint Facility connections: Rear of chamber Module location: Center port (default) Missing parts: RF High frequency generator Endpoint detector Gas box: Standard 10 channel MFC Type: BROOKS 5964 MFC Size and location Channel Gas Flow (SLM) 1 Argon 2 SLM 2 Sih4 50 sccm 3 Hydrogen 20 SLM 4 Argon 20 SLM 5 Wf6 Missing 6 C2F6 2 SLM 7 Oxygen S SLM 8 Argon 10 SLM 9 Hydrogen 20 SLM 10 Nitrogen 10 SLM Process module B: Altus Gate and throttle valve: Internal, non-heated Process manometer: 100 Torr non-heated Heater pedestals: D-Type Shower heads: Yes MOER Rings: No Spindle assy seal type: Ferrofluidic X-Y Centering station: Yes Viewport window: Sapphire RF Match: Trazar Chamber process: Tungsten plug fill MOER Rings Sequel process module A center port Standard footprint RF Generator: No Optical endpoint detector: Yes Facility connections: Rear of chamber Module location: Right port Missing parts: RF High frequency generator Controller type Gas box: Standard 10 channel 10 Gas, missing 9 gas sticks MFC Size and location Channel Gas Flow (SLM) 5 Wf6 750 sccm (1-10) Missing.
NOVELLUS CONCEPT 2 Altus(C2A)是一種高性能反應器,設計用於半導體行業的等離子體蝕刻、沈積和濺射應用。該設備采用高功率與大電極面積相結合的立式磁性專利技術,實現了優越的工藝穩定性。C2A反應堆由30千瓦高頻發電機提供動力,使其能夠處理比標準反應堆吞吐量更快的大面積基板。反應堆還具有先進的自動調諧系統,使其能夠快速準確地優化每個加工晶片的等離子體工藝參數。該C2A具有獨特的垂直磁場,能夠產生比標準反應堆更高的等離子體溫度和更低的密度。這種較高的能量等離子體能夠提高蝕刻速率和提高均勻性。該C2A還利用可調節的上部靜電屏蔽防止等離子體汙染和浮動卡盤來維持一個一致的基板溫度。該C2A還具有多個腔室,以提高處理靈活性。這允許用戶同時或按順序執行多個進程。C2A先進的氣體管理單元保證了氣流的均勻性和總氣體控制。這樣可以確保過程參數保持一致,而不管基板的大小或處理的基板的數量如何。C2A還配備了先進的控制機器,允許用戶實時監控、調整和優化流程參數。此工具利用高級用戶界面方便操作和軟件,使用戶能夠為不同的基材和應用程序創建和存儲流程配方。CONCEPT 2 Altus(C2A)是一種高度可靠、先進的反應堆,設計用於等離子體蝕刻、沈積和濺射場的半導體加工。其30千瓦HF發電機、可調上靜電屏蔽、浮動卡盤確保了優越的工藝穩定性,而其垂直磁性技術、可調氣體管理資產、優越的控制模式則保證了優越的性能。C2A是任何半導體加工設施的理想選擇。
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