二手 NOVELLUS CONCEPT 2 Altus #9095522 待售
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ID: 9095522
晶圓大小: 8"
Chemical vapor deposition (CVD) system, 8"
Process: Shrink DLCM
Non-shrink process modules
SSD Module: Dual chamber
Wafer type: Notch
SECS/GEM Software: No
Standard chamber
Mainframe options:
System controller: MC3
Signal tower: No
AC Power rack: Standard
Interconnect cables: No
DLCM
User interface: Adjacent to system
Transfer robot type: BROOKS MTR 5
Paddle type: Standard
Shuttle type: Standard
Cassette type: No
Indexer type: Type II
Cool station: No
SMIF loader type: No
Manometer: Standard 100 Torr
Facilities configuration: Either
Control system: QNX4
Pump electrical interface: No
Missing parts:
Animatics type
Leak check shutoff valve
Process module A: Altus
Controller type: MC3
IOC Version: 3.02
Gate and throttle valve: Internal, non-heated
Process manometer: 100 Torr non-heated
Heater pedestals: D-Type
Shower heads: Yes
MOER Rings: No
Spindle assy seal type: Ferrofluidic
X-Y Centering station: Yes
Viewport window: Sapphire
RF Match: Trazar
Chamber process: Tungsten plug fill
Full face coverage
Module location: Center port
Standard footprint
Facility connections: Rear of chamber
Module location: Center port (default)
Missing parts:
RF High frequency generator
Endpoint detector
Gas box: Standard 10 channel
MFC Type: BROOKS 5964
MFC Size and location
Channel Gas Flow (SLM)
1 Argon 2 SLM
2 Sih4 50 sccm
3 Hydrogen 20 SLM
4 Argon 20 SLM
5 Wf6 Missing
6 C2F6 2 SLM
7 Oxygen S SLM
8 Argon 10 SLM
9 Hydrogen 20 SLM
10 Nitrogen 10 SLM
Process module B: Altus
Gate and throttle valve: Internal, non-heated
Process manometer: 100 Torr non-heated
Heater pedestals: D-Type
Shower heads: Yes
MOER Rings: No
Spindle assy seal type: Ferrofluidic
X-Y Centering station: Yes
Viewport window: Sapphire
RF Match: Trazar
Chamber process: Tungsten plug fill
MOER Rings
Sequel process module A center port
Standard footprint
RF Generator: No
Optical endpoint detector: Yes
Facility connections: Rear of chamber
Module location: Right port
Missing parts:
RF High frequency generator
Controller type
Gas box: Standard 10 channel
10 Gas, missing 9 gas sticks
MFC Size and location
Channel Gas Flow (SLM)
5 Wf6 750 sccm
(1-10) Missing.
NOVELLUS CONCEPT 2 Altus(C2A)是一種高性能反應器,設計用於半導體行業的等離子體蝕刻、沈積和濺射應用。該設備采用高功率與大電極面積相結合的立式磁性專利技術,實現了優越的工藝穩定性。C2A反應堆由30千瓦高頻發電機提供動力,使其能夠處理比標準反應堆吞吐量更快的大面積基板。反應堆還具有先進的自動調諧系統,使其能夠快速準確地優化每個加工晶片的等離子體工藝參數。該C2A具有獨特的垂直磁場,能夠產生比標準反應堆更高的等離子體溫度和更低的密度。這種較高的能量等離子體能夠提高蝕刻速率和提高均勻性。該C2A還利用可調節的上部靜電屏蔽防止等離子體汙染和浮動卡盤來維持一個一致的基板溫度。該C2A還具有多個腔室,以提高處理靈活性。這允許用戶同時或按順序執行多個進程。C2A先進的氣體管理單元保證了氣流的均勻性和總氣體控制。這樣可以確保過程參數保持一致,而不管基板的大小或處理的基板的數量如何。C2A還配備了先進的控制機器,允許用戶實時監控、調整和優化流程參數。此工具利用高級用戶界面方便操作和軟件,使用戶能夠為不同的基材和應用程序創建和存儲流程配方。CONCEPT 2 Altus(C2A)是一種高度可靠、先進的反應堆,設計用於等離子體蝕刻、沈積和濺射場的半導體加工。其30千瓦HF發電機、可調上靜電屏蔽、浮動卡盤確保了優越的工藝穩定性,而其垂直磁性技術、可調氣體管理資產、優越的控制模式則保證了優越的性能。C2A是任何半導體加工設施的理想選擇。
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