二手 NOVELLUS CONCEPT 2 Dual Altus 2 #9093691 待售
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ID: 9093691
晶圓大小: 8"
Chamber, 8"
Facility and Interface:
CVD tungsten
Wafer type: SEMI
Wafer cassette type: A198-80MB-47C02 - Fluoroware
DLCM-S Heater manometers: Yes
Altus module locations: Dual, Port 2 and 3
Facilities configuration: Bottom
Remote interconnect cable length: 75 feet
Transfer
Module A Port location: Center
Module B Port locationL Right
Primary user interface: Adjacent user interface
DLCM-S:
Modular power distribution [MPD, DUAL, ALTUS, C2PDP]: 01-298450-11
Robot Assy, Mag7, Bisymmetrik arm, DLCM: 02-262359-00
Transfer module to chamber valve (SMC valve): 02-121427-00
Throttle valve kit, DLCM-S: 04-048579-02
Loadlock gate valve, SMC: 02-133799-00
Readiness kit (if ordered as a single altus): Dual Altus ready
Software/Controls:
Module controller type: 02-272554-00 (MC3)
System controller type: 02-267883-00 (MC3)
System software (QNX): 5.1
DLCM-S IOC:
0: Type: IOC, Firmware: 4.1
2: Type: IOC, Firmware: 4.1
3: Type: IOC, Firmware: 4.1
Altus IOC:
0: Type: SIOC, Firmware: 4.30
1: Type: SIOC, Firmware: 4.30
2: Type: SIOC, Firmware: 4.30
3 (MPD): Type: IOC, Firmware: 4.10
Chase UI Kit: 02-117110-00
Process Chamber Configuration:
SHWRHD, 8", Style B: 03-00258-00
Assy, PED, 8" MOER, D.3, Semi: 02-033134-01
Excl ring, 8", 2.0 mm Oh, Semi: 15-032777-00
Indexer plate, HUB: 15-034848-00
Indexer, WF, Excl, Option, 8": 15-00934-02
Spindle assembly: 02-126697-00
Opt endpt det'r, MSTR, Alt-S: 04-120458-00
Throttle valve MKS (Pressure control valve): 27-250285-00
Gate valve: 60-10015-00
Gas Box Configuration:
A Manifold:
1: Aera FC-7800 CD, Ar / 2 SLM
3: Aera FC-7810 CD, H2, 20 SLM
B Manifold:
6: Aera FC 7810 CD, C2F6 / 2 SLM
7: Aera FC 7800 CD, O2 / 2 SLM
D Manifold:
2: Aera FC-7800 CD, SiH4 / 100 SCCM
H Manifold:
D: Aera FC-7810 CD, Ar / 20 SLM
W Manifold:
4: Aera FC-7810 CD, Ar / 20 SLM
5: Aera FC-7800 CD, WF6 / 1 SLM
C Manifold:
8: Aera FC 7810 CD, Ar / 10 SLM
9: Aera FC 7810 CD, H2 / 20 SLM
Baratron:
Altus, CAP Manometer, Heated 100 Torr: 27-10340-00
Altus, CAP Manometer, Heater 10 Torr: 27-10343-00
Altus, Backside, CAP Manometer, Heated 100 Torr: 27-10340-00
DLCM-S, Loadlock, CAP Manometer, Heated 100 Torr: 27-10340-00
DLCM-S, TM, CAP Manometer, Heated 100 Torr: 27-10340-00
Supporting remote units:
(1) Process pump per process chamber: BOC Edwards Ih1000
(1) Pedestal pump per process chamber: BOC Edwards i80
(1) TM Pump per system: BOC Edwards i80
(1) LL Pump per system: BOC Edwards i80.
NOVELLUS CONCEPT 2 Dual Altus 2是為快速高效蝕刻加工而設計的最先進的反應堆設備。專為提供快速響應時間和對蝕刻工藝的優越控制，以提高產量而設計。CONCEPT 2 Dual Altus 2建在一個單一、通用的基板平臺上，具有集成的腔室布局，允許處理參數的靈活性和優化。該平臺最多可容納四個蝕刻室，以滿足日益復雜的設備需求和應用。NOVELLUS CONCEPT 2 Dual Altus 2提供可配置的等離子體功率、氣流、壓力和溫度控制，以精確控制蝕刻過程。蝕刻工藝可以量身定制以滿足特定的客戶要求,並且系統對輪廓形狀、層厚度、深度和長寬比保持嚴格控制。CONCEPT 2 Dual Altus 2利用了最新的等離子體蝕刻技術,包括獨特的MESA（多蝕刻源輔助）工藝,可實現極高的蝕刻速率和高度各向異性的蝕刻輪廓。內置等離子體源既利用電容耦合，又利用感應耦合，從而提高了工藝靈活性，改善了輪廓控制。該單元還配備了自動等離子體和監控器，能夠精確控制蝕刻參數。此外，該工具還配備了統一氣體流動的集成氣體分配系統以及集成溫度控制，以確保對蝕刻工藝的精確溫度控制。NOVELLUS CONCEPT 2 Dual Altus 2在滿足非常苛刻的吞吐量需求的同時提供了出色的工藝一致性和可重復性。該資產還具有高級診斷功能,以及大量的流程監控選項。該模型經過了廣泛的鑒定，以確保在廣泛的蝕刻工藝和材料中獲得可靠的高質量結果。該設備還具有極高的吞吐量,允許靈活的制造和更短的周期時間以及最小的停機時間。CONCEPT 2 Dual Altus 2提供了先進靈活的蝕刻解決方案,可以滿足各種行業應用程序的需求。
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