二手 NOVELLUS CONCEPT 2 Dual Sequel #9092631 待售
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ID: 9092631
晶圓大小: 6"
CVD system, 6"
Software: C2.SEQ_4.92B15
Operating system: QNX4
SECS GEM: Yes
Free cable length: 75 Ft
RF Cable length: 84 Ft
Indexer firmware: 2.0_G
Transfer robot: Brooks Mag 7
Chamber location: Left
Chamber model: C2-CVDD-S SEQX
EPD: Verity dual wavelength
Shower head: Al 6061 8" 16-033931-00
Handling wafer size: 6"
Heater block: No slot Sequel STN 1 pin 19-00154-04
Spindle speed: Standard
Fork assembly: Ceramic anti-deflect
15-101482-00
15-101482-01
15-00700-00
Fork type: Min Contact
15-053394-02
Spindle feed through: Ferro fluidic
Primary process gauge: 10T
Gate & throttle valve: Heated / Internal
02-260348-00
16210-0403QS-002HJR
MFC Type: Brooks GF100
IOC Software version: 4.2
RF Switching option: Yes
RPC (Remote plasma clean): No
HF RF Generator: AE Apex 5513
LF RF Generator: AE PDX 1400
RF Match AE mercury: 3013
Foreline heated: No
2.0 MFC C Open
MFC B N2 (10000 sccm)
MFC A N2O (20000 sccm)
MFC 9 NF3 (5000 sccm)
MFC 8 O2 (20000 sccm)
MFC 7 Open
MFC 6 NH3 (10000 sccm)
MFC 5 Open
MFC 4 Open
MFC 3 Open
MFC 2 N2 (5000 sccm)
MFC 1 SiH4 (1000 sccm)
Chamber location: Rear
Chamber model: C2-CVDD-S SEQX
EPD: Verity dual wavelength
Shower head: Al 6061 8" 16-033931-00
Handling wafer size: 6"
Heater block: No slot Sequel STN 1 pin 19-00154-04
Spindle speed: Standard
Fork assembly: Ceramic anti-deflect
15-101482-00
15-101482-01
15-00700-00
Fork type: Min Contact
15-053394-02
Spindle feed through: Ferro fluidic
Primary process gauge: 10T
Gate & throttle valve: Heated / Internal
02-260348-00
16210-0403QS-002HJR
MFC Type: Brooks GF100
IOC Software version: 4.2
RF Switching option: Yes
RPC (Remote plasma clean): No
HF RF Generator: AE Apex 5513
LF RF Generator: AE PDX 1400
RF Match AE mercury: 3013
Foreline heated: No
2.0 MFC C Open
MFC B N2 (10000 sccm)
MFC A N2O (20000 sccm)
MFC 9 NF3 (5000 sccm)
MFC 8 O2 (20000 sccm)
MFC 7 Open
MFC 6 NH3 (10000 sccm)
MFC 5 Open
MFC 4 Open
MFC 3 Open
MFC 2 N2 (5000 sccm)
MFC 1 SiH4 (1000 sccm)
System main power: 3ϕ 5Wires 208V
System UPS power: 3ϕ 3Wires 120V
SMIF Interface: No
Aligner option: No
Loadlock dry pump model: No
Slit valve insert: No
Slit valve type: SMC L-Motion
TM Dry pump model: No
TM Throttle valve: MKS 253B
TM BARATRON model: MKS
Front monitor: 12" LCD
Chase monitor : LCD
Loadlock BARATRON model: No
Indexer robot type: Indexer II
IOC Version: 4.1
TM Robot type: Mag 7
TM Robot blade: Ceramic
Software revision: 4.80 B22
Signal tower: Yes
Module controller: MC1
Host interface: SECS
Module A: Express
Process A: SiH4 Base
Module B: Express
Process B: SiH4 Base
System and DLCM:
MC1 (P166 64M) System
DLCM Module controller
MSSD (2 Sequel configuration) power rack
Upgrade 4 cool station
SiH4 Base oxide process
Signal cables
RF Coaxial cables
MKS 253B throttle valve
651D Throttle valve controller
MAG 7 Transfer robot
Dual arm
Indexer robot
Animatics controller
Standard shuttle assy
Chase PC and table
Generator rack
Process module:
Chamber type: Shrink
Chamber process: SiH4 base
Process clean type: In Situ
Endpoint option: No
Module controller: MC1
Heater block type: Standard
Module dry pump: No
Manometer 1(10T): MKS 627A11TBC
Throttle valve: MKS 253B-15665
Spindle topplate type: Standard
IOC2 option: Ver 4.1
Manometer 2(100T): MKS 627A13TBC
HF Generator: RFG5500
LF Generator: PDX1400
RF Match: AE Mercury 3013
TEOS Delivery cabinet: No
IOC Version: 4.1
Foreline gate heat option: Yes
Foreline gate valve type: HVA
Chamber gas box:
Gas name MFC Size MFC Model
SiH4 1 SLM AERA 7800
N2A 5 SLM AERA 7800
N2B 10 SLM AERA 7800
N20 20 SLM AERA 7800
NH3 10 SLM AERA 7800
O2 20 SLM AERA 7800
C2F6 5 SLM AERA 7800
Module A :
Gas filters
Gas box
HF and LF RF Generators
RF Matching network
Lower spindle assy
Ferrofluidic spindle Assy
Bottom and top plates
10Torr and 1000Torr manometer
Heated type HVA gate and MKS throttle valves
Throttle valve controller
Upgrade MC1 (P166 64M) module controller
Ceramic type spindle fork assy
O-Rings
Metal parts in chamber
Watlow temp controller
Window shappire
Heater ISO box
TC gauge
MFC's
Heater block (OPM)
Shower head
RF and heater feedthru
2000-2001 vintage.
NOVELLUS CONCEPT 2 Dual Sequel是由等離子體化學氣相沈積(CVD)系統的領先供應商NOVELLUS Systems, Inc.設計制造的反應堆。該反應堆用於制造亞微米和超微米尺寸的半導體器件,非常適合大批量生產這些部件。該反應堆包括獨特的雙室設計,利用兩個獨立的腔室將材料沈積到基板上。Dual Sequel反應堆利用高達10 Torr的腔室壓力進行沈積過程,範圍從很低到很高的薄膜厚度。它還包括一個用於不斷監測沈積過程的探測器單元。為了保持整個晶片的熱均勻性,反應堆包括晶片冷卻功能,旨在減少因壁溫度變化而產生的有害影響。此外,此功能還有助於消除過程中的雜質。Dual Sequel反應堆配有獨特的互鎖設備,通過共享真空線將工藝室相互連接。這種互鎖確保兩個會議廳協同工作,從而提供可靠和一致的性能。互鎖還有助於調節整個系統的壓力,使腔室壓力保持在預期範圍內。其他特點包括高效氣體輸送裝置,有助於盡量減少加工氣體的使用。機器還以特殊的「半開」模式運行,可以通過同時執行一系列過程來加快進程。此外,Dual Sequel也因為像緊急泵工具和安全聯鎖一樣具有先進的安全特性而提供了更高的安全級別。總體而言,CONCEPT 2 Dual Sequel反應堆是一種先進、高通量、可靠的CVD工具,非常適合大批量生產小型半導體元件。其獨特的雙室設計提供了更高水平的沈積和溫度控制,而它的互鎖資產允許一個更加統一和高效的過程。它還擁有一系列旨在提高安全性、最大限度地減少工藝氣體和提高吞吐量的功能。
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