二手 NOVELLUS CONCEPT 2 Dual Sequel #9092631 待售

ID: 9092631
晶圓大小: 6"
CVD system, 6" Software: C2.SEQ_4.92B15 Operating system: QNX4 SECS GEM: Yes Free cable length: 75 Ft RF Cable length: 84 Ft Indexer firmware: 2.0_G Transfer robot: Brooks Mag 7 Chamber location: Left Chamber model: C2-CVDD-S SEQX EPD: Verity dual wavelength Shower head: Al 6061 8" 16-033931-00  Handling wafer size: 6" Heater block: No slot Sequel STN 1 pin 19-00154-04 Spindle speed: Standard Fork assembly: Ceramic anti-deflect 15-101482-00 15-101482-01 15-00700-00 Fork type: Min Contact 15-053394-02 Spindle feed through: Ferro fluidic Primary process gauge: 10T Gate & throttle valve: Heated / Internal 02-260348-00 16210-0403QS-002HJR MFC Type: Brooks GF100 IOC Software version: 4.2 RF Switching option: Yes RPC (Remote plasma clean): No    HF RF Generator: AE Apex 5513 LF RF Generator: AE PDX 1400 RF Match AE mercury: 3013 Foreline heated: No 2.0  MFC C Open MFC B N2 (10000 sccm) MFC A N2O (20000 sccm) MFC 9 NF3 (5000 sccm) MFC 8 O2 (20000 sccm) MFC 7 Open MFC 6 NH3 (10000 sccm) MFC 5 Open MFC 4 Open MFC 3 Open MFC 2 N2 (5000 sccm) MFC 1 SiH4 (1000 sccm) Chamber location: Rear Chamber model: C2-CVDD-S SEQX EPD: Verity dual wavelength Shower head: Al 6061 8" 16-033931-00  Handling wafer size: 6" Heater block: No slot Sequel STN 1 pin 19-00154-04 Spindle speed: Standard Fork assembly: Ceramic anti-deflect 15-101482-00 15-101482-01 15-00700-00 Fork type: Min Contact 15-053394-02 Spindle feed through: Ferro fluidic Primary process gauge: 10T Gate & throttle valve: Heated / Internal 02-260348-00 16210-0403QS-002HJR MFC Type: Brooks GF100 IOC Software version: 4.2 RF Switching option: Yes RPC (Remote plasma clean): No    HF RF Generator: AE Apex 5513 LF RF Generator: AE PDX 1400 RF Match AE mercury: 3013 Foreline heated: No 2.0 MFC C Open MFC B N2 (10000 sccm) MFC A N2O (20000 sccm) MFC 9 NF3 (5000 sccm) MFC 8 O2 (20000 sccm) MFC 7 Open MFC 6 NH3 (10000 sccm) MFC 5 Open MFC 4 Open MFC 3 Open MFC 2 N2 (5000 sccm) MFC 1 SiH4 (1000 sccm) System main power: 3ϕ 5Wires 208V System UPS power: 3ϕ 3Wires 120V SMIF Interface: No Aligner option: No Loadlock dry pump model: No Slit valve insert: No Slit valve type: SMC L-Motion TM Dry pump model: No TM Throttle valve: MKS 253B TM BARATRON model: MKS Front monitor: 12" LCD Chase monitor : LCD Loadlock BARATRON model: No Indexer robot type: Indexer II IOC Version: 4.1 TM Robot type: Mag 7 TM Robot blade: Ceramic Software revision: 4.80 B22 Signal tower: Yes Module controller: MC1 Host interface: SECS Module A: Express Process A: SiH4 Base Module B: Express Process B: SiH4 Base System and DLCM: MC1 (P166 64M) System DLCM Module controller MSSD (2 Sequel configuration) power rack Upgrade 4 cool station SiH4 Base oxide process Signal cables RF Coaxial cables MKS 253B throttle valve 651D Throttle valve controller MAG 7 Transfer robot Dual arm Indexer robot Animatics controller Standard shuttle assy Chase PC and table Generator rack Process module: Chamber type: Shrink Chamber process: SiH4 base Process clean type: In Situ Endpoint option: No Module controller: MC1 Heater block type: Standard Module dry pump: No Manometer 1(10T): MKS 627A11TBC Throttle valve: MKS 253B-15665 Spindle topplate type: Standard IOC2 option: Ver 4.1 Manometer 2(100T): MKS 627A13TBC HF Generator: RFG5500 LF Generator: PDX1400 RF Match: AE Mercury 3013 TEOS Delivery cabinet: No IOC Version: 4.1 Foreline gate heat option: Yes Foreline gate valve type: HVA Chamber gas box: Gas name MFC Size MFC Model SiH4 1 SLM AERA 7800 N2A 5 SLM AERA 7800 N2B 10 SLM AERA 7800 N20 20 SLM AERA 7800 NH3 10 SLM AERA 7800 O2 20 SLM AERA 7800 C2F6 5 SLM AERA 7800 Module A : Gas filters Gas box HF and LF RF Generators RF Matching network Lower spindle assy Ferrofluidic spindle Assy Bottom and top plates 10Torr and 1000Torr manometer Heated type HVA gate and MKS throttle valves Throttle valve controller Upgrade MC1 (P166 64M) module controller Ceramic type spindle fork assy O-Rings Metal parts in chamber Watlow temp controller Window shappire Heater ISO box TC gauge MFC's Heater block (OPM) Shower head RF and heater feedthru 2000-2001 vintage.
NOVELLUS CONCEPT 2 Dual Sequel是由等離子體化學氣相沈積(CVD)系統的領先供應商NOVELLUS Systems, Inc.設計制造的反應堆。該反應堆用於制造亞微米和超微米尺寸的半導體器件,非常適合大批量生產這些部件。該反應堆包括獨特的雙室設計,利用兩個獨立的腔室將材料沈積到基板上。Dual Sequel反應堆利用高達10 Torr的腔室壓力進行沈積過程,範圍從很低到很高的薄膜厚度。它還包括一個用於不斷監測沈積過程的探測器單元。為了保持整個晶片的熱均勻性,反應堆包括晶片冷卻功能,旨在減少因壁溫度變化而產生的有害影響。此外,此功能還有助於消除過程中的雜質。Dual Sequel反應堆配有獨特的互鎖設備,通過共享真空線將工藝室相互連接。這種互鎖確保兩個會議廳協同工作,從而提供可靠和一致的性能。互鎖還有助於調節整個系統的壓力,使腔室壓力保持在預期範圍內。其他特點包括高效氣體輸送裝置,有助於盡量減少加工氣體的使用。機器還以特殊的「半開」模式運行,可以通過同時執行一系列過程來加快進程。此外,Dual Sequel也因為像緊急泵工具和安全聯鎖一樣具有先進的安全特性而提供了更高的安全級別。總體而言,CONCEPT 2 Dual Sequel反應堆是一種先進、高通量、可靠的CVD工具,非常適合大批量生產小型半導體元件。其獨特的雙室設計提供了更高水平的沈積和溫度控制,而它的互鎖資產允許一個更加統一和高效的過程。它還擁有一系列旨在提高安全性、最大限度地減少工藝氣體和提高吞吐量的功能。
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