二手 VEECO / EMCORE K465i #9012796 待售

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製造商
VEECO / EMCORE
模型
K465i
ID: 9012796
優質的: 2010
MOCVD system GaN Max temp 1250C degree set point 8 PSU DRT (bow, real temp) (2) Real temp 8 x MO lines NH3, SiH4 (2) MO concentration control (2) Ebara process pump Automated loading chamber Nexus control system H2 + NH3 gas monitor N2+NH3 POU purifiers (2) Johson Matthey V-480 H2 Pd cell purifiers (2) hygrometers (6) water cooled MO baths Fully automated metal-organic chemical vapor deposition (MOCVD) system designed for the production of high-brightness light-emitting diodes Can accommodate up to (45) 2" substrates (or 1x8") in one process Uses FlowFlange technology designed to create a uniform alkyl and hydride flow across all wafers Temperature uniformity by (3) separate heating zones controlled by RealTemp200 systems and additional pyrometer Wafer curvature is monitored by dedicated deflectometer Fully robotized carrier handling tool allows for continuous operation All manuals and schematics for reactor from original Veeco purchase (3) brand-new wafer carriers/susceptors K465i growth chamber and Uniform Flow Flange assembly Rotary Robot Arm Transfer assembly (robot, end effector, robot chamber, buffer chamber, gate valves, controller, etc.) Laminar flowhood wafer loading platform Complete gas panel (NH3/N2/H2, MO source lines, SiH4 source line), injector block Ferrofludic turbodisc rotation assembly Turbodisc controller (2 sets) Veeco K465 heater assembly and filaments (1 installed in chamber, 1 full set as a spare) (2) Ebara ESA-25D process pumps Load lock pump (2) high-capacity particle filter assemblies. (2) particle filter elements Reactor pressure throttle valve (8) DC power supplies for filaments Eurotherm controllers Reactor control CPU, Servo CPU, (2) PC monitors, keyboard and mouse (2) RealTemp 200 Modeling System with dedicated CPU (1) DRT-210 Real-Time Monitoring System with spare CPU (4) Lauda Model 215 bubbler baths (2) Lauda Model 235 bubbler baths (2) Lytron Heat Exchangers for reactor Growth chamber baratron gauge (2) – Piezocons Flow Flange Lift Cart H2 Pd purifier cabinet model: HP 200/400 V-Purge NH3 Purifier - Aeronex 10M N2 Purifier - Aeronex 10M Hygrometer Assy 2-channel Panametrics CM4 Gas monitor Spare Baratron (pressure manometer) and MFC (3) spare Eurotherm controllers (2 cases, 1 partial) MassVac filter elements 2010 vintage.
VEECO/EMCORE K465i中電流電子束(EB)晶圓技術反應器是一種用於制造薄膜的半導體和顯示工業的最先進的設備。它采用了混合光刻、電子束(EB)光刻技術和蒸發技術。該反應堆設有電子源、束能量供應、蒸發源和無掩蔽光刻級。VEECO K465i設計用於處理高達600 mA的高電流過程。這項高端技術使工程師能夠在一個生產步驟中實現多個基板上的陣列設計和薄膜增長的均勻性。它還能處理多種材料,如電子沈積材料、金屬和多晶膜。EMCORE K465i配備了直流(DC)過濾技術,可防止電弧產生,從而提高了過程的一致性。K465i中的電子源是基於槍的電子發射器,由可編程的恒壓電源供電。這樣可確保功率一致且無輸出波紋。VEECO/EMCORE K465i EB晶片技術反應器還提供真空密封結構,包括防止內部部件受到汙染的門。此外,反應堆還配備了自動裝卸系統,並配有預先裝有晶片的托盤,以便高效運行。VEECO K465i EB晶片技術反應器還有一個內置的溫度控制單元,確保過程溫度均勻。這樣可以防止處理結果的任何退化以及熱失控的發生。它還提供了一個可靠的控制器機器和直觀的用戶界面,允許快速和容易調整參數。總之,EMCORE K465i中電流電子束(EB)晶圓技術反應器是制造薄膜的先進可靠工具。它提供了先進的過濾技術、高度可靠的電子源和溫度控制資產,使其成為生產薄膜電路等材料的理想介質電流晶圓技術反應器。
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