二手 WATKINS-JOHNSON 1000H #199252 待售
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ID: 199252
Reactor / Hydride system, 8"
3.0 system with exhaust modified to 2.0 inch for better uniformity
Silane (SiH4) based SiO2
Tool was devoted to SiO2 only; Never ran dopants
Voltage: 208, 50/60hz, 3 phase
(2) Sets of parallel plate injectors
Planned processes:
Film type: NSG, Chamber 1: 380°C deposition temp., 250A thickness, 8", 11ipm belt speed
Film type: NSG, Chamber 4: 380°C deposition temp., 2000A thickness, 8", 11ipm belt speed
Film type: NSG, Chamber 4: 380°C deposition temp., 1000A thickness, 8", 11ipm belt speed
Gas box:
(4) D1N2, 10slm, Lintech MC-200B, 100% concentration
(4) O2, 1.5slm, Lintech MC-2100O, 100% concentration
(4) Sep N2, 20slm, Lintech MC-200B, 100% concentration
(4) B2H6
(4) PH3
(4) SiH4, 0.2slm, Lintech MC-2100MO, 20% concentration, N2 balance gas
(4) D2N2, 6slm, Lintech MC-200B, 100% concentration
Cable lengths:
UPS Communication Cable (Note 1) 40ft, Part No: 815003-378
Communication Cable (Note 2) 20ft, Part No: 815001-732
Reactor Facility Cable 40ft, Part No: 907233-004
UPS Power Cable 10 40ft, Part No: 985227-004
UPS Extension Cable 30ft, Part No: 907202-003
Exhaust modifications done at time of original build:
3.0 to 2.0 Exhaust Downgrade Kit:
A) (8) Adaptor Assy, 3.0 to 2.0 Orifice
B) Toroidal 3.0 to 2.0 orifice installation kit (replaces 912010-001)
C) Process output plumbing kit (replaces 912106-001)
D) Hoist Adaptor Kit
E) 2.0 Muffle Etch Hardware:
3 color signal tower: Green-Yellow-Red
SECS II SW option
English software
Modifications by OEM:
1 - The 3" exhaust was modified at the torrodial orifices to 2" that can provide better on wafer uniformity for the SiO2 film
The torrodials, bellows, and injector vents also have 2" exhaust type
Downstream of the torrodials to the house exhaust the system is the standard 3" type
2 - Gas box has SiH4, N2, and O2 MFC's, but never had dopant (B2H6 and PH3) MFC's installed for BPSG films
This tool has never run dopants
There are SS tube spools in place where the dopant MFC's would normally be placed
If the buyer wants to run doped films that is no problem, they just need to add the MFC's into the tool
The original owner only used the tools for various SiO2 films and wanted to keep them (and the system) as pure and dopant free as possible
UPS may not be included/or non-functional due to age
Tool is de-installed, barrier bagged, and crated
Currently stored in a warehouse
1996 vintage.
WATKINS-JOHNSON 1000H是一種先進的研究級反應堆,設計用於運行深入的核物理實驗。它是一個緊湊的高中子通量反應堆(CNR),通常用於研究實驗室模擬核反應和測量輻射水平。反應堆是實驗室、大學和發電廠的理想工具,因為它能夠產生非常高的中子通量。它擁有一個集成的安全系統,以及一系列能夠提供可靠和安全性能的專利技術。1000H由中央反應堆堆芯、環繞屏蔽、石墨反射器和減速器以及通氣室組成。反應堆堆芯充滿了鈾,鈾經過高度濃縮後產生了核反應。石墨反射器和減速器控制中子通量,限制反應範圍。氣室允許冷卻流體的流入和流出;反應堆能夠長時間運行,不需要定期維護。WATKINS-JOHNSON 1000H反應堆的綜合安全系統旨在監測反應堆的性能和任何異常。它具有許多傳感器和探測器,記錄和記錄有關中子通量、臨界度和輻射水平的數據。此外,反應堆還配備了緊急關閉系統,設計用於在出現任何不安全情況時立即關閉反應堆。1000H反應堆的最大功率輸出為1,000瓦。它體積小,易於訪問,在高度規範的環境中提供可靠的性能和數據。反應堆是核物理學家中流行的工具,提供包括中子通量測定、截面測量和放射化學分析在內的一系列有用功能。WATKINS-JOHNSON 1000H反應堆是一個強大、先進和可靠的研究工具。
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