二手 AMAT / APPLIED MATERIALS VeritySEM 2 #9094373 待售
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ID: 9094373
晶圓大小: 12"
優質的: 2003
Critical Dimension Scanning Electron Microscope (CD-SEM), 12"
Includes:
Thermally assisted field emission electron gun
Patented electron optics (YAP detector included)
SEM Autofocus and auto stigmation module
(3) Open cassette ports, 12"
Standing / Sitting operator console
3D Sidewall imaging
Signal tower
Thermal video and alphanumeric printers
Central recipe database server
Metrology
Lines and CH slope: (2) Angle, (2) Height
Repeatability: L-0.45 nm, CH-0.55 nm (1) 1°/ 1° / 1° 10 nm / 10nm / 17nm
Reproducibility: L-0.45 nm, CH-0.55 nm (1) 1° / 1° / 1° 10 nm / 10nm / 17nm
VeritySEM2: 0.9 nm
Imaging:
Image resolution: 1.65 nm at (4) 800, 0 V
Side wall imaging: (5) 15° Tilt at 4 directions
HAR Imaging: 1:30 Features
(7) ABW: 10.5 nm
Accelerating voltage: 0.2 kV - 2.5 kV
Extraction voltage up to 4 kV
Probe current: 5 pA - 500 pA
System performance:
Throughput: (6) Lines / Spaces slope / Height
5 Sites / Wafer: 65 WPH 13 WPH
20 Sites / Wafer: 33 WPH
PR Success rate: 99.70%
MTBF: 1,000 Hours
MTTR: 4 Hours
MTBA: 24 Hours
Availability: 95%
Wafer particle contamination:
Front 0.09 um particles 25 PWP / Wafer (With mini environment)
Front 0.2 um particles 5 PWP / Wafer (With mini environment)
Back 0.2 um particles 3000 PWP / Wafer (With mini environment)
Equipment parameters:
Wafer size: 6"-12"
Optical magnification 16x, 220x (FOV: 450 mm - 6000 mm)
SEM magnifications: 1,000x to 400,000x (100 mm - 0.25 mm)
Stage: 300 mm/s With continuous motion trackball
Host: 19.4 CBM
FFU: 2.0 CBM
Workstation: 2.5 CBM
UPS, Chiller and electric disk: 2.1 CBM
Does not include dry pump
2003 vintage.
AMAT/APPLIED MATERIALS VeritySEM 2是一種掃描電子顯微鏡(SEM),用於分析材料和表面。它使用戶能夠觀察、表征和處理納米級的樣品。這一功能強大、用途廣泛的儀器是用於研究和開發目的的寶貴工具。該系統由電子槍、樣品架、電子光學、檢測器等幾個基本子系統組成。電子槍產生一束電子束,然後在樣品表面聚焦和掃描。樣品支架用於定位和定位電子束的樣品。電子光學器件負責將電子聚焦在樣品表面上以及放大和探測。探測器用來分析從樣品中散射出來的電子。AMAT VeritySEM 2是一種高度精確且用途廣泛的儀器,允許用戶進行廣泛的分析。APPLICED MATERIALS VERITY SEM 2能夠達到50,000倍的放大倍數,是研究納米級特征的理想工具。「濺射離子源」(Sputter Ion Source)選項還允許曲面結構化和濺射蝕刻。這一特性允許在納米級操縱樣品表面,如沈積或去除薄膜、濺射蝕刻、濺射清洗和圖案。VERITY SEM 2還具有廣泛的分析能力。其能量色散X射線光譜(EDS)選項允許對樣品進行元素表征,其經過能量過濾的成像允許用戶以納米級分辨率精確成像不同的化學和結構特征。該系統還提供了執行反向散射電子成像的能力,能夠令人信服地目視檢查材料的表面特征。總之,VeritySEM 2是一種功能強大、用途廣泛的儀器,適用於樣品表面的材料表征和操作。其分辨出納米級特征的能力,以及廣泛的分析能力,使其成為研發的有效工具。
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