二手 PHILIPS / FEI Quanta 3D FEG #293732731 待售

Focused Ion Beam Scanning Electron Microscope (FIB-SEM) Electron beam resolution: High vacuum: 1.2 nm at 30 kV (SE) 2.9 nm at 1 kV (SE) Low vacuum: 1.5 nm at 30 kV (SE) 2.9 nm at 3 kV (SE) Extended low-vacuum mode 1.5 nm at 30 kV (SE) Ion beam resolution: 7 nm at 30 kV at beam coincident point Detectors: Everhardt-Thornley SED Low vacuum SED Gaseous SED (used in ESEM mode) IR-CCD Chambers: 379 mm left to right 21 ports 10 mm E- and I-beam coincidence point Angle between electron and ion columns: 52° High-vacuum: < 6e-4 Pa Low-vacuum: 10 to 130 Pa ESEM-vacuum: 10 to 4000 Pa 5-Axis motorized stage: Eucentric goniometer stage Z = 25 mm X = 50 mm Y = 50 mm Maximum sample height = 50 mm T=-15° to +75° R = n x 360° Minimum step: 300 nm Repeatability at 0° tilt; 2 μm Repeatability at 52° tilt; 4 μm Gas chemistry: Tungsten metal deposition Gold deposition Insulator deposition (SiO2) Enhanced metal etch Insulator enhanced etch (XeF2) Delineation etch Carbon deposition System control: 32-Bit graphical user interface Keyboard Optical mouse Operating system: Windows XP LCD Display, 19" PC Multi-functional control panel.