二手 PHILIPS / FEI Quanta 450 #9200223 待售
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ID: 9200223
優質的: 2012
Scanning Electron Microscope (SEM)
Nano characterization:
Metals and alloys
Oxidation / Corrosion
Fractures
Welds
Polished
Sections
Magnetic
Superconducting materials
Ceramics
Composites
Plastics
Film / Coatings
Geological sections
Minerals
Nanoprocesses:
Hydration / Dehydration
Wetting behaviour / Contact angle analysis
Oxidation / Corrosion
Tensile (Heat / Cooling)
Crystallization / Phase transformation
Soft materials:
Polymers
Pharmaceuticals
Filters
Gels
Tissues
Plant material
Particles
Porous materials
Fibers
Nano prototyping:
Lithography
EBID
Essential specifications:
Electron optics:
High performance thermal emission SEM
Fixed objective aperture
Objective lens geometry: 45°C
Maximum horizontal field width: 6.5 mm
Distance (10 mm): 24.3 mm (65 mm)
Accelerating voltage: 200 V - 30 kV
Probe current: Up to 2 µA
Magnification: 6 -1000000 x
Electron beam resolution:
High vacuum:
3.0 nm - 30 kV (SE)
4.0 nm - 30 kV (BSE)
8.0 nm - 3 kV (SE)
Extended vacuum mode (ESEM):
3.0nm - 30 kV (SE)
Detectors:
Everhart thornley SED (secondary electron detector)
Large field low vacuum SED (LFD)
High sensitivity low kV (SS-BSED)
Gaseous SED (GSED) (used in ESEM mode)
4-Quadrant solid-state (BSED)
Scintillator (BSED / CLD)
IR Camera for viewing sample in chamber
Vacuum system: 1 x 250 l/s TMP (Turbomolecular pump)
Beam gas path length: 10 mm / 2 mm
Chamber vacuum:
High: < 6e - 4 Pa
Low: < 10 - 130 Pa
ESEM: < 10 - 2600 Pa
Evacuation time:
High vacuum: ≤ 150 s
ESEM (FEI Standard test procedures): ≤ 270 s
Chamber:
Size: Left to right 284 mm
Analytical WD: 10 mm
(8) Ports
EDS take-off angle: 35°C
Stage:
X-Y: 100 mm
Z: 60 mm
Z clearance: 75 mm
T: - 5° - 70°
R: 360°
Repeatability: 2 µm (x - y)
Sample holders:
Multi-stub
Single stub mount
Various wafer and custom
Universal sample
System control:
32-Bit graphical user interface: Windows XP
Keyboard and optical mouse
LCD Display, 19"
SVGA 1280 x 1024
Joystick
Manual user
Image processor:
4096 x 3536 Pixels (~14 MP)
File type:
TIFF (8 / 16 bit)
BMP / JPEG
System options:
Manual user interface
Support PC (Monitor, 19")
2012 vintage.
PHILIPS/FEI Quanta 450是為高靈敏度成像和分析應用而設計的掃描電子顯微鏡（SEM）。其高分辨率圖像使得它非常適合檢測納米尺寸樣品中的微結構。顯微鏡包括單色高壓電子槍，全套可變電壓成像和二次電子（SE）探測器，強大的檢測軟件，數字圖像處理能力。FEI Quanta 450是一款功能強大的高性能SEM，適用於半導體故障分析、材料結構分析和無損材料檢測等廣泛應用。該系統的分辨率可達1.1海裏，可對納米級結構進行高精度成像。顯微鏡內裝有蔡司ECU-D1單色電子槍。這種場發射電子源具有1 nm的光斑大小、高穩定性和重復性以及低熱發射率。該源安裝在X-Y手動運動機構上，使其能夠精確放置在樣品上方，從而產生低漂移和高精度。飛利浦Quanta 450包括全套SE探測器，包括二次電子探測器（SED）和反向散射電子探測器（BSD）。探測器安裝在Y-Z手動運動機構上,使其能夠精確定位在樣品周圍。這樣可以精確識別體積小的結構元素。隨顯微鏡安裝的軟件使操作變得容易。它包括二維成像、三維（3D）重建、樣品定位和能量色散X射線光譜（EDS）。軟件的映像部分靈活且用戶友好,允許進行各種映像設置和增強。顯微鏡的數字圖像處理能力穩健，為用戶提供了先進的圖像分割、定量圖像分析、直方圖分析等一系列特征。此成像對於故障分析中的復雜應用至關重要。總體而言，Quanta 450是一種先進的掃描電子顯微鏡，設計用於高分辨率成像和分析納米級結構。單色電子槍具有1 nm的光斑尺寸、全套SE探測器、軟件和數字圖像處理系統，使其成為檢測半導體、材料和器件樣品中微觀結構的理想選擇。
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