二手 ACCUSPUTTER AW 4450 #9201786 待售
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ID: 9201786
晶圓大小: 8"
Sputtering system, 8"
Wafer loading: Manual
With load lock
Cathodes: (3) Delta shapes / (4) Circle shapes
Sputter methods: RF / DC
Diode / MAGNETRON
Gas lines: 1~3 MFC
Options:
Gas lines with MFC
N2
O2
Customized
Lamp tower alarm with buzzer:
Mechanical pump / Dry pump for process chamber and load lock
Independent mechanical pump / Dry pump for process chamber
Chiller for cooling plates and table
Turbo pump for load lock
Load lock lamp heating function: Up to 200°C
Chamber lamp heating function: Up to 300°C
Plasma etch function
Bias function
Co sputter function
Reactive sputter function
Main frame
28" Diameter SST chamber top plate with ports and cathodes:
Configuration I II
Cathode shape Circle Delta
Cathode size 8" Delta
Cathode quantity 1 to 4 1 to 3
Sputter power supply:
Configuration I II III
DC Power 5 kW 10 kW -
RF Power 1kW 2 kW 3 kW
Pulse DC power 5 kW 10 kW -
Process chamber:
8" Diameter x 12" High stainless steel cylinder with 6"
CF Flange view port and load lock port
28" Diameter stainless steel base plate
11/2" Air operated roughing isolation valve
Air operated gas inlet valve
Air operated vent valve
11/2" Blanked-off leak check port
Removable deposition shields
23" Diameter, 3-position water cooled annular substrate
Table with variable speed motorized table drive
Full circle shutter and vane shutter
Chain drive pallet carrier transport
Heavy duty electric hoist
Load lock:
30" x 28" x 8" Stainless steel load lock chamber
Aluminum cover
Chain drive pallet carrier transport
2" Air operated roughing isolation valve
Air operated vent valve
23" Diameter molybdenum annular substrate pallet
Elevator for pallet up and down function
Vacuum systems for process chamber:
(2) Stage cryo pumps
With 1000 l/s pumping speed for air
Includes:
Chevron
Water cooled compressor and lines
Automatic regeneration controller
Plumbing kit, 71/2"
Aluminum air operated gate valve: 6" ASA
Air operated venetian blind throttling valve
Mechanical pump or dry pump for process: 36.7 Cfm
Chamber and load lock
Gas line with MFC
Ar, 200 SCCM, customized
Power box: AC 380 V / 208 V / 3 Phase.
AW 4450是一種先進的薄膜沈積設備。這一件工業設備的設計目的是在矽片、電線、纖維、電子元件等多種基板的表面上創造出薄薄的金屬和介電層。利用物理氣相沈積，AW 4450以高效的方式生產出厚度均勻一致的薄膜。ACCEPUTTER AW 4450由一臺頻率範圍為13.56 MHz或40 kHz的先進射頻（RF）發電機供電。這允許精確而有力的濺射，使具有非常一致特性的薄膜以高度可重復的方式沈積。此外，射頻功率是可調的，給用戶精確控制沈積速率和層厚度。AW 4450配備了能達到1.3 × 10-4 Pa的高真空室、自動真空設置，以及與差動泵送工藝室集成的渦輪泵。這樣可以精確地控制濺射塗層的過程。此外,系統還可以容納50毫米的樣本量。利用其HVQ極性控制，ACCUSPUTTER AW 4450還可以以更高的精度和控制能力沈積多層薄膜。為保證優質產品，AW 4450配備了先進的控制和監控系統。這包括工藝電位監視器、基板偏置電壓監視器和等離子體電位監視器，所有這些都可以實時監控。此外，機組還配備了質量流控制器，以確保整個過程中過程氣體的純度保持一致水平。ACCUSPUTTER AW 4450是一款功能強大且高度精確的濺射機，旨在處理廣泛的濺射應用。通過其精確的射頻功率調節、高真空室、濺射室差動泵送、精確的控制和監控系統以及處理高達50毫米樣本量的能力，該工具是精確度和重復性至關重要的一系列工業應用的理想選擇。
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