二手 AMAT / APPLIED MATERIALS Endura 5500 #9257162 待售

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ID: 9257162
Sputtering system, 6" Load lock chamber: LLC Type: Narrow body Indexer without rotation Wafer mapping CH Vent: Slow / Fast vent No wafer slide out detector Buffer chamber: AGILENT / HP / HEWLETT-PACKARD Robot Upper and lower motors (2) Gate valves Cryo pump: 3 Phase (7) Wafer sensors Transfer chamber: AGILENT / HP / HEWLETT-PACKARD Robot Upper and lower motors (2) Gate valves Cryo pump: 3 Phase (6) Wafer sensors Chamber A: Pass through Chamber B: Cool down Chamber A / B: Lid type: Clear plastic Wafer lift Wafer lift hoop No TC monitor Chamber E / F: Orienter degas Degas lamp module Wafer lift Wafer lift hoop Wafer chuck Orienter controller PCB Laser CCD array PCB No TC No TC amp Chamber 1: PVD Wide body Source assy: 11.3" Source bracket kit COH TI Adapter plate Wafer lift: Clamp Heater: Clamp Heater water box: Clamp MKS 100 mT Manometer Ar Backside (2) Gate valves Ion gauge Shutter option Cryo pump, 3 Phase Heater type: Clamp Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic 1/8 poly line set Chamber 2: PVD Wide body Source assy, 11.3" Source bracket kit Adapter plate: WB to STD 13" Wafer lift: Clamp Heater: Clamp Heater water box: Clamp MKS 100 mT Manometer Ar Backside (2) Gate valves Ion gauge Shutter option Cryo pump: 3 Phase Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic: 1/8 Poly line set Chamber 3 / 4: PVD Wide body Source assy: 11.3" Source bracket kit Adapter plate: WB to STD 13" Wafer lift: Clamp Heater: Clamp Heater water box: Clamp MKS 100 mT Manometer Convectron gauge Ar Backside (3) Gate valves: PVD Ion gauge Shutter option Heater type Chamber harness Chamber inter-connect PCB Chamber process gas line Chamber vent line Chamber source water manifold Chamber pneumatic: 1/8 Poly line set Chamber C: PCII Etch Resonator Pedestal lift MKS Manometer Convectron gauge Ion gauge Turbo pump Wafer lift RF Match No process kit Chamber 1, 2, 3, 4, C: Gas panel assy MFC: STEC 4400 MFC Down steam valve Manual shut off valve MFC Control cable MFC Inter-connect PCB Sub-module: CTI-CRYOGENICS 9600 Cryo compressor (2) Cryo controllers: 3 Phase NESLAB III Chiller Vacuum pump System pump: BOC EDWARDS QDP40 PCII Pump: BOC EDWARDS QDP40 + MB250 System rack: VEM SBC SEI (12) DIO AI (2) AO (3) Opto PCB (2) AI MUX Cryo temp / AI MUX (4) Steppers PCB TC Gauge PCB (2) Ion gauges PCB (4) Invertron gauges PCB OMS PCB Hard Disk Drive (HDD) Floppy Disk Drive (FDD) (4) HTR Lift drivers, 2-Phase (6) Robot drives, 5-Phase RF Rack: RF / DC Rack (5) ISO Amp (4) DC / RF Generator interlocks PCB DC Power supply ADVANCED ENERGY MDX-L12 DC Generator CPS 1001 RF Generator RFPPLF10A RF Generator Missing parts: Metal blades Laser tubes Heater type: Clamp Cryo pump, 3 Phase Turbo controller RF / DC Rack ADVANCED ENERGY MDX-L Series DC Generator RF Generator, 13.56 MHz / 400 kHz Power supply: AC Rack type: 480 VAC, 3 Phase, 4+1 Wire with transformer DC Power supply: +5 VDC / +24 VDC DC Power supply: +/-15 VDC / +/-12 VDC 2000 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一種用於濕蝕刻的基於半導體的高密度等離子體反應器。該反應器的設計是為了在先進集成電路的生產和工程中提供卓越的均勻性。它提供了廣泛的等離子體資源選項,以及最先進的過程控制和監控功能。AKT Endura 5500操作系統旨在減少工藝偏差,同時提高性能和產量。AMAT ENDURA 5500被設計為具有氮化氙(GaN)蝕刻工藝。它具有二極管泵浦脈沖等離子體源模塊、過程控制模塊和蝕刻模塊。脈沖等離子體源是一種高壓高效裝置,能夠對等離子體參數進行精細控制,提高蝕刻性能。工藝控制模塊為各種生產要求提供了靈活性。它能夠控制多種氣體管線和輸送閥,以及方便地實時切換多個蝕刻參數,如氣壓、壓板電壓、蝕刻時間、壓板電壓偏置、腔室溫度等。蝕刻模塊的設計具有靈活性、蝕刻過程的加速度和蝕刻圖案的均勻性。它具有可復制的印版設計,以減少潛在的工藝偏差,同時還支持針對特殊蝕刻工藝的特定印版設計。AKT ENDURA 5500是一種高度可靠的反應堆,維護要求低。它能夠實現低缺陷率,同時保持高產品產量。該反應堆設計易於使用,具有直觀的用戶界面,以及簡單、分步的工藝支持。它為工藝工程師和生產人員提供了有關工藝結果的寶貴反饋,從而加快了周期時間並提高了產量。該反應堆還設計用於生產和工程過程參數的長期穩定性和可重復性。總體而言,AMAT Endura 5500是一種用於濕蝕刻的高度先進、可靠、易於使用的高密度等離子體反應器。它旨在提供改進的過程控制、統一的蝕刻模式和提高的產品產量。它可實現更輕松、更快和可重復的過程,同時還為工程師和生產人員提供有關過程結果的寶貴反饋。
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