二手 CPA / KURDEX 9900 #9116667 待售

製造商
CPA / KURDEX
模型
9900
ID: 9116667
Sputtering system Entry / Exit load lock: CPA Chamber CPA Load lock valve Load lock chamber, 13.125” Single pallet operation Substrate, 12” x 12” SST Pallet, 15.5”x14” GP-303 Ion gauge controller Pallet sensors Load / Unload station Process chamber: CTI CT-8 Cryo pump VAT Hivac valve MKS Throttling valve CTI 8500 Compressor GP-303 Ion gauge controller (2) Gas system with VCR gas lines (2) NUPRO Isolation valves (2) MKS MFCs for Ar, O2 Chain drive transport system (2) AE Pinnacle+, 10kw dc power supplies (1) CPA Process chamber: (2) CPA 4.75”x15” DC magnetron Assemblies: (2) Sets of target shielding Control system: Opto-22 PLC, monitor Manual & auto control modes Recipe control I/O Wiring Ul Approved power box with EMO CPA Optical pallet sensing system With controller & sensors Process parameter control ranges: Sputtering pressure: 5 - 30 Microns Conveyor speed: 0.1 - 80 cm.min. D.C Deposition power level: 100 - 9000 watts R.F Deposition power level: 50 - 3000 watts R.F Sputter clean power level: 15 - 1000 watts Substrate heating: Ambient to 350°C Uniformity performance: Etch: ±10% Deposition: R.F Magnetron ±10% D.C Magnetron ±5% Vacuum performance: Ultimate pressure 2 x 10(-7) in 16 hrs 5 x 10(-7) in 30 minutes Rate of rise: 1 x 10(-4) 6 minutes Vacuum tight: Less than 5 x 10(-10) standard atmosphere cc helium/second Utility requirements: 4-Wire delta or 5 wire wye Water temperature: 50 - 75°F (10-24°C) Air: 70 to 100 PSIG (6 to 8 ATU) filtered, 1 CFM Sputtering gas: Typically 5 PSIG (1.3 ATU) Argon Options: Sputter etch CPA Etch table assy AE Matching network RF Switching assy AE RF generator Sputter area mod, 24" RGA: LEYBOLD Transpector Installed with isolation valve Substrate heater: Process chamber Heater assy Contoller Wiring Power: 208 V, 50/60 Hz, 3 Phase, 100 A.
CPA/KURDEX 9900是為可靠的高性能真空沈積過程而設計的濺射沈積設備。該系統能夠提供高質量、均勻的薄膜材料,並在眾多行業中得到應用。CPA 9900為工作室提供了多個選項。它具有適合於濺射沈積和氣相沈積過程的雙腔室。其中一個腔室可配置冷凍泵,用於高真空或超高真空環境。KURDEX 9900濺射單元包括四柱式磁控管。此配置允許用戶快速為其應用程序選擇最合適的源配置。此外,這臺機器還提供了基板旋轉臺的變頻控制,以及對多種濺射配方進行編程的設施。9900工具采用磁場輔助濺射,以確保與時間無關的沈積速率。結果是一種更均勻、更清潔、更厚的薄膜,可以滿足苛刻的應用。該資產還可以容納多目標濺射配置,允許用戶在一次運行中存入不同的成分。該型號還配備了帶背襯泵的渦輪泵,具有卓越的真空性能。渦輪泵可以與腔室分開安裝,讓腔室無憂維護。此外,CPA/KURDEX 9900還有一個燃氣箱,裝有受管制的高純度氣體。這種氣箱允許用戶控制氣體,如氙氣、氮氣、氧氣和氫氣。除了CPA 9900提供的眾多功能和選項外,設備人性化,操作方便學習。該系統還帶有一個直觀的圖形用戶界面(GUI),它簡化了操作,使編程濺射作業更加容易。KURDEX 9900是那些需要可靠和用戶友好的濺射裝置的人的絕佳選擇。這臺機器具有多種配置選項、易於操作、強大的性能和出色的性能,適合廣泛的濺射應用。
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