二手 ENERJET KJL-HV-268-A #9122382 待售
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ID: 9122382
Sputtering system
Targets: Torus-10
Chamber: ~28" round vacuum, 14" H
(4) Ports in floor of chamber (3 filled with Torus-10 sputtering sources)
Front viewport
Rear connections for rough lines and gauges
Side mounting for cryo pump
Chamber lid with lifter has a 8 x 4" wafer plate mounted to it on a rotary feedthru
Motor connected to motor controller that spins at 0-24 RPM
CTI-8 Cryo pump
Compressor not included (cables & hoses included)
Tool pumps to 8x10-6 in 2 hours, upper 10-7 overnight
Cryo has a gate valve and a conductance control valve (multivane, micrometer at stop to throttle back pumping)
(3) Sputter sources
(1) Connected to DC power supply: (1) Eratron
(1) RF: not connected
Targets available: Al, Al/Si (0.5, 1, 2%) C, Cr, Cu, Mo, Si, SiO2, Si3N4, Ta, Ti, TiN, W, W-Ti, WC and Y in various states of use
Tool has systems to run:
Pump controller to control power to pumps and crossover to high vac
Gauge interface and baratron, convection and ion gauges
Flow controller for MFCs (100 SCCM Ar, O2, N2) that can be slaved to pressure or ratio'd
Cryo controller and cryo temperature gauge
Heater controller but heating element has been moved
Rotation controller
Water flow system, valves and flow switches
Interlocked cabinet
Fixturing for 4", 3" wafers
(2) Chamber shields that can be cleaned (floor of chamber is only part that is not cleaned)
Currently in cleanroom.
ENERJET KJL-HV-268-A濺射裝置是一種高性能濺射裝置,設計用於原子和分子薄膜在表面上的沈積。該系統由三源多陰極濺射槍組成,結合高真空室和集成調壓單元,用於控制機器的工作環境。該槍有一個內置的腔室,用可調節的基板支架沈積濺射膜,允許廣泛的應用。該工具具有創新和先進的高真空室,設計高效,安全,易於使用。它利用磁懸浮資產,動態平衡室內壓力,確保均勻膜沈積。內置腔室壓力調節器可以讓用戶精確可靠地控制工作環境。濺射陰極向要濺射的表面輸送均勻的低能離子,防止產生汙染,並消除燃燒和最初清潔基板的需要。KJL-HV-268-A濺射模型非常適合各種金屬、合金、氧化物和其他材料的沈積。由於其可變的幾何形狀和脈沖頻率,設備可以用來層狀或蝕刻材料到幾埃的厚度。基板支架可調,可容納直徑不超過12 「x 12」的基板。它還能夠以不同角度濺射層,允許生產多層薄膜。該系統具有方便的數字控制接口,並帶有外部控制輸入.這使得自動化設備並將其集成到現有系統中變得容易。高真空室水冷,節省操作成本,並具有安全交錯,在真空室運行時鎖上車門。它還具有診斷警報和控制,以便用戶在運行機器時註意安全協議。ENERJET KJL-HV-268-A濺射工具提供了極致的生產力、速度和精度。它具有先進的特點和可靠的性能,是高質量濺射薄膜沈積的絕佳選擇。
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