二手 FHR Line 1100 V #9257517 待售
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ID: 9257517
Inline sputtering system
Deposition of dielectric coatings: 7° front side
Modules:
Module 1: Loading station
Module 2: Input load lock
Module 3: Buffer chamber 1
Module 4: Transfer chamber
Module 5:
Process chamber 1: Etching and sputtering
Module 6:
Process chamber 2: Sputtering
Module 7:
Process chamber 3: Sputtering
Module 8: Transfer chamber
Module 9: Output load lock
Module 10: Unloading station
Substrate load / unload module using (2) KUKA robots
Vacuum:
End pressure: ≤2 x 10^-6 mbar after 8 hours
End pressure: ≤1.5 x 10^-6 mbar after 12 hours
Chambers:
Stainless steel vacuum chamber
Powder coated mild steel chamber frame
Pneumatic gate valves
Modules includes:
Turbo molecular pump: DN 250 ISO-K
View port: DN 100
Front service flange
Flap valves VAT
Rotary dry pump: 300 m³/h and 250 m³/h
Roots pump: 1000 m³/h
1900 Is^-1 for N2 and ca 1400 I/s for N2
Gate valves DN 250
Meissner trap with cryo generator
(6) Pirani gauges fore vacuum sensors: 1000 mbar - 10^-3 mbar
(8) Penning high vacuum sensors: 10^-3 mbar - 10^-8 mbar
(13) Baratrons MKS 627: 10^-1 mbar - 10^-4 mbar
Upstream pressure regulation
Atmospheric pressure sensors
Heater
Vacuum gauges
Inverted magnetron plasma source:
Target length: ~39"
Planar sputtering cathodes:
(10) Cathodes
Target length: 39"
Target substrate distance: 4"
Rotatable sputtering cathodes:
(10) Cathodes
SCI
Type: MC-End block
Target length: 39"
Backing tube diameter: 5"
Target substrate distance: 4"
Gas admission system:
MFC for Ar each sputtering source
Gas lines for 5N purity
Power supplies:
High voltage power supply for inverted magnetron plasma source
DC AE Power supply: ≥1 kW
DC AE Power supply: 2 x 6 kW
DC AE Power supply: 30 kW
(5) DC AE Power supply: 2 x 10 kW
Control and visualization:
PC Surface
Operating system: Windows 7 Professional
PLC General control
Cooling water:
Power supplies (PSU)
Cathode
Cathode surrounds cooled by water loops
Power supplies:
Aggregate connection: 3 / N / PE AC 380 V / 50 Hz
Voltage: 24 V.
FHR 1100 V線濺射設備是一種用途廣泛、可靠的塗層系統，旨在將薄膜沈積在多種基板上。它適合生產各種材料，包括金屬、陶瓷、氧化物和其他化合物。它是一個高生產力的單元，能夠塗覆高達1250 x 1100 mm的表面積。1100 V線是一個真空密封的腔室，讓它保持了生產高品質薄膜的合適環境。該腔室包括一個工藝氣體入口和出口，允許引入成功濺射所需的氣體和蒸氣。該機在設計時考慮到高功率輸出，從3到6 kW不等。它還設計用於高度精確和可重復的濺射，具有計算機控制的電壓映射以及以單聲道或雙元件模式傳輸薄膜的能力等特點。此外，1100V能夠對各種片狀和粉狀材料進行反應性濺射、被動濺射以及沈積方法。FHR 1100 V線能夠對沈積過程中輸送到基板的能量量進行精細控制。計算機控制的電壓和電流映射等功能確保在薄膜沈積過程中保持高精度和可重復性。由於該刀具的高效設計和功率輸出，使得濺射膜高度均勻，從而能夠精確的薄膜層厚度。該資產還提供了一種功能強大的集成控制模型,具有帶圖形處理單元和靈活編程選項的軟件包。這允許用戶通過精確的結果和功能（如實時自動監控流程參數）來微調流程參數。Line 1100 V還具有集成的故障查找診斷功能,可以更輕松地診斷過程中的問題。總體而言,FHR Line 1100 V是各種薄膜沈積工藝的理想解決方案,具有確保可重復和準確結果的特點。其強大的控制系統和一致的性能使其成為許多生產過程的寶貴設備。
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