二手 KURT J. LESKER PVD 75 #9241893 待售
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ID: 9241893
Thin film sputtering system
PVD Process chamber:
D-Shaped 304 SS, 24" high x 14" wide
Volume: 75 liters
Large access & replaceable view port
O-Ring sealed
Front access door
Flexible process ports
304L Stainless steel with 6061 aluminium hinged door
Vacuum pumping:
CTI-8F 1500 Cryopump
Compressor
3-Position pneumatic isolation gate valve
Touchscreen controller / PC Control
Oil-sealed mechanical rough pump: 5.7 CFM
Fore line valve
Dry roughing pump
Fore line trap
Mist eliminator
Roughing valve
Vacuum gauging:
Wide range vacuum gauge (Ion gauge & Pirani)
Mounting / Connection hardware
Adapters
Cabinet & framework:
Closed system support frame
Power distribution
Leveling pads
Cabinet construction carbon steel
Gray powder coat finish
Water manifold includes:
System components: Water distribution
Critical components: Interlocked flow switches
Shut off valves
NPT Connection, 1"
TEK-TEMP Recirculating water chiller, 6 gpm, 10000 Btu, 60 PSI
Sputtering source:
(3) MAGNETRON Sputtering source flange assemblies
(4) MAGNETRON Sputter cathodes
O-Ring sealed compression fittings: Source-to-substrate distance
Pneumatic driven deposition source shutter
Power supply:
KJLC 600 W RF Power supply with automatic matching network & control panel
(2) ADVANCED ENERGY DC Power supplies, 1.5 kW
Rack mount kits & connection cables
Top mounted custom substrate:
Single substrate, 12"
20 rpm
Stainless steel substrate holder:
Diameter: ¼"
High substrates: ¼"
Substrate heating & control:
Temperature: 350°C
Quartz Lamp / Resistive element
Process gas inlet / Upstream pressure control:
(2) MKS 1179 Flow controllers
MKS Baratron 626A Pressure transducer, 100 mTorr
Vent & purge pressure regulators
Film thickness monitor and optional control:
Quartz Crystal thickness monitor with single crystal head
Manual system control:
Touch screen controller: Button pump down & vent
Valves & shutter assemblies
Manual front panel control of power supplies
Switches
Full automatic process control
Graphical User Interface (GUI):
Vacuum screen display: Valve position & pump status
Vacuum status
Deposition screen:
Indicate shutter position
Deposition source status
Source material & target life log
Gas screen:
Mass flow controller modes
Indicate gas valve status
Display of pressure control settings & values
Motion screen display & input:
Speed & velocity profiles
PID Control parameters
Cooling screen: Water flow switch interlock status
Heating screen: Heater set points & control parameters
Turbo pump pressure (CDE): 5 x 10^-7 Torr
Power distribution:
Single service drop: 208 VAC, 30 A, 1 Phase
Component wiring: Centralized power distribution panel
EMO Protection
Safety interlocks
Power supply: 208 VAC, 3 Phase, 60 A.
KJL KURT J. LESKER PVD 75是物理氣相沈積（PVD）產物家族中的濺射設備。PVD 75提供多種沈積、蝕刻和氧化應用。它設計用於處理直徑不超過12英寸的大型基板。濺射系統的模塊化設計使其能夠輕松、經濟高效地適應應用。KURT J. LESKER PVD 75具有七度統一傾斜角,為高性能應用提供了靈活性。KJL的Esactron等離子體清洗技術的使用確保了晶圓和基板的精確處理，從而產生高產率。該裝置的自動化過程控制機器可實現快速和可重復的生產過程。PVD 75還包括用於均勻性控制的高精度熱成像工具。熱成像資產能夠對沈積過程進行表征和優化。該模型還提供了一個可選的可變壓力特征，可以更好地控制沈積過程。KURT J. LESKER PVD 75具有堅固的真空室、真空泵和排氣設備，均針對過程重復性進行了優化。真空室采用鈦鋁陶瓷復合結構，最大程度地提高了性能和可靠性。該系統還包括一個真空氣體排氣適配器，允許手動排氣的腔室。PVD 75專為在1,000類潔凈室環境中運行而設計。該單元包括一系列用戶友好的功能，包括觸摸屏操作員界面、直觀的用戶菜單和流程配方選擇。該機還兼容了一系列TCP/IP聯網協議，允許多個KURT J. LESKER PVD 75單元的遠程操作。總體而言，KJL PVD 75是一種先進的濺射工具，旨在滿足最苛刻的沈積和蝕刻應用的需求。資產的模塊化設計提供了靈活性和成本效益,而其自動化的過程控制模型則確保了精確和可重復的生產過程。該設備還提供堅固的真空室、泵和排氣系統，以及一系列用戶友好的功能，便於操作和控制。
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