二手 MRC / TEL / TOKYO ELECTRON Eclipse Mark IV #9288402 待售
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ID: 9288402
晶圓大小: 4"-6"
PVD System, 4"-6"
Controller upgraded
Power supply: 10 kW
(3) PVD chambers
(1) Etch chamber
Ultra high vacuum system
Atmospheric wafer handler
Electronics and control system
Wafer standard: SEMI
Wafer handling: Standard wafer handling of fragile wafers
Chamber 1:
ICP
Power supply: RF Generator
Ar Entry: Door injection
Shield type: (2) Shields
Shield treatment: Stainless steel
Backplane: Non-contact single zone
Chamber 2:
Titanium Nitride (Ti/TiN)
Process kit type: TiN (RMX-10)
Target type: Solder Bnd
Cathode type: RMX-10
Power supply: 10 kW
Tap setting: 3
T/S Spacing, 2.5"
Ar Entry: Door injection
Regas type: N2/1000 sccm
Shield type: (2) Shields
Shield treatment: SS Plasma spray
Darkspace: 0.062"
Backplane: Non-contact single zone
Chamber 3:
Aluminium (AlCu)
Process kit type: Al (SPA-10)
Target type: Single piece
Cathode type: SPA-10
Power supply: 20 kW
Tap setting: 2
T/S Spacing, 2.0"
Ar Entry: Door injection
Shield type: (2) Shields
Shield treatment: Stainless steel
Darkspace: 0.062"
Backplane: Non-contact single zone
Chamber 4:
Molybdenum (Mo)
Process kit type: Mo (RMX-10)
Target type: Solder bond
Cathode type: RMX-10
Power supply: 10 kW
Tap setting: 2
T/S Spacing, 2.5"
Ar Entry: Door injection
Shield type: (2) Shield s
Shield treatment: SS Plasma spray
Darkspace: 0.062"
Backplane: Non-contact single zone
Standard chamber configuration:
8F Cryo pump
MKS Mass flow controllers
RGA Valve set: V4 Conflat
(3) Position gate valves
Non-contact backplane heaters
Frontplane: S/F Vent
Pod shields
Mainframe options:
Wafer holders with ceramic latches
Edge exclusion: 1.5 mm
Laminar blowers
Filters
SECS/GEM Communication
Wafer mapping control
Clamp rings:
Full face
Stainless steel
Facilities options:
Line frequency: 208 V
Line voltage: 60 Hz
Power rack cable length: 30 ft
Cryo compressor lines: 30 ft
Bottom feed utility lines
Other options:
Manuals
OEM Controller
Alignment tools
System shields: ICP, Ti, AICu, Mo
(5) Clamp ring wafer holder assemblies
Bell jar assemble.
MRC/TEL/TOKYO ELECTRON Eclipse Mark IV是一種用於材料科學的全自動濺射設備。設計用於薄膜沈積、表面改性和納米結構制造等原位應用。該系統配備了先進的濺射槍，可以精確控制薄膜的沈積速率、輪廓和厚度。它還能夠有多個加工截面，允許不同材料在基板的不同區域平行沈積。MRC Eclipse Mark IV利用大功率RF/DC電源，頻率範圍為0至13.56 MHz。該裝置的可用功率範圍為1至1,500 W。多個濺射區允許沈積在基板的不同部分，每個區域的通量不同。濺射槍利用圓柱形磁控管源，並配有防撞罩，防止離子在源周圍堆積。負載鎖定單元用於基板傳輸，可快速處理大型基板。該機采用精密可編程邏輯控制器（PLC）進行編程，以控制濺射槍的運動和操作。PLC可以編程為優化過程控制，為用戶提供了一個快速獲取所需薄膜特性的高效平臺。此外，該工具還具有一個帶粗加工的真空室和一個渦輪分子泵，可實現超高真空和易於操作。TEL Eclipse Mark IV也擁有先進的硬件和先進的監控系統。這些系統能夠實時監測沈積過程的壓力、溫度和功率。這允許精確控制沈積參數，以提供可重復的過程和可靠的薄膜。該資產還具有觸摸屏用戶界面,可直觀操作和控制模型。總體而言，Eclipse Mark IV是一種最先進的濺射設備，專為各種薄膜沈積應用而設計。它擁有高度精確的運動控制系統、先進的監控系統和人性化的界面，非常適合薄膜材料的研發。
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