二手 PERKIN ELMER 4400 #9201790 待售
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ID: 9201790
晶圓大小: 6"
Sputtering system, 6"
Wafer loading: Manual
With load lock
Cathodes: Circle shape, 8″ & 4 max
Sputter methods: RF / DC
Diode / MAGNETRON
Gas lines: 1~3 MFC
Options:
Gas lines with MFC
N2
O2
Customized
Lamp tower alarm with buzzer:
Mechanical pump / Dry pump for process chamber and load lock
Independent mechanical pump / Dry pump for process chamber
Chiller for cooling plates and table
Turbo pump for load lock
Load lock lamp heating function: Up to 200°C
Chamber lamp heating function: Up to 300°C
Plasma etch function
Bias function
Co sputter function
Reactive sputter function
Main frame
28" Diameter SST chamber top plate with ports and cathodes:
Configuration 4400 4410 / 4450
Cathode shape Circle Delta
Cathode size 8" Delta
Cathode quantity 1 to 4 1 to 3
Sputter power supply:
4400 4410 / 4450
DC Power 5 kW 5 kW / 10 kW
RF Power 1kW / 2kW 2 kW / 3 kW
Pulse DC Power 5 kW 5 kW / 10 kW
Process chamber:
8" Diameter x 12" High stainless steel cylinder with 6"
CF Flange view port and load lock port
28" Diameter stainless steel base plate
11/2" Air operated roughing isolation valve
Air operated gas inlet valve
Air operated vent valve
11/2" Blanked-off leak check port
Removable deposition shields
23" Diameter, 3-position water cooled annular substrate
Table with variable speed motorized table drive
Full circle shutter and vane shutter
Chain drive pallet carrier transport
Heavy duty electric hoist
Load lock:
30" x 28" x 8" Stainless steel load lock chamber
Aluminum cover
Chain drive pallet carrier transport
2" Air operated roughing isolation valve
Air operated vent valve
23" Diameter molybdenum annular substrate pallet
Elevator for pallet up and down function
Vacuum systems for process chamber:
(2) Stage cryo pumps
With 1000 l/s pumping speed for air
Includes:
Chevron
Water cooled compressor and lines
Automatic regeneration controller
Plumbing kit, 71/2"
Aluminum air operated gate valve: 6" ASA
Air operated venetian blind throttling valve
Mechanical pump or dry pump for process: 36.7 Cfm
Chamber and load lock
Replaced obsolete controls:
Auto pump down controller
Load lock controller
Digital clock timer
Table raise / Lower control
Throttle valve control system
Pressure control system
Sputter head controls
Gas line with MFC
Ar, 200 SCCM, customized
Power box: AC 380 V / 208 V / 3 Phase.
PERKIN ELMER 4400是一種最先進的濺射設備,已成為薄膜真空沈積的通用通用工具。這個濺射工具是一個多源系統,允許濺射任何金屬或介電材料在其三室設計與其定制的端部安裝晶片支架。4400可實現精密沈積厚度降至1埃,薄膜均勻性降至1納米。通過獲得專利的銅目標保護方法實現了這種精確測量,該方法還確保了工藝的可重復性以及較長的周期生產時間。采用TRIO-MIM^TM密封磁控管技術,保證薄膜材料沈積過程中腔室不受汙染。TRIO-MIM^TM密封磁控管技術加熱濺射目標,從而打開了改變工藝參數的額外潛力。這允許高密度、高導電性薄膜以及更復雜的有機材料在沈積過程中需要更高的底物溫度的性能。PERKIN ELMER 4400是一種可靠且易於操作的設備。這種濺射設備在晶片支架的尺寸方面提供了靈活性,並且能夠通過實時軟件控制來調整濺射參數,從而提高工藝精度。使用內置的自動校準功能可以方便地進行機器校準。對於生產環境中的UL認證操作,它也是一個足夠強大的工具。除了其一般的沈積應用外,在創建高級設備組件時還經常使用4400。它對基板進行機械拋光,以確保表面光滑,而濺射過程在設備上產生微觀的微觀特征。PERKIN ELMER 4400是一種可靠、高效的濺射資產,可提供局部和全室濺射濺射,並提供可選的原位沈積和退火。該模型的特點允許生產質量最高的薄膜,同時控制生產成本。
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