二手 PERKIN ELMER 4450 #9199550 待售

製造商
PERKIN ELMER
模型
4450
ID: 9199550
晶圓大小: 8"
Sputtering system, 8" Wafer loading: Manual with load lock Cathode: (3) Delta shapes (4) Circle shapes Sputter method: RF/DC Diode / MAGNETRON Process chamber: 8" Diameter x 12" High stainless steel cylinder with 6" CF Flange view port and load lock port 28" Diameter stainless steel base plate 11/2" Air operated roughing isolation valve Air operated gas inlet valve Air operated vent valve 11/2" Blanked-off leak check port Removable deposition shields 23" Diameter, 3-position water cooled annular substrate Table with variable speed motorized table drive Full circle shutter and vane shutter Chain drive pallet carrier transport Heavy duty electric hoist Load lock: 30" x 28" x 8" Stainless steel load lock chamber Aluminum cover Chain drive pallet carrier transport 2" Air operated roughing isolation valve Air operated vent valve 23" Diameter molybdenum annular substrate pallet Elevator for pallet up and down function Vacuum systems for process chamber: (2) Stage cryo pumps With 1000 l/s pumping speed for air Includes: Chevron Water cooled compressor and lines Automatic regeneration controller Plumbing kit, 71/2" Aluminum air operated gate valve: 6" ASA Air operated venetian blind throttling valve Mechanical pump or dry pump for process: 36.7 Cfm Chamber and load lock Gas line with MFC N2 O2 SCCM Customized System PC control Options: Gas lines with MFC N2 O2 Customized Lamp tower alarm with buzzer: Mechanical pump / Dry pump for process chamber and load lock Independent mechanical pump / Dry pump for process chamber Chiller for cooling plates and table Turbo pump for load lock Load lock lamp heating function: Up to 200°C Chamber lamp heating function: Up to 300°C Plasma etch function Bias function Co sputter function Reactive sputter function Materials: AI+W InSnO AI2O3 Ag_ Au C Cr Cr/Co Cr/Au Cr+Cu Cr/Si Cr/SiO Cr/Si02 Si02 Mo MoSi2 Mo2Si5 Mc>5Si3 Ni Ni/Cr Ni+Ni/Cr Ni/Fe Pt Ti02 SiC Ti/W Si02+02 Si+N2(Si3N4) Si+N2+B4C Ta TaC Ta+Au TaSi2 Ta+Si02 Zr Ti02+Cr Ti+Au Ti+Au+Ni Ni/Fe+Cu+Si02 Ti/W+Au Ti/W+Au+Ta Ti/W+AI/Si Ti/W+Ni/Cr+Au Ti/W+Pt Al+Ti/W+Ag W+AI2O3 Zn Zri02 Basic configuration Main frame 28" Diameter SST chamber top plate with ports and cathodes: Configuration 4400 4410 / 4450 Cathode shape Circle Delta Cathode size 8" Delta Cathode quantity 1 to 4 1 to 3 Sputter power supply: 4400 4410 / 4450 DC Power 5 kW 5 kW / 10 kW RF Power 1kW / 2kW 2 KW / 3 kW Pulse DC Power 5 kW 5 KW / 10 kW Power distribution box: AC380 V / 208 V / 3 Phase.
PERKIN ELMER 4450是一種高性能濺射設備,設計用於將薄層材料沈積到各種基板上。它利用磁控管或離子轟擊沈積技術,制造出金屬薄膜、氧化物和其他各種材料的超光滑層。該系統包括兩個3英寸直流濺射電極和一個非常適合低溫濺射操作的大型真空室。4450的高性能磁控管濺射工藝采用高效和高度可靠的冷卻裝置,以確保最大性能和運行壽命。通過在高壓條件下使用氙氣或氮氣,機器能夠以最佳的沈積速率創造出優越的薄膜性能。該工具還配備了先進的珠子清洗技術,以提高資產部件的使用壽命。該模型需要最少的維護,並提供卓越的真空泵.其低工作溫度有助於最小化基板加熱,提高覆蓋層質量。該設備還包括一個高精度電容厚度監測儀和一個脈沖調節監測儀,以確保優秀的層沈積。這款顯示器還允許不同的濺射電流,為用戶提供對塗層工藝的理想水平的控制。系統易於使用的界面使用戶能夠在不同的濺射參數和目標材料之間快速、輕松地進行更改。其低噪聲操作使得長時間使用安全可靠。它設計小巧輕巧,便於存儲和運輸到不同的工作站。PERKIN ELMER 4450是實驗室和工業濺射工藝的理想選擇。其先進的特性和易於使用的界面,使其成為那些尋求優越層沈積和優越性能的人的理想選擇。其先進的冷卻系統和低電流儀器使其在低溫濺射操作中具有很高的可靠性和效率。
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