二手 PERKIN ELMER 4450 #9199550 待售
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ID: 9199550
晶圓大小: 8"
Sputtering system, 8"
Wafer loading: Manual with load lock
Cathode:
(3) Delta shapes
(4) Circle shapes
Sputter method:
RF/DC
Diode / MAGNETRON
Process chamber:
8" Diameter x 12" High stainless steel cylinder with 6"
CF Flange view port and load lock port
28" Diameter stainless steel base plate
11/2" Air operated roughing isolation valve
Air operated gas inlet valve
Air operated vent valve
11/2" Blanked-off leak check port
Removable deposition shields
23" Diameter, 3-position water cooled annular substrate
Table with variable speed motorized table drive
Full circle shutter and vane shutter
Chain drive pallet carrier transport
Heavy duty electric hoist
Load lock:
30" x 28" x 8" Stainless steel load lock chamber
Aluminum cover
Chain drive pallet carrier transport
2" Air operated roughing isolation valve
Air operated vent valve
23" Diameter molybdenum annular substrate pallet
Elevator for pallet up and down function
Vacuum systems for process chamber:
(2) Stage cryo pumps
With 1000 l/s pumping speed for air
Includes:
Chevron
Water cooled compressor and lines
Automatic regeneration controller
Plumbing kit, 71/2"
Aluminum air operated gate valve: 6" ASA
Air operated venetian blind throttling valve
Mechanical pump or dry pump for process: 36.7 Cfm
Chamber and load lock
Gas line with MFC
N2
O2
SCCM
Customized
System PC control
Options:
Gas lines with MFC
N2
O2
Customized
Lamp tower alarm with buzzer:
Mechanical pump / Dry pump for process chamber and load lock
Independent mechanical pump / Dry pump for process chamber
Chiller for cooling plates and table
Turbo pump for load lock
Load lock lamp heating function: Up to 200°C
Chamber lamp heating function: Up to 300°C
Plasma etch function
Bias function
Co sputter function
Reactive sputter function
Materials:
AI+W
InSnO
AI2O3
Ag_
Au
C
Cr
Cr/Co
Cr/Au
Cr+Cu
Cr/Si
Cr/SiO
Cr/Si02
Si02
Mo
MoSi2
Mo2Si5
Mc>5Si3
Ni
Ni/Cr
Ni+Ni/Cr
Ni/Fe
Pt
Ti02
SiC
Ti/W
Si02+02
Si+N2(Si3N4)
Si+N2+B4C
Ta
TaC
Ta+Au
TaSi2
Ta+Si02
Zr
Ti02+Cr
Ti+Au
Ti+Au+Ni
Ni/Fe+Cu+Si02
Ti/W+Au
Ti/W+Au+Ta
Ti/W+AI/Si
Ti/W+Ni/Cr+Au
Ti/W+Pt
Al+Ti/W+Ag
W+AI2O3
Zn
Zri02
Basic configuration
Main frame
28" Diameter SST chamber top plate with ports and cathodes:
Configuration 4400 4410 / 4450
Cathode shape Circle Delta
Cathode size 8" Delta
Cathode quantity 1 to 4 1 to 3
Sputter power supply:
4400 4410 / 4450
DC Power 5 kW 5 kW / 10 kW
RF Power 1kW / 2kW 2 KW / 3 kW
Pulse DC Power 5 kW 5 KW / 10 kW
Power distribution box: AC380 V / 208 V / 3 Phase.
PERKIN ELMER 4450是一種高性能濺射設備,設計用於將薄層材料沈積到各種基板上。它利用磁控管或離子轟擊沈積技術,制造出金屬薄膜、氧化物和其他各種材料的超光滑層。該系統包括兩個3英寸直流濺射電極和一個非常適合低溫濺射操作的大型真空室。4450的高性能磁控管濺射工藝采用高效和高度可靠的冷卻裝置,以確保最大性能和運行壽命。通過在高壓條件下使用氙氣或氮氣,機器能夠以最佳的沈積速率創造出優越的薄膜性能。該工具還配備了先進的珠子清洗技術,以提高資產部件的使用壽命。該模型需要最少的維護,並提供卓越的真空泵.其低工作溫度有助於最小化基板加熱,提高覆蓋層質量。該設備還包括一個高精度電容厚度監測儀和一個脈沖調節監測儀,以確保優秀的層沈積。這款顯示器還允許不同的濺射電流,為用戶提供對塗層工藝的理想水平的控制。系統易於使用的界面使用戶能夠在不同的濺射參數和目標材料之間快速、輕松地進行更改。其低噪聲操作使得長時間使用安全可靠。它設計小巧輕巧,便於存儲和運輸到不同的工作站。PERKIN ELMER 4450是實驗室和工業濺射工藝的理想選擇。其先進的特性和易於使用的界面,使其成為那些尋求優越層沈積和優越性能的人的理想選擇。其先進的冷卻系統和低電流儀器使其在低溫濺射操作中具有很高的可靠性和效率。
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