二手 AMAT / APPLIED MATERIALS Mirra Mesa #9222045 待售

CMP System, 8" Technology: CMP STI Wafer shape: Flat Application information: Application: Oxide System: Dry in / Dry out Device type: D-RAM Device geometry: 0.13 Microns Consumed process materials: Polish slurry: STI Platen 1 pad: IC1010 Platen 2 pad: IC1010 Platen 3 pad: IC1010 Pad conditioner: Diaphraghm Pad conditioner head: DDF3 Pad conditioner holder: Standard Factory interface options: Cleaner type: MESA (Converted from reflexion) Megasonics Robot type: AMAT In situ removal rate monitor: Digital SECS GEM Interface Cassette tank Open cassette Integrated system basic: Fabs 212 Platen and head options: Polishing head: (4) TITAN I Heads (4) Retaining rings Pad wafer loss sensor Slurry delivery options: Slurry delivery: (2) Slurries by peristalic pump Slurry flow rate: STD Flow Slurry flow monitor Slurry containment bulkhead Slurry loop line: No Slurry dispense arm: Extendad rinse arm Slurry leak detector: No DI Water High pressure rinse Umbilicals: Polisher to controller cable: 30 Ft Controller to monitor cable: 30 Ft Factory hookup: Upper exhaust: Standard Upper exhaust connection: 8" Drain manifold: 4 Line to Fac Drain adapter: NPT Fitting Castors for mirra system: No Weight distribution plate (Skid pad) User interface: Stainless cart PC Mouse Hard disk backup: No Polisher / Fabs light tower: Tower mounting type: (4) Lights Tower colors sequence: RYGB (4) Tower colors Cleaner option: Mesa cleaner Maintenance options: Spray gun: Single Lapping stone: No Special options: Nylon brush: No E-Chain teflon sheet: Water fall Low pressure release water: No Mesa: Direct checm type: Megasonic module Brush 1 Brush 2 Standard: SRD Output station Electrical requirements: Line voltage: 200~230V Line frequency: 50/60 Hz Delta connection Power lamp: Green Power connected lamp: No Circuit breaker: 200A AC Outlet box: 100V Configurable I/O: No Wide type GFI: 50mA 1997 vintage.