二手 AMAT / APPLIED MATERIALS Mirra Mesa #9254128 待售
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ID: 9254128
晶圓大小: 8"
優質的: 2003
CMP System, 8"
Technology: CMP Oxide
Wafer shape: Flat / Notch
Consumed process materials:
Polish slurry
Platen 1 pad: IC1010
Platen 2 pad: IC1010
Platen 3 pad: IC1010
Pad conditioner: Diaphragm
Pad conditioner head: DDF3
Pad conditioner holder
Factory interface options:
Cleaner type: MESA (Converted from reflexion)
Megasonics
Robot type: AMAT / APPLIED MATERIALS
In-situ removal rate monitor: Full scan
SECS GEM Interface
Cassette tank
Cassette type: SMIF
Open cassette
Integrated system basic: FABS 212
FABS Robot blade: Ceramic
Cassette type: 25 Slots teflon PFA
Platen and head options:
Polishing head: (4) TITAN I Heads
(4) Retaining rings
Pad wafer loss sensor
Slurry delivery options:
Slurry delivery: Peristaltic pump
Slurry flow rate
Slurry flow monitor
Slurry loop line
Slurry loop line A
Slurry loop line B
Slurry dispense arm
DI Water
High pressure rinse
Safety equipment:
Red turn to release EMO button
EMO Guard ring
Smoke detector
Polisher slurry leak sensor
Mesa brush leak sensor
Umbilicals:
Polisher to controller cable: 50 Ft
Controller to monitor cable: 50 Ft
Factory hookup:
Upper exhaust
Upper exhaust material: SS
Exhaust vent interlock: Upper and lower
Upper exhaust connection: 8"
Drain manifold:(4) Lines to FAC
Drain adapter: NPT Fitting
DIW Inlet assy: W/O CDA Regulator
User interface:
Monitor selection: LCD Monitor
Monitor 1 location: LCD Monitor on cart
Class 1 cart for monitor 1
Mouse
Start stop button: Controller
Light tower selection: Controller and FABs
Polisher light tower:
Controller tower mounting type: Horizon flush mounted
Controller tower
Controller tower lamp type: Incandescent
Light tower:
Tower mounting type: Pole mounted
Tower lamp type: Incandescent
Tower colors sequence
Cleaner options:
Mesa cleaner
Walking beam assemble
Megasonic module: Delivery tank
Megasonic delivery type: Pressurized
Chemical A
Chemical B
Scrubber module:
Scrubber delivery type: Direct feed
Brush chemical
Scrubber 1 delivery type: Direct feed
Brush 2 chemical
Brush 1, 2 spray bar
SRD Module:
SRD Shield
SRD Exhaust and drain lines: Single
Upper electronic box: UEB
Signal tower
Pad conditioner head: DDF3
Pad con disk holder
Polishing head: TITAN 1 Head
Upper Pneumatic assy: UPA
Slurry delivery: (2) Slurry line for each platens (6 Slurry line)
Endpoint system full scan ISRM (P1, P2)
No slurry containment bulkhead
No slurry loop line C
No Uninterruptible Power Supply (UPS)
No delta connection
No power connected lamp
No AC outlet box
No isolation transformer for Mesa
No elbow fitting for drain pan
No castors
No weight distribution plate
No internal vacuum ventury
No SRD heater lamp
Power requirements:
Line voltage: 200~230 V
Line frequency: 50/60 Hz
Delta connection
Power lamp
Circuit breaker: 200 A
Configurable IO: 10 Channels
GFI Type: 30 mA
2003 vintage.
AMAT/APPLIED MATERIALS/AKT Mirra Mesa是一種高精密的計算機控制晶圓研磨、研磨和拋光設備。它設計用於半導體工業中,用於復雜晶片的精確研磨、研磨和拋光。該系統利用精確的運動控制和先進的功能集來實現異常精確的幾何形狀,特別是針對半導體市場。該單元包括一個可編程的旋轉壓板,它允許精確的極性和方位角控制旋轉運動。此運動與刷牙、研磨和拋光技術結合使用,以產生精確的表面幾何形狀。運動通過一系列旋轉編碼器進行控制和監控,提供精確和可重復的性能。該機還配備了先進的加熱和冷卻工具,旨在確保所執行的過程的最佳溫度範圍,幫助減少零件的磨損。該資產經過精心設計,可在非常嚴格的公差(>0.02 μ m)下執行研磨、研磨和拋光應用。模型中的所有零件和材料,包括鋁制底板、軸承托架和軸,都是按照嚴格的公差和規格設計和制造的。該設備經NSF批準並設計為符合所有適用的HEPA過濾器標準。此外,AKT Mirra Mesa還提供高級軟件控制,允許精確和可重復的操作。該系統支持板載計算機和板載計算機,用於操作、監視和診斷。它還包括一系列模具選項,允許廣泛的應用程序。總體而言,AMAT Mirra Mesa是一個前沿設備,旨在提供精確和可重復的研磨、研磨和拋光應用,特別是在半導體行業。它的高級功能集產生了一流的質量結果,肯定超出了客戶的期望。
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