二手 AMAT / APPLIED MATERIALS Mirra Mesa #9254128 待售

ID: 9254128
晶圓大小: 8"
優質的: 2003
CMP System, 8" Technology: CMP Oxide Wafer shape: Flat / Notch Consumed process materials: Polish slurry Platen 1 pad: IC1010 Platen 2 pad: IC1010 Platen 3 pad: IC1010 Pad conditioner: Diaphragm Pad conditioner head: DDF3 Pad conditioner holder Factory interface options: Cleaner type: MESA (Converted from reflexion) Megasonics Robot type: AMAT / APPLIED MATERIALS In-situ removal rate monitor: Full scan SECS GEM Interface Cassette tank Cassette type: SMIF Open cassette Integrated system basic: FABS 212 FABS Robot blade: Ceramic Cassette type: 25 Slots teflon PFA Platen and head options: Polishing head: (4) TITAN I Heads (4) Retaining rings Pad wafer loss sensor Slurry delivery options: Slurry delivery: Peristaltic pump Slurry flow rate Slurry flow monitor Slurry loop line Slurry loop line A Slurry loop line B Slurry dispense arm DI Water High pressure rinse Safety equipment: Red turn to release EMO button EMO Guard ring Smoke detector Polisher slurry leak sensor Mesa brush leak sensor Umbilicals: Polisher to controller cable: 50 Ft Controller to monitor cable: 50 Ft Factory hookup: Upper exhaust Upper exhaust material: SS Exhaust vent interlock: Upper and lower Upper exhaust connection: 8" Drain manifold:(4) Lines to FAC Drain adapter: NPT Fitting DIW Inlet assy: W/O CDA Regulator User interface: Monitor selection: LCD Monitor Monitor 1 location: LCD Monitor on cart Class 1 cart for monitor 1 Mouse Start stop button: Controller Light tower selection: Controller and FABs Polisher light tower: Controller tower mounting type: Horizon flush mounted Controller tower Controller tower lamp type: Incandescent Light tower: Tower mounting type: Pole mounted Tower lamp type: Incandescent Tower colors sequence Cleaner options: Mesa cleaner Walking beam assemble Megasonic module: Delivery tank Megasonic delivery type: Pressurized Chemical A Chemical B Scrubber module: Scrubber delivery type: Direct feed Brush chemical Scrubber 1 delivery type: Direct feed Brush 2 chemical Brush 1, 2 spray bar SRD Module: SRD Shield SRD Exhaust and drain lines: Single Upper electronic box: UEB Signal tower Pad conditioner head: DDF3 Pad con disk holder Polishing head: TITAN 1 Head Upper Pneumatic assy: UPA Slurry delivery: (2) Slurry line for each platens (6 Slurry line) Endpoint system full scan ISRM (P1, P2) No slurry containment bulkhead No slurry loop line C No Uninterruptible Power Supply (UPS) No delta connection No power connected lamp No AC outlet box No isolation transformer for Mesa No elbow fitting for drain pan No castors No weight distribution plate No internal vacuum ventury No SRD heater lamp Power requirements: Line voltage: 200~230 V Line frequency: 50/60 Hz Delta connection Power lamp Circuit breaker: 200 A Configurable IO: 10 Channels GFI Type: 30 mA 2003 vintage.
AMAT/APPLIED MATERIALS/AKT Mirra Mesa是一種高精密的計算機控制晶圓研磨、研磨和拋光設備。它設計用於半導體工業中,用於復雜晶片的精確研磨、研磨和拋光。該系統利用精確的運動控制和先進的功能集來實現異常精確的幾何形狀,特別是針對半導體市場。該單元包括一個可編程的旋轉壓板,它允許精確的極性和方位角控制旋轉運動。此運動與刷牙、研磨和拋光技術結合使用,以產生精確的表面幾何形狀。運動通過一系列旋轉編碼器進行控制和監控,提供精確和可重復的性能。該機還配備了先進的加熱和冷卻工具,旨在確保所執行的過程的最佳溫度範圍,幫助減少零件的磨損。該資產經過精心設計,可在非常嚴格的公差(>0.02 μ m)下執行研磨、研磨和拋光應用。模型中的所有零件和材料,包括鋁制底板、軸承托架和軸,都是按照嚴格的公差和規格設計和制造的。該設備經NSF批準並設計為符合所有適用的HEPA過濾器標準。此外,AKT Mirra Mesa還提供高級軟件控制,允許精確和可重復的操作。該系統支持板載計算機和板載計算機,用於操作、監視和診斷。它還包括一系列模具選項,允許廣泛的應用程序。總體而言,AMAT Mirra Mesa是一個前沿設備,旨在提供精確和可重復的研磨、研磨和拋光應用,特別是在半導體行業。它的高級功能集產生了一流的質量結果,肯定超出了客戶的期望。
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