二手 AMAT / APPLIED MATERIALS Mirra Ontrak #114141 待售

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AMAT / APPLIED MATERIALS Mirra Ontrak
已售出
ID: 114141
晶圓大小: 8"
優質的: 1999
CMP system, 8" flat Components: Main polisher module: Mirra 3400 Post cleaner module: Ontrack Base box: cassette tub and box Polisher cable cover CMP 5201 controller Operator desk: (2) Monitors: FR 770, TW-LM-004 (2) Extensions MPB700 (2) Multi power Loader (2) Cable boxes Controller monitor desk Specifications: Wafer size: 8" Wafer shape: flat Application: Oxide System: dry in / dry out Process type: all Device type: D-RAM Device geometry: 0.09 microns Consumed process material: Polish slurry: STI Buff slurry: none Platen 1 pad: IC1010 Platen 2 pad: IC1010 Platen 3 pad: IC1010 Pad conditioner: snap on type Pad conditioner head: modified DDF3 head Pad conditioner holder: magnetic snap on / SAESOL Factory interface options: Cleaner type: Ontrack Megasonics: no Robot type: Ontrack side type In situ removal rate monitor: digital Inline metrology: none SECS / GEM interface: yes, high-speed massage storage available Cassette tank: yes Cassette type: none Installation type: through-the-wall Integrated system basic FABS: FABS 212 Platen and head options: Polishing head: (4) Titan I heads Retaining rings: 4 Pad wafer loss sensor: yes Platen temperature control: none Slurry delivery options: Slurry delivery: (3) slurries Slurry flow rate: standard flow Slurry flow monitor: yes Slurry containment bulkhead: single containment Slurry facilities: none Slurry loop line: no Slurry dispense arm: extended rinse arm Slurry leak detector: no DI water: yes High pressure rinse: yes System software: Mirra type: Mirra Ontrack Mirra software: N/A Cleaner type: Ontrack Cleaner software: N/A Fabs type: standard Fabs software: N/A System safety equipment: Red turn-to-release EMO button: standard EMO guard ring: yes Earthquake brackets: none LO to disconnect polisher: N/A Smoke detector: yes Electrical requirements: Line frequency: 50/60Hz Line voltage: 200~230V UPS battery: yes Delta connection: yes Power lamp: green Power connected lamp: no Circuit breaker: 230A AC outlet box: 100V Configurable I/O: no Wide type GFI: 50mA Umbilicals: Polisher to controller cable: 75' Controller to monitor cable: 75' Slurry system interface cable: none Factory hookup: Upper exhaust: standard Lower exhaust: none Upper exhaust connection: 8" Drain manifold: 4-line to facilities Drain adapter: NPT fitting Castors for Mirra system: no Weight distribution plate (skid pad): yes User interface: Gray area: (1) monitor Cleanroom: (1) monitor Class 1 cart for 1 monitor: 1 Class 1 cart for 2 monitors: 0 Class 100 cart for 2 monitors: 0 Stainless carts: 1 PC mouse Printer: none Hard disk backup: no Polisher / Fabs light tower: Polisher tower mounting type: (4) lights Polisher tower number of colors: (4) colors Polisher tower colors sequence: RYGB Cleaner options: OnTrak cleaner: N/A DNS cleaner: N/A Mesa cleaner: yes Manuals: CD ROM: none Standard paper manuals: none Cleanroom paper manuals: none Maintenance options: Spray gun: single Side panel window: none Pad conditioner cover: none Titan head rebuild kit: none Consumables kit: none Calibration box: none Calibration box cable: none English standard unit tool kit: none Slurry flow calibration kit: none Lapping stone: no Robot door lock: N/A Special options: Nylon brush: no EChain Teflon sheet: no Low pressure release water: no Spares: Additional heads: 4 Warehoused 1999 vintage.
AMAT/APPLIED MATERIALS Mirra Ontrak是一種晶圓研磨、研磨和拋光設備,經過技術改造,可實現半導體制造過程的自動化。它為半導體工業生產矽晶片提供高精度、微精度的研磨和拋光,提供晶片變薄、邊緣剖面、缺陷去除和表面整理。這臺機器旨在實現經濟高效和一致的精密操作。它具有全自動操作,設計速度極快、高效且準確。它具有高分辨率、反饋控制的研磨系統,允許用戶精確調節進料速率和速度。磨削單元具有靈活的設定點,使用戶能夠設置廣泛的磨削參數,如表面粗糙度、磨削深度和精加工質量。該機器還有一個自動晶圓清洗工具,提供多種清洗選項和基於變分器的研磨和蝕刻資產。此模型可實現高效和經濟高效的生產,提供一致的質量和可重復性。AMAT Mirra Ontrak還配備了多項高級功能和配件,如數字壓力控制器和觸摸儀用戶界面。壓力控制器的工作原理是確保研磨力保持在允許精確、安全和有效的研磨操作的範圍內。觸摸圖用戶界面旨在提供易於理解的研磨和拋光過程概述,為用戶從頭到尾提供整個過程的全面視圖。該設備還得到AMAT全球服務和支持網絡的支持,提供必要的支持,以保持生產過程的平穩和高效運行。此外,該系統提供了廣泛的定制選項,允許用戶根據自己的具體需求和要求對設備進行定制。總體而言,APPLIED MATERIALS Mirra Ontrak為生產半導體晶片提供高效、經濟高效的研磨和拋光服務。憑借其自動化的操作和先進的功能,這臺機器旨在為用戶提供可重復的結果和一致的質量。
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