二手 AMAT / APPLIED MATERIALS Reflexion LK #9116998 待售
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ID: 9116998
Copper CMP system, 12"
Base system:
Reflexion LK: 4-head, 3-platen, polishing system
Dry in, dry out
Polisher skins: Dark P1, P2, P3, P4; 4910 compliant
Gap wash: 120° nozzles
Load cup wafer exchanger: enhanced counter balance springs
Nova 3090 ready: none
Monitor 1 location: cart
Monitor 2 location: ergo arm type
Light tower: factory interface and polisher sides
Software:
LK Software: lp3B4.5_29
Factory interface: b4.9_14 Beta
ISRM / RPTC: isB3.0_10
RTPC: B3.0_11
Platen 1:
Platen type: high speed (<=350 RPM)
Endpoint: RTPC
High pressure rinse flow meter: 1350-00195 (4.6 L/min) FLOW METER ASSY 1/2OD 1.6-20LPM PFA
Rinse arms: high pressure/flow
Flow meter: 50-500 mL/min
Temperature control: platen cooling water
Platens 2,3:
Platen type: high speed (<=350 RPM)
Endpoint: full scan optical ISRM
High pressure rinse flow meter: 1350-00195 (4.6 L/min) FLOW METER ASSY 1/2OD 1.6-20LPM PFA
Rinse arms: high pressure/flow
Flow meter: 50-500 mL/min
Temperature control: platen cooling water
Polisher:
Polisher technology: slurry and pad
Polishing head: Contour Gen III (0.5 to 5.0 psi)
- (6) Zones
- Maximum pressure: RR (15 psi), Z1 (10 psi), Z2 (5 psi), Z3 (5 psi), Z4 (5 psi), Z5 (5 psi)
Cross break: N/A
Pad wafer loss sensor: dark pad sensor
Inter-platen clean: no
ISRM Laser key switch: yes
Slurry delivery system: 5 x 10 CLC SDS
Head 1 Power Cable: 0150-16277CABLE ASSY, HR1, DRIVER-MOTOR POWER, REF
Head 2 Power Cable: 0150-16278CABLE ASSY, HR2, DRIVER-MOTOR POWER, REF
Head 3 Power Cable: 0150-16279CABLE ASSY, HR3, DRIVER-MOTOR POWER, REF
Head 4 Power Cable: 0150-16280 CABLE
ASSY, HR4, DRIVER-MOTOR POWER, REF
Head 1 Encoder Cable: 0150-16281CABLE ASSY, 300MM, HR1, DRIVER-RESOLVER
Head 2 Encoder Cable: 0150-16282CABLE ASSY, 300MM, HR2, DRIVER-RESOLVER
Head 3 Encoder Cable: 0150-16283CABLE ASSY, 300MM, HR3, DRIVER-RESOLVER
Head 4 Encoder Cable: 0150-16284CABLE ASSY, 300MM, HR4, DRIVER-RESOLVER
G4+ UPA: SMC UPA
G4+ UPA: SMC UPA
Cleaner meg:
Chemical 1:CLC 1-250 ml/min
Chemical 2:CLC 1-250 ml/min
Brush box 1:
Chemical 1: 0-1250 ml/min
Chemical 2: 0-1250 ml/min
Brush box 2:
Brush LDM Type: 2-chem, inline, mixed
Chemical 1: 0-1250 ml/min
Chemical 2: 0-1250 ml/min
Dryer module:
Dryer type: vapor dryer
Recovery nodule: N/A
Output station damper: Viton cap
2010 vintage.
AMAT/APPLIED MATERIALS Reflexion LK是一種先進的晶圓研磨、研磨和拋光（G/L/P）設備,在半導體制造過程中提供卓越的控制和精度。該系統采用大型平板研磨、研磨、拋光塊集成工作站；自動單面或雙面研磨/研磨平臺；高速裝載機/卸載機；以及一整套過程和參數監控、控制和分析工具。集成驅動單元和高精度、低負載的軸承機構，可實現高水平的重復性和準確性。AMAT Reflexion LK機器結構非常堅固,性能強勁,耐用性強。該工具集成了先進的加熱器和低溫冷卻級，以提供高度可重復的熱膨脹系數，確保在多個晶片批次上保持一致的光潔度。該設備具有低噪聲、低振動等優點，對精細晶片的損傷最小。單面研磨/研磨板的總載荷容量為400公斤，在行駛過程中提供均勻、精確的性能。支持主級和第二級相結合的研磨操作,以實現所需的表面光潔度。通過高精度導軌直線運動確保其平整度,該直線運動與可調補償器一起,使底面的任何差異保持在0.002 mm/m以下。而且，APPLIED MATERIALS Reflexion LK模型帶有用戶友好的軟件界面，允許完整的過程控制。任何需要調整的參數都可以通過單擊按鈕來更改。該軟件還與現代化的可視化設備集成在一起，能夠以3D圖形顯示數據。總體而言，Reflexion LK系統是一個功能強大、可靠、用戶友好的晶圓研磨、研磨、拋光單元，提供卓越的性能和精度。對於要求在最短時間內取得優異成績的半導體制造商來說是理想之選。
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