二手 APPLIED MATERIALS Mirra Mesa #73051 待售

metal layer CMP system, copper, 8" Software license, re-installation and startup to Tier II Mirra Mesa CMP Original W system - running Cu Mesa cleaner One monitor, trackball 50 ft cables InSitu removal rate monitor (ISRM) detectors on all 3 platens 50ft ISRM cables Standard cassette tank Titan 2 heads for tungsten AEP retaining ring Pad conditioner: DDF3 - new design with clean up spray nozzle, N2 purge Extended rinse slurry dispense arm Platten Pad: Process kit with IC1000 pad Standard Platten no temperature control Wafer loss sensor with light pipe 3 slurries (AB1, AB2, AC3) 1 DIW per platten, std flow, without flow monitor One drain line to facilities - all drains manifold into one NPT drain fittings Electronic control box for slurry monitoring only Light tower: 3-color vertical, Red/Green/Yellow with flash and buzzer No key switch, compatible with all light towers and no light tower Lower exhaust for standalone system Remote start/stop button on polisher Guard ring on all EMO (CE compliant) Single spray gun No Window in side panel Tie-downs on polisher & controller feet No UPS Smoke detector in controller No pad puller, for one line to facilities option Nanometrics Universal disk holder ABT Universal disks Cass present sensor Wafer mapping Kit Cascading Ergo fabs w/o filter 2006 vintage.