二手 KLA / TENCOR Alpha Step 100 #9016122 待售
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ID: 9016122
Profilometer / Surface profiler
Scan unit:
Model number: 10-00020
Controller unit:
Model number: 10-00030
Power requirements: 117 V - 60 Hz
Features:
Automatic leveling
Measurements completed in less than 1 minute
1,000 Å full-scale
No shock isolation required
Mechanical, electronic and thermal stability
Specifications:
Measurement ranges (full-scale deflection): 1,000 å, 2,500 å, 5,000 å, 10 kå, 25 kå, 50 kå, 100 kå, 250 kå, 500 kå, 1,000 kå
Resolution: 10 å (minimum detectable step)
Auto zero: Recorder automatically starts at any preset level
Horizontal magnification / scan speed / recorder speed:
50 x / 0.1 mm/sec 5 mm/sec
500 x / 0.01 mm/sec / 5 mm/sec
2500 x / 0.01 mm/sec / 25 mm/sec
Scan length: 3 mm in either direction (6 mm total)
Stylus: diamond 12.5 µ radius standard
Tracking force: Factory-set 15-18 mg (1 mg minimum)
Sample stage dimension: 190 mm (7.5") w x 127 mm (5") deep
Sample stage movement:
X-axis: 3 mm (12")
Y-axis: 48 mm (1.9")
Z-axis: 11 mm (46") plus (vertical) stylus lift
Throat depth: 65 mm (2.54") allowing measurement anywhere on a 125-mm (5") Dia wafer
Maximum acceptable sample thickness: 11 mm (46")
Operational modes:
Automatic leveling and scan
Manual leveling and scan
Automatic leveling and manual scan
Optics: Non-inverted image, 22x magnification
Illumination: Light-emitting diodes
Chart recorder:
Type: Thermal printing
Chart speeds: 5 and 25 mm/sec
Chart size: 5 cm (2") Continuous roll
Linearity: ±1% full-scale
Max drift vs temperature: 0.5 division/10°c
Max drift vs time: 0.1 division/8 hrs
Dimensions:
Scan unit: 208 mm (8.2") w x 226 mm (8.9") h x 422 mm (16.6") d
Control unit: 216 mm (8.5") w x 125 mm (4.9") h x 394 mm (15.5") d
Weight:
Scan unit: 7.7 kg (17 lbs)
Control unit: 6.4 kg (14 lbs).
KLA/TENCOR Alpha Step 100是一種晶圓測試和計量設備,可用於納米尺度特征的無損光學測量和3D地形。該系統能夠精確測量半導體晶圓和其他基板上的器件結構、多圖案化層膜厚度和臨界尺寸。KLA Alpha Step 100以掃描隧道顯微鏡(STM)和四單元幹涉儀(QCI)為特色,精確測量多種參數。STM在真空環境中運行,允許以納米級精度對表面特征進行成像。除了晶圓表面的3D地形特征外,QCI還測量納米級薄膜厚度。該單元還擁有一個非接觸表面剖面儀,它以2.5納米圖像分辨率捕獲表面的3D圖像。除表面粗糙度等材料特性外,輪廓儀還收集地形和表面數據。TENCOR Alpha Step 100能夠檢測到甚至最微妙的缺陷,並為晶圓測量和打印檢查提供最高精度。它有一個先進的相移分析程序,可以檢測過度暴露和不足暴露的問題。機器還包括一個分析包,用於測量臨界尺寸和尋址線寬、線緣粗糙度、線寬變化以及層間叠加。Alpha Step 100可以與測量工具集成,用於其他應用程序,如過程監視和產量分析。此外,此工具可與自動轉換功能一起使用,以實現高吞吐量測試。該資產還配備了一個計算機控制的光頭,允許非接觸式多樣本對準和測量,能夠在一個通道內進行高精度測試,該模型可實現完整的3D地形成像,而無需平面或晶圓級對焦校正。這對於晶圓鑒定和監控過程從工具到工具的漂移以及整個過程運行都至關重要。此外,KLA/TENCOR Alpha Step 100具有可編程晶片級,具有多個不同配置的樣品,可優化不同模具尺寸的通量和精度,對半導體晶片測試非常有用。
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