二手 NANOMETRICS NanoSpec 9000b #9361379 待售

Thin film measurement system Polarized / Normal-incidence spectroscopic ellipsometry: Non-contact / Optical critical dimension Wavelength range: 320-780 nm DUV-Visible spectroscopic reflectometry: Single / Multi-layer film thickness measurements N&K Film optical properties and reflectance Wavelength range: 190-780 nm High throughput R/Θ/Z stage N2000 User interface compliant to SEMI (E95-0200) Measurement capabilities: N&K Film optical properties Single and multi-layer film thickness Line width / Space Sidewall angle Line height Line profile Lithography applications: Film thickness of BARC and photoresist N&K Copper CMP applications: Low K thin film thickness Barrier thickness (TaN) Block Erosion Residuals Oxide CMP applications: Very thin film thickness (<100 Å) ONO and NO Film stacks Film thickness over arrays Residuals Si Etch applications: Poly or WSi gate profiles STI Profile 2D Structures and arrays Dielectric etch applications: Nitride and oxide film thickness Low-K thickness Damascene trench profile DUV to Visible reflectometer Normal incidence spectroscopic ellipsometry with R/Θ/Z stage Operating system: Windows XP Automatic focus Optical non-contact pre-aligner (Centering and notch / Flat finder) Wafer handling: Flat chuck GEM/SECS (RS-232 or HSMS) Feed location backside Vacuum flow rate: G 533.4 mm Hg at 15 l/min Line size: 6.35 mm (0.25 in.) OD Connector type: SWAGELOK Bulkhead fitting (0.25x0.25") Electrical: 110/208 VAC, 50/60 Hz, 10 A, Single phase Power cord: Single 10 ft, 3-conductor, 14 AWG, 600 V. 2007 vintage.