二手 DNS / DAINIPPON SU-3000 #293809737 待售
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ID: 293809737
晶圓大小: 12"
優質的: 2008
Wafer cleaner, 12"
(4) Chambers
(4) Chemical cabinets: NH4OH, BHF, IPA
(2) Handling systems
Overhead transport system
Indexer unit
(4) Load ports
YASUKAWA XU-ACT153L-B01 ID/R Unit
Transfer unit
YASUKAWA XU-RC615L-A12 CR Unit
Fan Filter unit (FFU):
Type: 2T-445950GGE-SWALY
Material: Fluoridation resin filter
Capacity: 99.995 <% / 0.1 μm
Range: 0~0.4 m/sec and 0~0.6 m/sec
Process chamber: (4) MPC Chambers
Shield plate:
Shield plate IPA Dispense: IPA
Shield plate DIW Dispense: CO2 Water
Shield plate nozzle drain: CO2 Water
Shield plate nozzle drain: IPA
Scan nozzle 1:
Chemical 2 Dispense: DHF
DIW Dispense: CO2 Water
Chemical 4 Dispense: Bulk HF
Port 20 DHF reclaim line valve open: DHF
Port 21 ACID drain line valve close: Acid
Port 20 N2 Purge
Chemical 2 Nozzle drain: DHF
DIW and chemical 4 nozzle drain: CO2 Water and bulk HF
Scan nozzle 2:
DIW Dispense: CO2 Water
Nano spray: N2
Nano spray DIW Dispense: CO2 Water
Nano spray chemical 3 dispense: SC-1
Nano nozzle 2 chemical 3 dispense: SC-1
Nano spray composite: N2 and CO2 Water
Nano spray composite: N2 and SC-1
Scan nozzle 2 chemical 3 nozzle drain: SC-1
Backside nozzle:
Chemical 2 dispense: DHF
Chemical 3 dispense: SC-1
DIW Dispense: CO2 Water
Backside nozzle 5 Chemical 4 Dispense: Bulk HF
Backside umbrella nozzle dispense: CO2 Water
Backside nozzle pre dispense
Backside nozzle drain
Fixed nozzle:
Chuck rinse nozzle dispense: CO2 Water
Spin base rinse nozzle dispense: CO2 Water
Shield plate surface rinse nozzle Dispense: CO2 Water
Fixed nozzle dispense: CO2 Water
Spin base:
Material: PCTFE
Spin motor: AC Servo motor
Maximum revolution: 3000 RPM
Maximum acceleration: 1000 RPM/sec
Revolution accuracy: ±3 RPM (at 3000 RPM)
Chuck:
Chuck drive: Pulse motor
Material: PCTFE, ETFE
Wafer detection: Detection by chuck pins
Shield plate:
Material: HT-PVC
Revolution drive: AC Servo motor
Maximum revolution: 3000 RPM
Maximum acceleration: 1000 RPM/sec
Revolution accuracy: ±3 rpm (at 3000 RPM)
Up / Down shift: AC Servo motor
Minimum distance to the wafer surface: 0.3 mm
Splash guard:
Chemical collection structure
Material: PTFE
Up / Down shift: AC Servo motor
Shutter:
Drive: Air cylinder
(2) Chemical cabinets
Temperature control of low temperature
Chemical used: HF, NH4OH, IPA
Chemical mixing ratio: Premix
Range of temperature control: 20°C~35°C
Chemical filter: Chemlock housing, 0.1 μm
Circulation pump: Pillar
KOMATSU NES-2123-7 Circulator
KOMATSU GRS-612 Temperature controller
E-Flow:
Module: SD16L-24S W
HORIBA OE-960CE Resistivity meter
Resistivity sensor: ESD-001C-T
Sensor cable: CK-10M
Sensor holder: EFA-30
Relay: MY2N-CR DC24V
Fire extinguisher controller: Auto pulse 542R
2008 vintage.
DNS/DAINIPPON SU-3000濕站是一種高效可靠的濕蝕刻設備,用於工程和制造業的各種應用。它配備了脈沖式HF/HCl蝕刻室、兩個獨立的工作箱、高壓流體輸送系統以及用於改進材料裝卸的集成托盤單元。DNS SU-3000的獨特設計為用戶提供了更高的安全性,提高了蝕刻結果的質量,並顯著減少了廢料。HF/HCl蝕刻室的設計旨在提供精確的蝕刻控制水平和準確性,同時最大限度地減少操作它所需的能量。腔室內部塗有耐腐蝕的陶瓷材料,以防止侵蝕,並確保一致的蝕刻過程。浮雕表面采用水文幾何形狀和縱向拋物線建造,為用戶提供均勻的蝕刻深度和極高精度和精確度的表面光潔度。除了HF/HCl蝕刻室外,DAINIPPON SU 3000還包括兩個獨立的工作槽,每個工作槽支持不同的蝕刻工藝。因為每個罐體的設計,放置在其中的材料可以很容易地從一個移動到另一個,允許快速的方法交換和化學混合。每個罐體都配有一個蠕動泵和一臺壓力機來輸送HF/HCl溶液,最大壓力為50 bar(725 psi)。DNS SU 3000還包括一個集成的托盤工具,用於改進物料加載和處理。托盤采用人體工程學設計,便於裝卸蝕刻材料。該資產的設計目的是大大減少停機時間,並且在較短的時間內比其他濕蝕刻系統執行更多的工藝。總體而言,SU-3000濕站是一種頂級的蝕刻模型,非常適合在各種應用中使用。這些設備提高了安全性,提高了蝕刻結果的質量,並大大減少了廢料。它以嚴格的質量控制標準為後盾,在可靠性和精確度方面達到最高標準。
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