二手 TEL / TOKYO ELECTRON Alpha 303i-K #9373155 待售

ID: 9373155
晶圓大小: 12"
優質的: 2006
Vertical LPCVD furnace, 12" Process: TEOS (100) Process wafers I/O Port / SMIF: FOUP No load lock 25-Carrier slots Boat type: Single Main controller (WAVES) Operation screen: Touch screen Gas flow chart: Front and rear M560 Temperature controller Vacuum pressure control: CKD VEC Controller transformer: 208 V, Single phase Heater transformer: 208 V, 3 Phase Gases: Gas 1: N2 Gas 2: N2 Gas 3: O2 Gas 4: TEOS Gas 5: N2 Gas distribution: Basic style: Conventional Tubing material: SUS-316L Tubing finish: VCR Manual valve: CKD Air operated valve: CKD MFC: HORIBA STEC Exhaust distribution: Air operated valve type: IGS Connect Main valve: CKD VEC Cold trap No pump line Wafer / Cassette handling: (16) Cassette storage Cassette In/Out port Cassette handling robot Wafer transfer type: 1 + 4 Fork material: AL2O3 Fork variable pitch Fork wafer presence sensor Elevator handling: Boat elevator Auto shutter Boat rotation Mechanical parts Heating chamber: Heater type: VMM-56-002, 100 wfs (5) T/C Type (5) Spike T/C Furnace cabinets includes clean air flow system Scavenger and water cooling unit Power supply unit (U/P Box): Control unit Transformers SCR Breaker unit FOUP and wafer handling automation: (2) FOUP Load ports FOUP Transfer Stocker: (18) FOUPs FIMS Port KHI Wafer load automation Variable pitch change mechanism with (5) forks Auto tube shutter Boat elevator with boat rotation mechanism Integrated gas system in gas cabinet and TEOS LSC baking system: O2 Gas line TEOS Gas line Purge N2 Vacuum vent Exhaust vent Piping tape heater Main valve type: CKD Hot, P/N: VEC-VH8G-X0101 Vacuum gage Pressure switch Piping: 100 A VAC Does not include: Outer/Inner T/C N2 Load lock N2 Boat cooling shower Dual boat operation B.S Sensor: 0-10 Torr, 0-1000 Torr Cable length: 12 m (Power box) AC Power box: 208V,3 Phase, 4 Wires 2006 vintage.
TEL/TOKYO ELECTRON ALPHA 303i-K是一種先進的擴散爐及配件設備,使客戶能夠進行高質量、低成本、高通量的半導體制造加工。該系統具有單區爐、氣體輸送裝置、板載晶片裝載機、自動晶片傳輸臂和控制器。單區爐利用低速、低膨脹石英管滿足部件擴散要求,提高了熱均勻性和晶圓溫度穩定性。TEL ALPHA 303IK的最高工作溫度為1,100 °C (2,012 °F),非常適合介電層和金屬化層及相關工藝。此外,該機器還采用了一種創新的保護性大氣氣體停滯工具,這種工具有助於確保一致的流量和響應,從而在各種氣體的情況下實現最佳性能。板載晶片加載器提供了一種將晶片快速可靠地送入資產的高效、自動化的方法。TOKYO ELECTRON ALPHA 303 I K憑借其大容量和多重負載選項,裝備精良,可處理多種晶圓尺寸和基板。結合自動晶片傳輸臂,ALPHA 303IK無需手動處理晶片,從而提高了吞吐量時間。該型號易於操作和維護,其控制器具有直觀設計的菜單和窗口,可增強可用性。控制器提供坡道和浸泡設置、爐子操作參數和氣體輸送設置等控制參數。此外,控制器還可以與外部PC連接,以便遠程監控和評估流程數據,從而確保流程性能和可靠性。TOKYO ELECTRON ALPHA 303i-K是客戶需要高效、經濟高效的擴散爐及配件設備的終極解決方案。該系統具有單區爐、自動晶片傳輸臂、車載晶片裝載機、保護性大氣氣體停滯裝置和直觀控制器。TEL ALPHA 303 I K完全自動化,用戶友好,性能可靠,是要求苛刻的半導體制造工藝的理想選擇。
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