二手 TEL / TOKYO ELECTRON Alpha 303i-K #9373155 待售
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ID: 9373155
晶圓大小: 12"
優質的: 2006
Vertical LPCVD furnace, 12"
Process: TEOS
(100) Process wafers
I/O Port / SMIF: FOUP
No load lock
25-Carrier slots
Boat type: Single
Main controller (WAVES)
Operation screen: Touch screen
Gas flow chart: Front and rear
M560 Temperature controller
Vacuum pressure control: CKD VEC
Controller transformer: 208 V, Single phase
Heater transformer: 208 V, 3 Phase
Gases:
Gas 1: N2
Gas 2: N2
Gas 3: O2
Gas 4: TEOS
Gas 5: N2
Gas distribution:
Basic style: Conventional
Tubing material: SUS-316L
Tubing finish: VCR
Manual valve: CKD
Air operated valve: CKD
MFC: HORIBA STEC
Exhaust distribution:
Air operated valve type: IGS Connect
Main valve: CKD VEC
Cold trap
No pump line
Wafer / Cassette handling:
(16) Cassette storage
Cassette In/Out port
Cassette handling robot
Wafer transfer type: 1 + 4
Fork material: AL2O3
Fork variable pitch
Fork wafer presence sensor
Elevator handling:
Boat elevator
Auto shutter
Boat rotation
Mechanical parts
Heating chamber:
Heater type: VMM-56-002, 100 wfs
(5) T/C Type
(5) Spike T/C
Furnace cabinets includes clean air flow system
Scavenger and water cooling unit
Power supply unit (U/P Box):
Control unit
Transformers
SCR
Breaker unit
FOUP and wafer handling automation:
(2) FOUP Load ports
FOUP Transfer
Stocker: (18) FOUPs
FIMS Port
KHI Wafer load automation
Variable pitch change mechanism with (5) forks
Auto tube shutter
Boat elevator with boat rotation mechanism
Integrated gas system in gas cabinet and TEOS LSC baking system:
O2 Gas line
TEOS Gas line
Purge N2
Vacuum vent
Exhaust vent
Piping tape heater
Main valve type: CKD Hot, P/N: VEC-VH8G-X0101
Vacuum gage
Pressure switch
Piping: 100 A VAC
Does not include:
Outer/Inner T/C
N2 Load lock
N2 Boat cooling shower
Dual boat operation
B.S Sensor: 0-10 Torr, 0-1000 Torr
Cable length: 12 m (Power box)
AC Power box: 208V,3 Phase, 4 Wires
2006 vintage.
TEL/TOKYO ELECTRON ALPHA 303i-K是一種先進的擴散爐及配件設備,使客戶能夠進行高質量、低成本、高通量的半導體制造加工。該系統具有單區爐、氣體輸送裝置、板載晶片裝載機、自動晶片傳輸臂和控制器。單區爐利用低速、低膨脹石英管滿足部件擴散要求,提高了熱均勻性和晶圓溫度穩定性。TEL ALPHA 303IK的最高工作溫度為1,100 °C (2,012 °F),非常適合介電層和金屬化層及相關工藝。此外,該機器還采用了一種創新的保護性大氣氣體停滯工具,這種工具有助於確保一致的流量和響應,從而在各種氣體的情況下實現最佳性能。板載晶片加載器提供了一種將晶片快速可靠地送入資產的高效、自動化的方法。TOKYO ELECTRON ALPHA 303 I K憑借其大容量和多重負載選項,裝備精良,可處理多種晶圓尺寸和基板。結合自動晶片傳輸臂,ALPHA 303IK無需手動處理晶片,從而提高了吞吐量時間。該型號易於操作和維護,其控制器具有直觀設計的菜單和窗口,可增強可用性。控制器提供坡道和浸泡設置、爐子操作參數和氣體輸送設置等控制參數。此外,控制器還可以與外部PC連接,以便遠程監控和評估流程數據,從而確保流程性能和可靠性。TOKYO ELECTRON ALPHA 303i-K是客戶需要高效、經濟高效的擴散爐及配件設備的終極解決方案。該系統具有單區爐、自動晶片傳輸臂、車載晶片裝載機、保護性大氣氣體停滯裝置和直觀控制器。TEL ALPHA 303 I K完全自動化,用戶友好,性能可靠,是要求苛刻的半導體制造工藝的理想選擇。
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