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熱門產品
TEL / TOKYO ELECTRON
Alpha 303i-K
Furnace Process: TEOS Type: LP-CVD Three phase power: 208 V VMM-56-002 Heater FUJIKIN Air valve MFC:
230
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熱門產品
TEL / TOKYO ELECTRON
Alpha 303i-K
Furnace, 12" Process: Pyro FUJIKIN LP-CVD VOS-56-002 Heater Signal tower Buffer storage Load port FF
77
熱門產品
TEL / TOKYO ELECTRON
Alpha 303i-K
Furnace, 12" Process: Silicon nitride (SiN) deposition process using dichlorosilane‑based chemistry
651
熱門產品
TEL / TOKYO ELECTRON
Alpha 303i-K
Furnace (2) Load ports KAWASAKI C/T Robot KAWASAKI W/T Robot Boat elevator Controller box Process m
707
熱門產品
TEL / TOKYO ELECTRON
Alpha 303i-K
Furnace Process: D-Poly Process pressure: 73 Pa, 133 Pa Process temperature: 510°C, 525°C, 530°C Boa
103
熱門產品
TEL / TOKYO ELECTRON
Alpha 303i-K
LPCVD Furnace, 12" Process: PIQ (100) Process wafers I/O Port / SMIF: FOUP No load lock 25-Carrier s
108
熱門產品
TEL / TOKYO ELECTRON
Alpha 303i-K
Furnace, 12" Gases: SiH4, Si2H6, H2, ClF3, LTO520 (Liquid) 2004 vintage.
127
熱門產品
TEL / TOKYO ELECTRON
Alpha 303i-K
Furnace, 12" MTO Heater type: VMM-56-002 Gas: Pure N2, SiH4, N2O 2004 vintage.
136
熱門產品
TEL / TOKYO ELECTRON
Alpha 303i-K
Furnace, 12" MTO Heater type: VMM-56-002 Gas: Pure N2, SiH4, N2O 2004 vintage.
119
熱門產品
TEL / TOKYO ELECTRON
Alpha 303i-K
Furnace, 12" MTO Heater type: VMM-56-002 Gas: Pure N2, SiH4, N2O 2004 vintage.
120
熱門產品
TEL / TOKYO ELECTRON
Alpha 303i-K
Vertical LPCVD furnace, 12" Process: TEOS (100) Process wafers I/O Port / SMIF: FOUP No load lock 25
182
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