二手 KLA / TENCOR STARlight SL3 UV URSA #9058370 待售
看起來這件物品已經賣了。檢查下面的類似產品或與我們聯系,我們經驗豐富的團隊將為您找到它。
單擊可縮放
已售出
ID: 9058370
Inspection system, 6"
Automation:
KLA RF File format output
Klarity analysis
Automatic error recovery
System output:
Minimum output capability (Reticles per week):
0.25 um pixel size with 100 x 100 mm inspection area: 100
Minimum run rate (Reticles / Hour):
0.25 um pixel size for 100 x 100 mm inspection area: 0.7
0.375 um pixel size for 100 x 100 mm inspection area: 1.3
0.5 um pixel size for 100 x 100 mm inspection area: 1.9
Process capability:
Box handling
Manual load
NIKON Reticle, 6"
Upgraded to HR (High resolution)
Mask basic inspection capability:
OPC Inspection
APSM (DAP Design) Inspection
EPSM Inspection capability including EPSM and full ternary
Shifter transmission: ≤40% at 364 nm wavelength
Review capability:
Transmission review
Reflective review
On line review
Repeat review
Sizing capability
Offline view (Not classification)
Offline classification option
Show new defect capability
Recipe setup / Automation:
Auto setup capability
Light tower
Selectively inspect: Glass, pellicle or chrome surfaces
Maximum recipe setup time: 15 Minutes
Three level password protection capability: Operator, engineer & FSE
Continuous vs single-step operation capability
Auto loader cycling capability
Barcode reading capability
Networking capability
Auto operation capability with existing recipe
Minimum inspectable mask characteristics:
Minimum pitch larger than or equals to twice of the minimum line width:
Minimum inspectable main feature size (nm) at:
0.186 um pixel size (Option): 400
0.25 um pixel size: 500
0.375 um pixel size: 750
0.5 um pixel size: 1000
Minimum pitch larger than or equals to 2.5 times of the minimum chrome line width:
Minimum inspectable main feature size (nm) at:
0.186 um pixel size (Option): 220
0.25 um pixel size: 320
0.375 um pixel size: 560
OPC Features:
Minimum inspectable OPC serif / Inverse (nm): 200
Minimum inspectable OPC jog (nm): 14
Inspection characteristics:
Within tool matching: ≤5%
Tool to tool matching: ≤10%
False defect rate (Defects/cm²): 0.1
For inspection area > 10 cm²: 0.1
Sensitivity on pellicle @ 98% capture rate (nm): 4000
Sensitivity on glass @ 98% capture rate (nm):4000
Minimum pitch larger than/or equals to twice of the minimum line width:
Sensitivity on chrome @ 98% capture rate (nm) at 0.186um inspection pixel size
PSLs (Option) EPSM capture rate on shifter substrate @ 90.4%: 140
Sensitivity on chrome @ 98% capture rate (nm) at 0.25um
EPSM Capture rate on shifter substrate @ 90.4%: 180
Sensitivity on chrome @ 98% capture rate (nm) at 0.375um
Sensitivity on chrome @ 98% capture rate (nm) at 0.50um
Minimum pitch larger than or equals to 2.5 times of the minimum chrome line width:
Sensitivity on chrome @ 98% capture rate (nm) at 0.186um
Sensitivity on chrome @ 98% capture rate (nm) at 0.25um
Sensitivity on chrome @ 98% capture rate (nm) at 0.375 um
Inspection pixel size on reticle using PSLs: 350
Sensitivity on chrome @ 98% capture rate (nm) at 0.5 um
Inspection pixel size on a reticle using PSLs: 500
Exclusion zones:
Pelliclized plate:
Exclusion on chrome side (mm)
For 0.25um pixel or greater: 3.5
For 0.186um pixel: 5.5
Exclusion on pellicle (mm): 1
Exclusion on glass (mm): 3
Unpelliclized plate:
(3) Exclusion on 6" back glass
(3) Exclusion on 6" front side
1999 vintage.
KLA/TENCOR STARlight SL3 UV URSA是使用專利雙波長UV成像技術的先進掩模和晶圓檢測設備。它消除了對外部光源的需求,使晶片能夠直接成像,具有最大的成像精度和高信噪比。KLA STARlight SL3 UV URSA設計用於面罩和晶片應用的自動化、獨立檢測,包括晶片凹凸檢測、石刻/蝕刻檢測、光掩模檢測、叠加檢測以及各種缺陷檢測和分類任務。該系統是圍繞一臺全自動、單波長和雙波長的紫外線成像發動機構建的,其大視野可達17厘米x 17厘米。它提供了紫外線圖像采集所需的必要紫外線照明。其堅固的結構、穩定的熱環境和高性能的光學器件確保在整個視場上進行精確的成像。集成的降噪單元有助於降低背景噪聲並提供高對比度圖像。該機配備了最先進的圖像處理平臺。它具有基於先進模式識別技術的快速、直觀、精確的缺陷檢測算法。自適應信號增強功能會自動調整以適應不斷變化的條件,從而檢測到最小的缺陷。該工具還提供集成的分析和測量功能,以實現高級過程控制和優化。TENCOR STARlight SL3 UV URSA具有基於Windows的用戶界面,可提供易於使用和高效的操作。它包括一整套易於使用的工具,可以方便地獲取和評估數據。該資產支持網絡連接,並與流行的制造軟件包兼容,從而實現了與現有生產線的靈活集成。STARlight SL3 UV URSA是用於檢查掩模和晶圓應用的功能強大且功能豐富的模型。其先進的雙波長成像技術和廣泛的圖像處理能力提供了最大的準確性和可靠性。結合靈活的集成能力,是自動化掩模和晶圓檢測的理想解決方案。
還沒有評論